General GEC rf Reference Cell Bibliography

This list is an up-to-date bibliography, of all archival and conference publications and reports that present research performed on GEC RF Reference Cells as of April 1999. Only papers and reports that are considered referenceable are listed, so presentations from conferences that do not publish a significant proceedings are not included (such as presentations at the Gaseous Electronics Conference). Papers that are "in press" or have been submitted to a journal are included for completeness. The listing is in approximate order of publication, and has been split into groups of papers that contain either primarily experimental or theoretical results.

EXPERIMENTAL

1.	Electrical characterization of rf plasma discharges, P.A. Miller and M. Kamon, SETEC Report 90-0009, 1990.
2.	The GEC RF Reference Cell: Diagnostic techniques and initial results, K.E. Greenberg, P.J. Hargis, and P.A. Miller, SETEC Report 90-013, 1990.
3.	Measurements on the NIST GEC Reference Cell, J.R. Roberts, J.K. Olthoff, R.J. Van Brunt, and J.R. Whetstone, in Advanced Techniques for Integrated Circuit Processing, (Society of Photo-Optical Instrumentation Engineers, SPIE, 1990), Vol. 1392, p.  428.
4.	Status of the GEC Reference Cell / Laser diagnostics of plasma etching discharges, P.J. Hargis, Jr., K.E. Greenberg, and P.A. Miller, Intl. Seminar of Reactive Plasmas, Nagoya, Japan (17-19 June 1991).
5.	Mass spectrometric and optical emission diagnostics for rf plasma reactors, J.K. Olthoff, J.R. Roberts, R.J. Van Brunt, J.R. Whetstone, M.A. Sobolewski, and S. Djurovic, in Process Module Metrology, Control, and Clustering (Society of Photo-Optical Instrumentation Engineers, SPIE, 1991), Vol. 1595, p. 168.
6.	Electrical characterization of rf plasmas, P.A. Miller, in Process Module Metrology, Control, and Clustering, (Society of Photo-Optical Instrumentation Engineers, SPIE, 1991), Vol. 1595, p. 179.
7.	Application of chemometrics to optical emission spectroscopy for plasma monitoring, M.P. Splichal and H.M. Anderson, in Process Module Metrology, Control, and Clustering, (Society of Photo-Optical Instrumentation Engineers, SPIE, 1991), Vol. 1595, p. 189.
8.	Electrical isolation of radio-frequency plasma discharges, P.A. Miller, H.A. Anderson, and M.P. Splichal, J. Appl. Phys. 71, 1171 (1992).
9.	Period-doubling bifurcation in a plasma reactor, P.A. Miller and K.E. Greenberg, Appl. Phys. Lett. 60, 2859 (1992).
10.	Diagnostic measurements in rf plasmas for materials processing, J.R. Roberts, J.K. Olthoff, M.A. Sobolewski, R.J. Van Brunt, J.R. Whetstone, and S. Djurovic, in Atomic Processes in Plasmas, AIP Conference Proceedings 257, (American Institute of Physics, New York, 1992), p. 157.
11.	Ion kinetic-energy distributions and electrical measurements in argon-oxygen rf glow discharges, J.K. Olthoff, R.J. Van Brunt, and M.A. Sobolewski, in Proc. Tenth Intl. Conf. on Gas Discharges and Their Applications (University College of Swansea, Swansea, Wales, U.K., 1992), p. 440.
12.	Ion kinetic-energy distributions in rf glow discharges, J.K. Olthoff, R.J. Van Brunt, and S.B. Radovanov, J. Appl. Phys. 72, 4566 (1992).
13.	Electrical characterization of radio-frequency discharges in the Gaseous Electronics Conference Reference Cell, M.A. Sobolewski, J. Vac. Sci. Technol. A 10, 3550 (1992).
14.	Measurements and analysis of the equivalent circuit of the GEC RF Reference Cell, J.T. Verdeyen, Sandia Report SAND92-7284, 1992.
15.	Electrical measurements for monitoring and control of rf plasma processing, M.A. Sobolewski and J.R. Whetstone, in Advanced Techniques for Integrated Circuit Processing II (Society of Photo-Optical Instrumentation Engineers, SPIE, 1992), Vol. 1803, p.  309.
16.	Absolute spatially- and temporally-resolved optical emission measurements of rf glow discharges in argon, S. Djurovic, J.R. Roberts, M.A. Sobolewski, and J.K. Olthoff, J. Res. Natl. Inst. Stand. and Technol. 98, 159 (1993).
17.	Electron and metastable densities in parallel-plate radio-frequency discharges, K.E. Greenberg and G.A. Hebner, J. Appl. Phys. 73, 8126 (1993).
