NIST Technicalendar February 25 to February 29, 2008 The NIST Technicalendar is issued each Friday. All items MUST be submitted electronically from this web page by 12:00 NOON each Wednesday unless otherwise stated in the NIST Technicalendar. The address for online weekly editions of the NIST Technicalendar and NIST Administrative Calendar is: http://www.nist.gov/tcal/.

In this Issue: Meetings at NIST Meetings Elsewhere Announcements Talks by NIST Personnel NIST Web Site Announcements NIST Administrative Calendar (current)   NIST Vacancy Announcements (current)

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1:30 PM - Block-copolymer lithography for patterning perpendicular magnetic nano-islands

11:00 AM - Dirac Materials
3:00 PM - Flammability Properties of Polymer Nanocomposites
7:00 PM - Are You Ready for an External Audit?

1:30 PM - Quantum engineering of nanostructures: electronics and photonics

10:45 AM - X-ray Scattering from Thin Films of Block Copolymers
1:00 PM - Novel Dynamics in Stokes Flow

10:00 AM - Nanoscale analysis of molecular surfaces and interfaces – Metrology and Technology
1:30 PM - Quantum Electrical Metrology Division Seminar: Epitaxial Graphene for Nanoelectronics

2/25 -- MONDAY

1:30 PM - CNST ELECTRON PHYSICS GROUP SEMINAR: Block-copolymer lithography for patterning perpendicular magnetic nano-islands
Templated block copolymer lithography is a powerful method of fabricating nanostructures which draws on the combined strengths of both top-down and bottom-up methods. This talk will discuss the fabrication and magnetic properties of ordered and disordered perpendicular CoCrPt magnetic islands in a range of sizes (5-15nm thick, 20-30nm diameter) fabricated by this method. Disordered patterns were obtained by annealing a thin spin-coated film of polystyrene-polyferrocenyldimethylsilane (PS-PFS) block copolymer. Ordered arrays were fabricated by a similar method, except the polymer was first templated using a removable topographic template. While topographical templates have previously been used to impose long-range order on block copolymer systems, their use results in residual surface relief on the substrate and therefore in the finished device, which is generally undesirable. To avoid this, a removable template may be used. The pattern can then be transferred into functional materials such as silica, W or magnetic films to make long-range-ordered dot arrays over planar substrates. In particular, magnetic islands fabricated by this method maintain their perpendicular magnetic anisotropy but show increased coercivity (800-1650 Oe) as compared to the unpatterned film (150 Oe). Since the islands are uniaxial and non-interacting (calculated nearest neighbor fields are 50 Oe, Hc), time-scale-dependent magnetic properties could be characterized using Sharrock's approach. The measurements show switching volumes (V*) on the order of the physical volume of the dots (~5000 nm3) suggesting that the dots switch their magnetization coherently and independently of each other. The advantages of this technique will be discussed for large-area self-assembled nanoscale pattern formation, and how it can be applied to the fabrication of various structures including patterned magnetic media, DNA sorting and detection devices or plasmon waveguides.
FILIP ILIEVSKI , RESEARCH ASSISTANT, MASSACHUSETTS INSTITUTE OF TECHNOLOGY.
Bldg. 217, Rm. H107. (NIST Contact: Robert McMichael, 301-975-5121, robert.mcmichael@nist.gov)


2/26 -- TUESDAY

11:00 AM - CNST ELECTRON PHYSICS GROUP SEMINAR: Dirac Materials
Recently a new single layer material -- graphene has been discovered. This is a material where Dirac points in the fermionic spectrum lead to a very unusual properties, such as transport properties and impurity states. I will argue that these properties are not unique to graphene and in fact are a direct consequence of Dirac spectrum in fermionic excitation sector. Strong similarities with d-wave superconductors, superfluid 3He, p-wave superconductors and with other materials exhibiting Dirac electronic spectrum are suggestive and offer a unifying perspective. I will argue that this discovery signifies the emergence of a new class of materials, that can be called **Dirac Materials**, the class where nontirivial properties emerge as a direct consequence of Dirac spectrum of excitations. I will address the local electronic properties of graphene such as impurity states, electronic inhomogeneity and discuss broad similarities with dirac physice seen in other materials.
Alexander Balatsky , Lab Fellow, Team Leader, Los Alamos National Laboratory, Los Alamos, NM, avb@lanl.gov.
Building 217, Rm. H107. (NIST Contact: Joseph Stroscio, 301-975-3716, joseph.stroscio@nist.gov)

