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Title Photon statistics, film preparation and characterization in fluorescent microthermal imaging
Creator/Author Tangyunyong, Paiboon ; Barton, D.L.
Publication Date1995 Aug 01
OSTI IdentifierOSTI ID: 100055; Legacy ID: DE95016098
Report Number(s)SAND--95-1670C; CONF-951156--2
DOE Contract NumberAC04-94AL85000
Other Number(s)Other: ON: DE95016098
Resource TypeConference
Resource RelationConference: ISTFA `95: 21. international symposium for testing and failure analysis, Santa Clara, CA (United States), 5-10 Nov 1995; Other Information: PBD: [1995]
Research OrgSandia National Labs., Albuquerque, NM (United States)
Sponsoring OrgUSDOE, Washington, DC (United States)
Subject42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES;44 INSTRUMENTATION, INCLUDING NUCLEAR AND PARTICLE DETECTORS; INTEGRATED CIRCUITS; THERMOGRAPHY; IMAGES; ULTRAVIOLET RADIATION; FLUORESCENCE
Description/AbstractFluorescent microthermal imaging (FMI) involves coating a sample surface with a thin inorganic-based film that, upon exposure to uv light, emits temperature-dependent fluorescence. FMI offers the ability to create thermal maps of integrated circuits with a thermal resolution theoretically limited to 1 m{degree}C and a spatial resolution diffraction-limited to 0.3 {mu}m. Even though FMI has been in use for more than a decade, many factors that can affect the thermal image quality have not been studied well. This paper presents recent results showing the limitations from photon shot noise and the improvement in signal-to-noise ratio from signal averaging. Three important factors in film preparation and characterization are presented that have a significant impact on thermal quality and sensitivity of FMI: uv bleaching, film dilution, and film curing. It is shown how proper film preparation and data collection method can dramatically improve the quality of FMI thermal images.
Country of PublicationUnited States
LanguageEnglish
FormatMedium: P; Size: 6 p.
Availability OSTI as DE95016098
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System Entry Date2008 Feb 04
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