18.	Radial optical emission profiles of radio-frequency glow discharges, J. Pender, M. Buie, T. Vincent, J. Holloway, M. Elta, and M. Brake, J. Appl. Phys. 74, 3590 (1993).
19.	Subharmonics and rf-plasma sheaths, P.A. Miller, L.A. Romero, and P.D. Pochan, Phys. Rev. Lett. 71, 863 (1993).
20.	Hydrogen Balmer Alpha line shapes for hydrogen-argon mixtures in a low pressure rf discharge, S. Djurovic and J.R. Roberts, J. Appl. Phys. 74, 6558 (1993).
21.	Comparison of electron density measurements made using a Langmuir probe and microwave interferometer in the Gaseous Electronics Conference reference reactor, L.J. Overzet and M.B. Hopkins, J. Appl. Phys. 74, 4323 (1993).
22.	Spatial variations in the charge density of argon discharges in the Gaseous Electronics Conference reference reactor, M.B. Hopkins, L.J. Overzet, and M. Turner, Appl. Phys. Lett. 63, 2484 (1993).
23.	Electric-field measurements in 13.56-MHz helium discharges, K.E. Greenberg and G.A. Hebner, Appl. Phys. Lett. 63, 3282 (1993).
24.	Electrical sensors for monitoring rf plasma sheaths, M.A. Sobolewski and J.K. Olthoff, in Microelectronic Processes, Sensors and Controls, (Society of Photo-Optical Instrumentation Engineers, SPIE 290.
25.	Optical emission spectroscopy on the GEC reference cell, M.J. Buie, J.T. Pender, T. Vincent, J. Holloway, M. Brake, and M. Elta, in Microelectronic Processes, Sensors and Controls, (Soc. Photo-Optical Instrumentation Engineers, SPIE, 1993), Vol. 2091, p. 211.
26.	An integrated system of optical sensors for plasma monitoring and plasma process control, H.M. Anderson and M.P. Splichal, in Microelectronic Processes, Sensors and Controls, (Society of Photo-Optical Instrumentation Engineers, SPIE, 1993), Vol. 2091, p.  333.
27.	Plasma-etching science meets technology in the MDL, K.E. Greenberg, P.A. Miller, R. Patteston, and B. K. Smith, Sandia National Laboratories Report, SAND93-0187 (1993).
28.	Plasma standard cell for laboratory demonstrations and experiments, R.L. Lane and T.J. Grimsley, Tenth Biennial University/Government/Industry Microelectronics Symposium (IEEE, Piscataway, NJ, 1993), p. 213.
29.	Kinetic-energy distributions of ions sampled from argon plasmas in a parallel-plate rf reference cell, J.K. Olthoff, R.J. Van Brunt, S.B. Radovanov, J.A. Rees, and R. Surowiec, J. Appl. Phys. 75, 115 (1994).
30.	The GEC RF Reference Cell: A parallel-plate radio frequency system to study plasma-processing discharges, P.J. Hargis, Jr., K.E. Greenberg, P.A. Miller, J.B. Gerardo, J.R.  Torczynski, M.E. Riley, G.A. Hebner, J.R. Roberts, J.K. Olthoff, J.R. Whetstone, R.J. Van Brunt, M.A. Sobolewski, H.M. Anderson, M.P. Splichal, J.L. Mock, P. Bletzinger, A. Garscadden, R.A.  Gottscho, G. Selwyn, M. Dalvie, J.E. Heidenreich, J.W. Butterbaugh, M.L. Brake, M.L. Passow, J. Pender, A. Lujan, M.E. Elta, D.B. Graves, H.H. Sawin, M.J. Kushner, J.T. Verdeyen, R. Horwath, and T.R. Turner, Rev. Sci. Instrum. 65, 140 (1994).
31.	Use of an ion energy analyzer-mass spectrometer to measure ion kinetic-energy distributions from rf discharges in argon-helium gas mixtures, J.K. Olthoff, R.J. Van Brunt, S.B. Radovanov, and J.A. Rees, IEEE Proc. - Sci. Meas. Technol. 141, 105 (1994).
32.	Particulates in C2F6-CHF3 and CF4-CHF3 etching plasmas, H.M. Anderson, S.B. Radovanov, J.L. Mock, and P.J. Resnick, Plasma Sources Sci. Technol. 3, 302 (1994).
33.	Effect of plasma-surface interactions on the radial variation of H atom density in a hydrogen rf discharge, B.N. Ganguly and P. Bletzinger, J. Appl. Phys. 76, 1476 (1994).