3:00 PM - POLYMERS DIVISION SEMINAR: Flammability Properties of Polymer Nanocomposites
Synthetic polymer materials are rapidly replacing more traditional inorganic materials such as metals and natural polymeric materials such as wood. Since these novel materials are flammable, they require modifications to decrease their flammability through the addition of flame-retardant (FR) compounds. Recently, environmental regulation has restricted the use of some halogenated FR additives, initiating a search for alternative FR additives. Nanoparticle fillers are highly attractive for this purpose since they can simultaneously improve both the physical and flammability properties of the polymer nanocomposite. The effects of the shape and aspect ratio of nanoparticles, such as spherical nano silica, clay, and carbon nanotubes, and their spatial dispersion in polymer matrix on flammability properties of polymer nanocomposites are studied. We found that the formation of a jammed network structure of nanoparticles within the polymer matrix, such that the material as a whole behaves rheologically like a gel, is critical for effective FR performance.
Takashi Takashi Kashiwagi , BFRL, NIST.
224 Bldg, Rm. A-312 CR. (NIST Contact: Jan Obrzut, 301-975-6845, jano@nist.gov)

7:00 PM - ASQ SOFTWARE SPECIAL INTEREST GROUP AND SOCIETY FOR SOFTWARE QUALITY: Are You Ready for an External Audit?
"Are You Ready for an External Audit?" is about how to determine if you are ready for an audit such as CMMI appraisal or ISO 9001:2000. Carolyn Lincoln will outline a method of mapping your artifacts to the model and then measuring your progress toward readiness for the audit. Carolyn Lincoln has over 20 years of experience in IT, first as a programmer and then a project manager. For the last 10+ years, she has been working on process improvement as an internal consultant and quality assurance manager. Carolyn has participated in CMMI appraisals and ISO 9001:2000 audits and is now working with a project on ISO 20000:2005 certification. Her ASQ certifications are as a Quality Manager, Quality Auditor and Green Belt. She obtained her bachelor's degree from Michigan State University and a master's from Johns Hopkins. There is no cost to attend, but please register by noon Friday, February 22nd, 2008 by contacting Scott Ankrum at ankrums@mitre.org or 703-983-6127. Pizza and soda will be served at 6:30 PM.
Carolyn Lincoln , Quality Assurance Manager.
Administration Bldg, Lecture Rm. C. (NIST Contact: Paul E. Black, 301-975-4794, paul.black@nist.gov)


2/27 -- WEDNESDAY

1:30 PM - ATOMIC PHYSICS DIVISION SEMINAR: Quantum engineering of nanostructures: electronics and photonics
The rapid advancement of nanoscience has provided exciting possibilities to quantum-mechanically engineer the physical properties of nanostructures. In this talk, I will cover two topics with totally different flavors of quantum engineering of materials properties in nanostructures. In the first topic I will report recent progress related to how quantum confinements of electronic systems influence the formation and properties of metallic nanostructures. In the second topic I will cover the progress in quantum optical control of photonic properties of semiconductor nanostructures.
Ken Shih , Dept. of Physics, The University of Texas at Austin.
217 Bldg, Rm. H107. (NIST Contact: Glenn Solomon, 301-975-3225, glenn.solomon@nist.gov)