34.	Electric fields in high-frequency parallel-plate helium discharges, G.A. Hebner, K.E. Greenberg, and M.E. Riley, J. Appl. Phys. 76, 4036 (1994).
35.	The effects of electrostatic, molecular drag and gravitational forces on the behavior of particle clouds in an rf discharge, J.F. O'Hanlon, J. Kang, L.K. Russell, and L. Hong, IEEE Trans. Plasma Sci. 22, 122 (1994).
36.	Detection and modeling of electrode topography effects on particle traps, M. Dalvie, M. Surrendra, G.S. Selwyn, and C.R. Guarnieri, Plasma Sources Sci. Technol. 3, 442 (1994).
37.	Two-dimensional argon metastable density measurements in a radio frequency plasma reactor by planar laser-induced fluorescence imaging, B. K. McMillin and M. R. Zachariah, J. Appl. Phys. 77, 5538 (1995).
38.	Time-resolved Balmer-alpha emission from fast hydrogen atoms in low pressure, radio-frequency discharges in hydrogen, S.B. Radovanov, K. Dzierzega, J.R. Roberts, and J.K. Olthoff, Appl. Phys. Lett. 66, 2637 (1995).
39.	In situ diode laser absorption measurements of plasma species in a GEC reference cell reactor, D.B. Oh, A.C. Stanton, H.M. Anderson, and M.P. Splichal, J. Vac. Sci. Technol. B 13, 954 (1995).
40.	The Gaseous Electronics Conference RF Reference Cell - An Introduction, J.K. Olthoff and K.E. Greenberg, J. Res. Natl. Inst. Stand. Technol. 100, 327 (1995).
41.	Current and voltage measurements in the Gaseous Electronics Conference RF Reference Cell, M.A. Sobolewski, J. Res. Natl. Inst. Stand. Technol. 100, 341 (1995).
42.	Optical emission on the Gaseous Electronics Conference RF Reference Cell, J.R. Roberts, J. Res. Natl. Inst. Stand. Technol. 100, 353 (1995).
43.	Optical diagnostics in the Gaseous Electronics Conference RF Reference Cell, G.A. Hebner and K.E. Greenberg, J. Res. Natl. Inst. Stand. Technol. 100, 373 (1995).
44.	Studies of ion kinetic-energy distributions in the Gaseous Electronics Conference RF Reference Cell, J.K. Olthoff, R.J. Van Brunt, and S.B. Radovanov, J. Res. Natl. Inst. Stand. Technol. 100, 383 (1995).
45.	Microwave diagnostics in the Gaseous Electronics Conference RF Reference Cell, L.J. Overzet, J. Res. Natl. Inst. Stand. Technol. 100, 401 (1995).
46.	Langmuir probe measurements in the Gaseous Electronics Conference RF Reference Cell, M.B. Hopkins, J. Res. Natl. Inst. Stand. Technol. 100, 415 (1995).
47.	An inductively coupled plasma source for the Gaseous Electronics Conference RF Reference Cell, P.A. Miller, G.A. Hebner, K.E. Greenberg, P.D. Pochan, and B. P. Aragon, J. Res. Natl. Inst. Stand. Technol. 100, 427 (1995).
48.	Reactive ion etching in the Gaseous Electronics Conference RF Reference Cell, M.L. Brake, J.T.P. Pender, M.J. Buie, A. Ricci, J. Soniker, P.D. Pochan, and P.A. Miller, J. Res. Natl. Inst. Stand. Technol. 100, 441 (1995).
49.	Dusty plasma studies in the Gaseous Electronics Conference RF Reference Cell, H.M. Anderson and S.B. Radovanov, J. Res. Natl. Inst. Stand. Technol. 100, 449 (1995).
50.	Surface roughness studies of deep plasma etching in crystalline silicon, R.L. Lane and Z. Li, in Proc. of 11th Biennial University-Government-Industry-Microelectronics Symposium (SEMATECH, Austin, TX, 1995), p. 134.
51.	Ion kinetic-energy distributions and Balmer-Alpha excitation in Ar-H2 radio frequency discharges, S.B. Radovanov, J.K. Olthoff, R.J. Van Brunt, and S. Djurovic, J. Appl. Phys. 78, 746 (1995).
52.	Effect of electrode material on measured ion energy distributions in radio-frequency discharges, J.K. Olthoff, R.J. Van Brunt, and S.B. Radovanov, Appl. Phys. Lett., 67, 473 (1995).
53.	Kinetic-energy distributions of ions from radio-frequency discharges in helium, nitrogen, and oxygen, R.J. Van Brunt, J.K. Olthoff, and S.B. Radovanov, in Proc. Eleventh Intl. Conf. on Gas Discharges and Their Applications (Chou University, Tokyo, Japan, 1995), p.  I-486.