2/28 -- THURSDAY

10:45 AM - NIST CENTER FOR NEUTRON RESEARCH SEMINAR: X-ray Scattering from Thin Films of Block Copolymers
Block copolymer self-assembly offers a simple route to generating nanoscale arrays, and the thin film structures are promising as resists for nanolithography. However, thermally-generated topological defects disrupt the lateral ordering of domains, which is problematic for applications like semiconductor patterning. I will describe strategies to template single-crystals, free of disclinations and grain boundaries, using both topographic and chemical patterns. The resulting structures are characterized with grazing-incidence and transmission small-angle x-ray scattering to obtain quantitative and statistically significant measurements. We find complex ordering behavior unique to the thin film geometry, such as algebraic decay of the positional correlation function in equilibrium 2D crystals, and symmetry breaking transitions in both equilibrium and non-equilibrium multilayer systems.
Gila Stein , NIST Center for Nanoscale Science & Technology,. ,.
235 Bldg, Rm. E100. (NIST Contact: Dan Neumann, 301-975-5252, dan@nist.gov)

1:00 PM - POLYMERS DIVISION SEMINAR: Novel Dynamics in Stokes Flow
When an elastic fiber is moving in a Stokesian fluid, it may become susceptible to buckling instability when moving in the neighborhood of a hyperbolic point of the flow. When the stagnation point is part of a spatially-extended cellular flow, it is found that fibers can move as random walkers across time-independent closed-streamline flow. It is also found that the flow is segregated into transport regions around hyperbolic stagnation points and their manifolds, and closed entrapment regions around elliptic points. Another example is a viscous drop immersed in Stokes flow with time-varying rotation. Due to the fluid-interface interaction, the drop dynamics becomes chaotic even in the Stokesian regime. The chaotic dynamics is found to arise from a cascade of period-doubling bifurcations. We will further discuss how this findings can be useful in designing micro-fluidic mixers.
Yuan-nan Young , Professor New Jersey Institute of Technology, Department of Applied Mathematics, Newark, NJ, yyoung@oak.njit.edu.
224 Bldg, Rm. A312. (NIST Contact: Erik Hobbie, 301-975-6774, erik.hobbie@nist.gov)


2/29 -- FRIDAY

10:00 AM - POLYMERS DIVISION SEMINAR: Nanoscale analysis of molecular surfaces and interfaces – Metrology and Technology
Molecular surfaces and interfaces are of major importance in science and technology. They are central to a wide range of devices from biodiagnostics and controlled release of drug molecules to fibre treatments and organic electronics. The characterisation, understanding and control of these molecular systems are crucial for correct device functionality, operation and performance. Surface chemical analytical techniques (SIMS, XPS, AES, AFM) are powerful methods to study these systems at the nanoscale. NIST and NPL are leading the international metrology that underpins these important techniques. This talk will focus on recent developments for the identification of very complex molecules at surfaces from molecular structure using G-SIMS+SMILES, nanostructured multilayer organic film characterisation using cluster ion beams and the molecular analysis of fibre surfaces using multivariate methods. As well as developing the fundamental metrology for these techniques the metrology that supports and enables the use of these techniques in high-added value industries is essential for innovation and competitiveness. This talk will illustrate how NPL is developing metrology to support research and manufacturing of organic semiconductors and printed electronics in the UK. Abbreviations: AES Auger electron spectroscopy AFM Atomic force microscopy G-SIMS A recent development of SIMS that provides simpler spectra more directly related to the analyte molecular structure. SIMS Secondary ion mass spectrometry SMILES Simplified Molecular Input Line Entry Specification XPS X-ray photoelectron spectroscopy For more details see http://www.npl.co.uk/server.php?show=nav.526
Ian Gilmore , Science Leader - Analytical Science Team, National Physical Laboratory, United Kingdom.
224 Bldg, Rm. A312. (NIST Contact: Dean DeLongchamp, 301-975-5599, deand@nist.gov)

1:30 PM - QUANTUM ELECTRICAL METROLOGY DIVISION SEMINAR: Quantum Electrical Metrology Division Seminar: Epitaxial Graphene for Nanoelectronics
Abstract: The development of solid-state electronics follows the famous Moore's Law. However, a continuation of Moore's Law demands new materials and even a new paradigm. Graphene, though discovered recently, has been envisioned as a material for next generation electronics owing to its extraordinary properties. Although large portion of studies have been focused on exfoliated graphene, epitaxially grown graphene is seen as "the only viable route towards electronic applications". In this talk, I will discuss the phase coherence phenomena in epitaxial graphene, where we found the evidence for the chiral nature of band electrons. Then, I will show our recent work on making an epitaxial-graphene/graphene-oxide junction and its electrical properties. I will discuss why making such devices is an essential step towards epitaxial graphene electronics.
Dr. Xiao-Song Wu , School of Physics, Georgia Institute of Technology.
220 Bldg, Rm. B165. (NIST Contact: David Newell, 301-975-4228, david.newell@nist.gov)


ADVANCE NOTICE

3/6/08 9:15 AM - CNST ELECTRON PHYSICS GROUP SEMINAR: The Estimation of Spin-penetration Depth in Ferromagnetic Metals
In the development of spintronics device like a MRAM, the spin-current-induced magnetic reversal is important, because it is expected to reduce the power consumption of device. The penetration depth of transverse component of spin-current is the distance the induced spin relax in ferromagnetic metals and it influence the behavior of spin-current-induced magnetic reversal. In this work, we report the experimental determination of the spin-penetration depth.
Satoshi Yakata , Dr. - Tohoku University, Sendai, yakata2@mlab.apph.tohoku.ac.jp.
217 Bldg, Rm. H107. (NIST Contact: Robert McMichael, 301-975-5121, robert.mcmichael@nist.gov)

3/6/08 10:30 AM - CNST NANOTECHNOLOGY SEMINAR SERIES: Biomimetic Nanoscience: Challenges and Opportunities
The adaptive pressures displayed across the flora and fauna result in a variety of sophisticated nanostructured materials that are perfected to perform multiple biological functions. Our understanding of the underlying principles of their formation provides ample opportunities in the synthesis of next generation, bio-inspired, nanostructured materials. To date, there has been demonstrable progress in materials fabrication harnessing the functional power of biological systems. There is, however, a number of challenges related to the characterization of both biological and synthetic bio-related structures. I will exemplify this point by describing new synthetic strategies and devices that have been inspired by the study of two organisms – echinoderms and sponges. The topics will include self-assembly, control of crystallization, adaptive optical structures, fiber-optics, biomechanics, hybrid materials and novel actuation systems.
Joanna Aizenberg , Professor - Harvard University.
215 Bldg, Rm. C103 - C106. (NIST Contact: Nikolai Zhitenev, 301-975-6039, nikolai.zhitenev@nist.gov)

3/7/08 10:30 AM - NIST COLLOQUIUM SERIES: Energy Options: A Global Energy Perspective
This presentation evaluates the technical, political, and economic challenges involved with widespread adoption of renewable energy technologies. Topics include: the available fossil fuel resources and reserves and the remaining years of supply; a comparison of their economics with those of renewable energy technologies; greenhouse gas buildup limitations on carbon-based power consumption; the level and timescale of R&D investment needed to support the expected global energy demand; the potential of renewable energy resources to support the projected global carbon-free energy demand; and the challenges to the chemical sciences to enable the cost-effective production of carbon-free power on the needed time scale.
Nathan Lewis , Division of Chemistry and Chemical Engineering, California Institute of Technology.
Administration Building, Red Auditorium. (NIST Contact: Kum Ham, 301-975-4203, kham@nist.gov)
Special Assistance Available

3/7/08 1:30 PM - CNST ELECTRON PHYSICS GROUP SEMINAR: "Revealing Magnetic Interactions From Single-Atom Magnetization Curves"
The ongoing miniaturization of magnetic devices towards the limit of single atoms calls for appropriate tools to study their magnetic properties. We demonstrate the ability to detect magnetization curves of individual magnetic atoms adsorbed on a metallic substrate using a scanning tunneling microscope with a spin-polarized tip. This enables to map tiny magnetic interactions on the atomic length scale which is evidenced by measuring the RKKY-like indirect exchange between a cobalt adatom and a cobalt nanowire on platinum(111). The method allows for future application to magnetic defects in semiconductors, in order to improve our understanding of diluted magnetic semiconductors. As a first step we will show our detailed investigation of the electronic structure of Mn acceptors in InAs.
Jens Wiebe , Dr./Scientific Staff - University of Hamburg, , jwiebe@physnet.uni-hamburg.de.
217 Bldg, Rm. H107. (NIST Contact: Joseph Stroscio, 301-975-3716, joseph.stroscio@nist.gov)