54.	Influence of electrode material on measured ion kinetic-energy distributions in radio-frequency discharges, R.J. Van Brunt, J.K. Olthoff, and S.B. Radovanov, in XXII International Conference on the Physics of Ionized Gases, Contributed Papers 2 (Stevens Institute of Technology, Hoboken, NJ, 1995), p. 29.
55.	Strongly-coupled dusty plasmas, J. Goree, C. Cui, and R. Quinn, in XXII International Conference on the Physics of Ionized Gases, Contributed Papers 4 (Stevens Institute of Technology, Hoboken, NJ, 1995), p. 91.
56.	2-D imaging of CF2 density by laser-induced fluorescence of CF4 etching plasmas in the GEC rf Reference Cell, B.K. McMillin and M.R. Zachariah, in Proc. 12th International Symposium on Plasma Chemistry (Minneapolis, MN, 1995), Vol. 1, p. 539.
57.	In situ diagnostic for etch uniformity, M. Buie, J. Pender, M. Elta, and M. Brake, J. Vac. Sci. Technol. A 13, 1930 (1995).
58.	Time resolved power and impedance measurements of pulsed radio frequency discharges, L.J. Overzet and F.Y. Leong-Rousey, Plasma Sources Sci. Technol. 4, 432 (1995).
59.	Electrical characteristics of argon radio-frequency glow discharges in an asymmetric cell, M.A. Sobolewski, IEEE Trans. Plasma Sci. 23, 1006 (1995).
60.	Two-dimensional laser-induced fluorescence imaging of metastable density in low-pressure rf argon plasmas with added O2, Cl2, or CF4, B.K. McMillin and M.R. Zachariah, J. Appl. Phys. 79, 77 (1996).
61.	2-D images of CF2 density in CF4/Ar plasmas by laser-induced fluorescence in a GEC RF Reference Cell, B.K. McMillin and M.R. Zachariah, IEEE Trans. Plasma Sci. 24, 113 (1996).
62.	Monochromatic imaging of scattered laser light from in situ generated particles in plasmas, W.A. Hareland, R.J. Buss, D.A. Brown, and S.M. Collins, IEEE Trans. Plasma Sci. 24, 103 (1996).
63.	Distribution of excited species in plasmas by monochromatic imaging, W.A. Hareland and R.J. Buss, IEEE Trans. Plasma Sci. 24, 117 (1996).
64.	Spatial profiles of metastable densities and electric field strengths in parallel-plate radio frequency discharges, G.A. Hebner and K.E. Greenberg, IEEE Trans. Plasma Sci. 24, 121 (1996).
65.	Abel's inversion applied to experimental spectroscopic data with off axis peaks, M.J. Buie, J.T.P. Pender, J. Holloway, T. Vincent, P. Ventzek, and M. Brake, J. Quant. Spectros. Radiat. Transfer, 55, 231 (1996).
66.	In situ sensor of spatially resolved optical emission, M.J. Buie, J.T.P. Pender, J. Holloway, and M. Brake, IEEE Trans. Plasma Sci. 24, 111 (1996).
67.	Comparison of Si etching in the GEC reference cell and a commercial reactive ion etcher, J. Pender, M. Buie, and M.L. Brake, submitted.
68.	Sheath dynamics observed in a 13.56 MHz-driven plasma, C.M.O. Mahony, R.C. Cheshire, R. Al-Wazzan, and W.G. Graham, Appl. Phys. Lett. 71, 608 (1997).
69.	Electron density measurements in a rf helium discharges by laser-collisional induced fluorescence method, K. Dzierzega, K. Musiol, E. Benck, and J.R. Roberts, J. Appl. Phys., 80, 3196 (1996).
70.	Optical and mass spectrometric investigations of ions and neutrals in SF6 radio-frequency discharges, R. Foest, J.K. Olthoff, R.J. Van Brunt, E.C. Benck, and J.R. Roberts, Phys. Rev. E, 54, 1876 (1996).
71.	Spatially resolved, excited state densities and neutral temperatures in inductively coupled argon plasmas, G.A. Hebner, J. Appl. Phys. 80, 2624 (1996).
72.	Negative ion density in inductively coupled chlorine plasmas, G.A. Hebner, J. Vac. Sci. Technol. A 14, 2158 (1996).
73.	Two-dimensional imaging of CF2 density by laser-induced fluorescence in CF4 etching plasmas in the Gaseous Electronics Conference Reference Cell, B.K. McMillin and M.R. Zachariah, J. Vac. Sci. Technol. A, 15, 230 (1997).