3/19/08 8:00 AM - POLYMERS DIVISION SEMINAR: Workshop on the Directed Assembly of Functional Materials and Devices
Controlling the placement of nanoscale units into designed structures and patterns through directed assembly processes answers one of the grand challenges of nanotechnology. Innovative approaches using the directed assembly of nanoscale units are being developed to facilitate the nanofabrication of new materials and applications that can incorporate biological functionality, or devices such as flexible, large-area electronics devices. Directed assembly methods provide an opportunity to overcome limitations of traditional semiconductor processing; specifically, the small materials set with which to work, restriction to two dimensional patterning, and exorbitant equipment costs. Moving directed assembly from research demonstrations to viable manufacturing processes is difficult because it requires control over the simultaneous transport, placement, and interactions of a potentially large set of nanoscale units with different size, shape, and chemical functionality. New measurements and process control methods must be developed to enable successful implementation of this groundbreaking technology. This workshop will bring together leading researchers and stakeholders from industry, government, and academia that are actively engaged in research and development of the directed assembly of nanoparticles into functional materials and devices. Through invited presentations and focused discussions, the workshop will explore and identify the most pressing measurement and technological needs to advance directed assembly as a viable manufacturing method for future nanotechnology applications.
Heiko Wolf , International Business Machines,. Haw Yang, Christopher Murray, Oleg Gang, Babak Parviz, Dan Herr, Mike Natan, Mike Bevan, Abe Stroock, Sharon Glotzer, Kate Stebe, Chong Ahn, CJ Kim, Hiroshi Matsui, Alex Tkachenko
AML, 215 Bldg, Rm. C103/106. (NIST Contact: Steven Hudson, 301-975-6579, steven.hudson@nist.gov) http://polymers.nist.gov/Directed_Assembly/Directed_Assembly_Workshop2.htm
Rooms are wheel chair accessible.

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MEETINGS ELSEWHERE


2/25 -- MONDAY

11:00 AM - CARNEGIE INSTITUTION OF WASHINGTON/GEOPHYSICAL LAB. SEMINAR: EFFECTS OF PRESSURE, MINERALS AND WATER CONTENTS ON THE POLYMERIZATION OF GLYCINE: IMPLICATIONS TO PRE-BIOTIC PEPTIDE FORMATION IN THE HADEAN OCEANIC CRUST
S Ohara , Tohoku U/Japan.
Bldg, Rm..
Greenewalt Bldg., GL-DTM Grounds, Carnegie Institution of Washington, DC. (NIST Contact: . ., 202-478-8900, seminar@lists.ciw.edu)



2/26 -- TUESDAY

No Scheduled Events

2/27 -- WEDNESDAY

No Scheduled Events

2/28 -- THURSDAY

7:00 PM - NIST-FACILITATED PANEL DISCUSSION ON REFERENCE METROLOGY AT SPIE ADVANCED LITHOGRAPHY 2008
Ndubuisi Orji , NIST, Guest Scientist at SEMATECH, Austin, TX, ndubuisi.orji@nist.gov. The panel discussion - led by Ndubuisi G. Orji will also feature the following speakers: Bill Banke, IBM; Jason Cain, AMD, Victor Vartanian, SEMATECH; Andras Vladar, NIST; Vladimir Ukraintsev, Veeco
Bldg, Rm..
San Jose Convention Center, Room C1 San Jose, CA. (NIST Contact: Ronald Dixson, 301-975-4399, ronald.dixson@nist.gov) http://spie.org/advanced-lithography.xml



2/29 -- FRIDAY

No Scheduled Events

ADVANCE NOTICE

No Scheduled Events

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TALKS BY NIST PERSONNEL

WANG, C. : CD-SAXS MEASUREMENTS USING LAB-BASED AND SYNCHROTRON-BASED INSTRUMENTS.
SPIE Advanced Lithography Conference, San Jose, CA, 2/25.