74.	Ion energy and angular distributions in inductively coupled argon rf discharges, J.R. Woodworth, M.R. Riley, D.C. Meister, B.P. Aragon, M.S. Le, H.H. Sawin, Sandia Report SAND96-0535, March 1996.
75.	Ion energy and angular distributions in inductively driven rf discharges in chlorine, J.R. Woodworth and M.E. Riley, Sandia Report SAND96-0559, March 1996.
76.	Ion energy and angular distributions in inductively coupled rf discharges in argon, J.R. Woodworth, M.R. Riley, D.C. Meister, B.P. Aragon, M.S. Le, H.H. Sawin, J. Appl. Phys. 80, 1304 (1996).
77.	Dynamic laser light scattering studies of dusty plasmas in the Gaseous Electronics Conference Electronics Conference Reference Cell, H.M. Anderson and S.B. Radovanov, J. Vac. Sci. Technol. A 14, 608 (1996).
78.	Particle trapping, transport, and charge in capacitively and inductively coupled argon plasmas in a Gaseous Electronics Conference Reference Cell, S.M. Collins, D.A. Brown, J.F. O'Hanlou, and R.N. Carlile, J. Vac. Sci. Technol. A 14, 634 (1996).
79.	Experimental studies of two-dimensional and three-dimensional structure in a crystallized dusty plasma, J.B. Pieper, J. Goree, and R.A. Quinn, J. Vac. Sci. Technol. A 14, 519 (1996).
80.	Ion energy and angular distributions in inductively driven rf discharges in chlorine, J.R. Woodworth, M.E. Riley, P.A. Miller, G.A. Hebner, and T. W. Hamilton, J. Appl. Phys. 81, 5950 (1997).
81.	Langmuir probe measurements in an inductively-coupled plasma source, A. Schwabedissen, E.C. Benck, and J.R. Roberts, Phys. Rev. E 55, 3450 (1997).
82.	Metastable chlorine ion temperature and drift velocity in an inductively coupled plasma, G.A. Hebner, J. Appl. Phys. 80, 3215 (1996).
83.	Relative atomic chlorine density in inductively coupled chlorine plasmas, G.A. Hebner, J. Appl. Phys. 81, 578 (1997).
84.	Experimental test of models of radio frequency plasma sheaths, M.A. Soboleuski, Appl. Phys. Lett. 70, 1049 (1997).
85.	2-D concentration maps by planar laser-induced fluorescent imaging, M.R. Zachariah and B.K. McMillin, Solid State Technol. 147 (June 1996).
86.	Postplasma particle dynamics in a Gaseous Electronics Conference RF Reference Cell, S.M. Collins, D.A. Brown, J.F. O'Hanlan, and R.N. Carlile, J. Vac. Sci. Technol. A 13, 2950 (1995).
87.	Mapping of radio frequency plasma potential throughout a particle trapping region using an emissive probe, J. Kang, R.N. Carlile, J.F. O'Hanlon, and S.M. Collins, J. Vac. Sci. Technol. A 14, 639 (1996).
88.	Effects of bumps on the wafer on the ion distribution functions in high-density argon and argon-chlorine discharges, J.R. Woodworth, B.P. Aragon, and T.W. Hamilton, Appl. Phys. Lett. 70 , 1947 (1997).
89.	Oxide etch dusty plasma studies in the GEC Reference Cell using dynamic laser light scattering techniques, H.M. Anderson and S. Radovanov, Proceedings of the Institute of Environmental Sciences (Institute of Environmental Sciences, Mt. Prospect, IL) 41, 35 (1995).
90.	The behavior of particle clouds near vertically oriented wafers in a capacitively coupled rf discharge, J. F. O'Hanlon and J. Kang, Proceedings of the Institute of Environmental Sciences (Institute of Environmental Sciences, Mt. Prospect, IL) 41, 303 (1995).
91.	Characterization of low pressure plasmas using advanced Langmur probe techniques, M.B. Hopkins, Proceedings of Frontiers in Low Temperature Plasma Diagnostics II (Physikzentrum, Bad Honnef, Germany, Feb. 17-21, 1997), p. 19.
92.	Plasma Diagnostics on the Gaseous Electronics Conference radio frequency reference cell, J.K. Olthoff, Proceedings of Frontiers in Low Temperature Plasma Diagnostics II (Physikzentrum, Bad Honnef, Germany, Feb. 17-21, 1997), p. 47.
93.	Electric field mapping in an asymmetric capacitively coupled rf discharge in a GEC reference cell, V. Czarnetzki, D. Luggenholscher, and H.F. Dobele, Proceedings of Frontiers in Low Temperature Plasma Diagnostics II (Physikzentrum, Bad Honnef, Germany, Feb. 17-21, 1997), p.  119.
94.	Compensated Langmur probe experiments in the UK GEC reference reactor, C.M.O. Mahony, J. McFarland, and W.G. Graham, Proceedings of Frontiers in Low Temperature Plasma Diagnostics II (Physikzentrum, Bad Honnef, Germany, Feb. 17-21, 1997), p. 179.
95.	The influence of different coil geometries on the spatial distribution of the plasma density in planar inductively coupled plasmas, A. Schwabedissen, E.C. Benck, and J.R. Roberts, Phys. Rev. E 56, 5866 (1997).
96.	Investigations in the sheath region of a radio frequency biased inductively coupled discharge, E.C. Benck, A. Schwabedissen, A. Gates, and J.R. Roberts, J. Vac. Sci. Technol. A 16, 306 (1998).
97.	Mass spectrometric measurement of molecular dissociation in inductively-coupled plasmas, Y. Wang, R.J. VanBrunt, and J.K. Olthoff, J. Appl. Phys. 83, 703 (1998).
98.	Solid/liquid/gaseous phase transitions in plasma crystals, H.M. Thomas and G.E. Morfill, J. Vac. Sci. Technol. A 16, 501 (1996).
99.	Negative ion densities in chlorine- and boron trichloride-containing inductively coupled plasmas, C.B. Fleddermann and G.A. Hebner, J. Vac. Sci. Technol. A. 15, 1955 (1997).
100.	A spatially resolved optical emission sensor for plasma etch monitoring, S. Shannon, J P. Halloway, K. Flippo, and M.L. Brake, Appl. Phys. Lett. 71, 1467 (1997).
101.	Comparison of hydrogen atom density measurements in three types of discharges using H2 – N2 gas mixtures, B.N. Ganguly and P. Bletzinger, J. Appl. Phys. 82, 4772 (1997).
102.	Ion distribution functions in inductively coupled radio frequency discharges in argon – chlorine mixtures, R.R. Woodworth, M.E. Riley, P.A. Miller, C.A. Nichols, and T.W. Hamilton, J. Vac. Sci. Technol. A 15, 2015 (1997).
103.	Optical computer aided tomography measurements of plasma uniformity in an inductively coupled discharge, E.C. Benck and J.R. Roberts, Characterization and Metrology for ULSI Technology: 1998 International Conference, AIP Conference Proceedings 449 (NIST, Gaithersburg, MD, 1998), p. 431.
104.	Electrical optimization of plasma-enhanced chemical vapor deposition chamber cleaning plasmas, M.A. Sobolewski, J.G. Langan, and B.S. Felker, J. Vac. Sci. Technol. B 16, 173 (1998).
105.	Spatial uniformity in chamber-cleaning plasmas measured using planar laser-induced fluorescence, K.L. Steffens and M.A. Sobolewski, Characterization and Metrology for ULSI Technology: 1998 International Conference, AIP Conference Proceedings 449 (NIST, Gaithersburg, MD, 1998) p. 454.
106.	Novel ion current sensor for real-time, in-situ monitoring and control of plasma processing, M.A. Sobolewski, Characterization and Metrology for ULSI Technology: 1998 International Conference, AIP Conference Proceedings 449 (NIST, Gaithersburg, MD, 1998) p. 449.
107.	Optical computer aided tomography for plasma uniformity measurements, E.C. Benck and J.R. Roberts, Proceedings of the Plasma Etch Users Group, The Fourth International Workshop on Advanced Plasma Tools and Process Engineering (Millbrae, CA, 1998) p. 8.
108.	Electrical optimization of plasma-enhanced chemical vapor deposition chamber cleaning plasmas, M.A. Sobolewski, J.G. Langan, and B.S. Felker, J. Vac. Sci. Technol. B 15, 173 (1998).
109.	Comparison of electron density measurements in planar inductively coupled plasmas by means of the plasma oscillation method and Langmuir probes, A. Schwabedissen, E.C. Benck and J.R. Roberts, Plasma Sources Sci. Technol. 7 119 (1998).
110.	Measurements of relative BCl density in BCl2-containing inductively coupled radio frequency plasmas, C. B. Fleddermann and G.A. Hebner, J. Appl Phys. 83, 4030 (1998).
111.	Effect of metastable atom reactions on the electron energy probability functions is afterglows, L.J. Overzet and J. Kleber, Plasma Sources Sci. Technol. 7, 512 (1998).
112.	Sensitive electric field measurement by fluorescence-dip spectroscopy by Rydberg states of atomic hydrogen, B.U. Czarnetzi, D. Luggenhölscher, and H.F. Döbele, Phys. Rev. Lett. 81, 4592 (1998) .