LEE, H. : EXPLORING THE LIMITATIONS OF X-RAY REFLECTIVITY AS A CRITICAL DIMENSION PATTERN SHAPE METROLOGY.
SPIE Meeting, San Jose, CA, 2/25.

SOLES, C. : METROLOGY FOR NANOIMPRINT LITHOGRAPHY.
SPIE Advanced Lithography Conference, San Jose, CA, 2/26.

SOLES, C. : MASSIVELY PARALLEL TOOLS FOR NANOTECHNOLOGY: APPLICATIONS IN LITHOGRAPHY AND METROLOGY.
SPIE Advanced Lithography Conference, San Jose, CA, 2/27.

KANG, S. : A COMPARISON OF THE REACTION-DIFFUSION KINETICS BETWEEN MODEL EUV POLYMER AND MOLECULAR GLASS PHOTORESISTS.
SPIE Meeting, San Jose, CA, 2/27.

KARIM, A. : ADVANCED METHODS FOR NANOMATERIALS PROCESSING AND CHARACTERIZATION.
SPE-ANTEC International Polyolefins Conference, Houston, TX, 2/27.

YU, L. : ELECTRON-PHONON AND ELECTRON-ELECTRON INTERACTIONS IN MOLECULAR JUNCTIONS.
University of Memphis, Department of Physics, Memphis, TN, 2/27.

WU, W. : LWR MEASUREMENT BY CD-SAXS, SEM AND OCD.
SPIE Advanced Lithography Conference, San Jose, CA, 2/28.

ZHANG, X. : DIRECTED SELF-ASSEMBLY USING CURVED TEMPLATES.
SPIE Advanced Lithography Conference, San Jose, CA, 2/28.

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ANNOUNCEMENTS

VISITOR REGISTRATION FOR NIST EVENTS
Because of heightened security at the NIST Gaithersburg site, members of the public who wish to attend meetings, seminars, lectures, etc. must first register in advance. For more information please call or e-mail the "NIST Contact" for the particular event you would like to attend.
NIST Contact: . ., ., .

IC ANNOUCEMENT FOR FY2008 POSTDOCTORAL RESEARCH FELLOWSHIPS
The Intelligence Community(IC) has released its Broad Area Announcement (BAA) for FY 2008 Postdoctoral Research Fellowships. The mission of the IC Postdoctoral Research Fellowship Program is to establish long-term relationships and mentoring of postdoctoral researchers and to provide research institutes with an understanding of the Intelligence Community's research requirements. Since 2000 the program has promoted basic research in support of broad IC needs, simultaneously facilitating communication and connections between members of scientific and the IC communities. Instructions for Universities, Industry and non-profits are available on-line but the submission requirements for US government agencies is quite different. Please note that NIST applicants do not apply through grants.gov. As in the past, proposals must be sent to OIAA to forward to the IC coordinator. Detailed instructions for NIST are provided at: http://www-i.nist.gov/oiaa/ic_postdoc.pdf In order to submit on time from NIST, OIAA requests receipt of proposals to our office by COB 5 March 2008.
NIST Contact: Susan Heller-Zeisler, 301-975-3111, szeisler@nist.gov

5TH NIST POLYMER MASS SPECTROMETRY WORKSHOP
This workshop will bring together researchers and practitioners to present new results, discuss recent trends, and identify important problems in the mass spectrometry of synthetic macromolecules and engineered nanoparticles. The Workshop schedule includes invited hour-long talks by internationally recognized leaders in their respective fields, a poster session, and a problem solving session where workshop participants will be asked to present measurement problems they have encountered in their own work for comment and discussion by other workshop participants.
NIST Contact: William E. Wallace, 301-975-5886, william.wallace@nist.gov

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NIST WEB SITE ANNOUNCEMENTS

No Web Site announcements this week.

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For more information, contact Ms. Sharon Hallman, Editor, Stop 2500, National Institute of Standards and Technology, Gaithersburg MD 20899-2500; Telephone: 301-975-TCAL (3570); Fax: 301-926-4431; or Email: tcal@nist.gov.

All lectures and meetings are open unless otherwise stated.

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