113.	Ion energy distribution functions in inductively coupled radio-frequency discharges – mixtures of Cl2/BCl2/Ar, C.A. Nichols, J.R. Woodworth, and T.W. Hamilon, J. Vac. Sci. Technol. A 16 3389 (1998).
114.	Optical self-absorption technique for qualitative measurement of excited-state densities in plasma reactors, P.A. Miller, G.A. Hebner , R.L. Jerecki, Jr., T. Ni, J. Vac. Sci. Technol A 16, 3240 (1998) .
115.	Positive ion species in high-dnesity discharges containing chlorine and boron-trichloride, J.R. Woodworth, C.A. Nicholes, and T.W. Hamilton, J. Vac. Sci. Technol. A 16, 3235 (1998).
116.	Control of ion energy in a capacitively coupled reactive ion etcher, H. M. Park, C. Garvin, D. S. Grimard, and J. W. Grizzle, J. Electrochem. Soc. 145, 4247 (1998).
117.	Planar laser-induced fluorescence of CF2 in O2/C2F6 chamber-cleaning plasmas: Spatial uniformity and comparision to electrical measurements, K.L. Steffens and M.A. Sobolewski, J. Vac Sci. Technol. A. 17, 517 (1999).
118.	Ion energy distributions and sheath voltages in a radio-frequency-biased, inductively coupled, high-density plasma reactor, M.A. Sobolewski, J.K. Olthoff, and Y. Wang, J. Appl. Phys. 85, 3966 (1999).
119.	Planar laser-induced fluorescence of CF2 in O2/CF4 and O2/C2F6 chamber-cleaning plasmas: Spatial uniformity and comparison to electrical measurements, K.L. Steffens and M.A. Sobolewski, J. Vac. Sci. Technol. A 17, 517 (1999).
120.	Ion energy distributions in inductively coupled radio-frequence discharges in argon, nitrogen, oxygen, chlorine, and their mixtures, Y. Wang and J.K. Olthoff, J. Appl. Phys. 58 (in press).
121.	Studies of ion bombardment in high density plasmas containing CF4, J.K. Olthoff and Y. Wang, J. Vac. Sci. Technol. A 17 (in press).
MODELING
1.	Numerical investigation of the kinetics and chemistry of rf glow discharge plasmas sustained in He, N2, O2, He/N2/O2, He/CF4/O2, and SiH4/NH3 using a Monte Carlo-fluid hybrid model, T.J. Sommerer and M.J. Kushner, J. Appl. Phys. 71, 1654 (1992).
2.	Monte Carlo-fluid model of chlorine atom production in Cl2, HCl, and CCl4 radio-frequency discharges for plasma etching, T.J. Sommerer and M.J. Kushner, J. Vac. Sci. Technol. B 10, 2179 (1992).
3.	Radio frequency discharge modeling: Moment equations approach, M. Meyyappan and T.R. Govindan, J. Appl. Phys. 74, 2250 (1993).
4.	Fluid simulations of glow discharges: Effect of metastable atoms in argon, D.P. Lymberopoulos and D.J. Economou, J. Appl. Phys. 73, 3668 (1993).
5.	Fluid simulations of radio frequency glow discharges: Two-dimensional argon discharge including metastables, D.P. Lymberopoulos and D.J. Economou, Appl. Phys. Lett. 63, 2478 (1993).
6.	A comparative study between non-equilibrium and equilibrium models of rf glow discharges, F.F. Young and C.H. Wu, J. Phys. D: Appl. Phys. 26, 782 (1993).
7.	Theoretical and experimental study of low-temperature, capacitively-coupled, radio frequency helium plasmas, M.E. Riley, K.E. Greenberg, G.A. Hebner, and P J. Drallos, J. Appl. Phys. 75, 2789 (1994).
8.	Modeling and simulation of glow discharge plasma reactors, D.P. Lymberopoulos and D.J. Economou, J. Vac. Sci. A 12, 1229 (1994).
9.	Investigation of electron source and ion flux uniformity in high plasma-density inductively-coupled etching tools using 2-dimensional modeling, P.L. Ventzek, M. Grapperhaus, and M.J. Kushner, J. Vac. Sci. Technol. B 12, 3118 (1994).
10.	Two-dimensional model of a capacitively coupled rf discharge and comparisons with experiments in the Gaseous Electronics Conference reference reactor, J.P. Boeuf and L.C. Pitchford, Phys. Rev. E 51, 1376 (1995).
11.	Radio frequency voltage division between two plasma sheaths in the Gaseous Electronics Conference reference cell, Y. Wang, Appl. Phys. Lett. 66, 2186 (1995).
12.	Spatiotemporal electron dynamics in radio-frequency glow discharges: fluid versus dynamic Monte Carlo simulations, D.P. Lymberopoulos and D.J. Economou, J. Phys. D: Appl. Phys. 28, 727 (1995).
13.	One-dimensional modeling studies of the Gaseous Electronics rf Reference Cell, T.R. Govindan and M. Meyyappan, J. Res. Natl. Inst. Stand. Technol. 100, 463 (1995).
14.	Low pressure neutral transport modeling for plasma reactors, S. Shankar, M. Rieffel, S. Taylor, D. Weaver, and A. Wulf, in Workshop on Industrial Applications in Plasma Chemistry (University of Wisconsin-Madison, 1995), p. 31.
15.	Two-dimensional self-consistent radio-frequency plasma simulations relevant to the Gaseous Electronics Conference rf Reference Cell, D.P. Lymberpopoulos and D.J. Economou, J. Res. Natl. Inst. Stand. Technol. 100, 473 (1995).
16.	Modeling and simulation of two-dimensional reactive plasma flow in inductively coupled reactors, D.P. Lymberpopoulos, R. Wise, and D.J. Economou, Proceedings of the First Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing (The Electrochemical Society, Spring meeting, Reno, NV, 1995), p. 588.
17.	Evidence for inelastic processes for N3+ and N4+ from ion energy distributions in He/N2 rf glow discharges, H.H. Hwang, J.K. Olthoff, R.J. Van Brunt, S.B. Radovanov, and M.J. Kushner, J. Appl. Phys. 79, 93 (1996).
18.	Two dimensional analysis of radio frequency discharges, M. Meyyappan and T.R. Govindan, IEEE Trans. Plasma Sci. 24, 119 (1996).
19.	Two-dimensional fluid model of an inductively coupled plasma with comparison to experimental spatial profiles, J.D. Bukowski, D.B. Graves, and P. Vitello, J. Appl. Phys. 80, 2614 (1996).
20.	On spatial distribution of optical emission in radio frequency discharges, Z. Lj. Petrovic, S. Bzenic, J. Jovanovic, and S. Djurovic, J. Appl. Phys. D: Appl. Phys. 28, 2287 (1995).
21.	Rapid two-dimensional self-consistent simulation of inductively coupled plasma and comparison with experimental data, R.S. Wise, D.P. Lymberopoulos, and D.J. Economou, Appl. Phys. Lett., 68, 2499 (1996).
22.	Ion energy distributions in radio frequency discharges sustained in gas mixtures obtained using a Monte Carlo-fluid hybrid model: endothermic processes and ion holes, H.H. Hwang and M.J. Kushner, Plasma Sources Sci. Tech. 3, 190 (1994).
23.	Dynamic model of radio frequency plasma sheath in a highly asymmetric discharge cell, M.A. Sobolewski, Phys. Rev. E 56, 1001 (1997).
24.	Direct simulation Monte Carlo model of inductively coupled plasma and comparison, J. Johannes, T. Bartel, G. Hebner, J. Woodworth, and D. Economou, Proceedings of 11th Int. Conf. Plasma Processing (Electrochemical Society, 1996), p. 20.
25.	Dynamics of collisionless rf plasma sheaths, P.A. Miller and M.E. Riley, J. Appl. Phys. 82, 3689 (1997).
26.	Modeling of plasma-etch processes using well stirred reactor approximation and including complex gas-phase and surface reactions, E. Meeks and J.W. Shon, IEEE Trans. on Plasma Sci. 23, 539 (1995).
27.	Experimental test of models of radio-frequency plasma sheaths, M.A. Sobolewski, Appl. Phys. Lett. 70, 1049 (1997).
28.	Modeling the pressure dependence of dc bias voltage in asymmetric, capacitive rf sheaths, M. Chandhok and J.W. Grizzle, IEEE Trans. on Plasma Sci. 26, 181 (1998).
29.	Simulations of BCl3/Cl2 plasma in an inductively coupled gaseous reference cell, S.J. Choi and R. Veerasingam, J. Vac. Sci. Technol. A. 16, 1873 (1998).
30.	Simulation of BCl3/Cl2/Ar plasmas with comparisons to diagnostic data, E. Meeks, P. Ho, A. Ting, and R.J. Buss, J. Vac. Sci. Technol. A. 16, 2227 (1998).

Further information about this bibliography can be obtained from:

James K. Olthoff

National Institute of Standards and Technology

Electricity Division

B344/220

Gaithersburg, MD 20899

(310) 975-2431

olthoff@eeel.nist.gov