Accessibility Information

Users of assistive technologies such as screen readers should use the following link to activate Accessibility Mode before continuing: Learn more and Activate accessibility mode.

--advanced respiratory and ocular protection technologies

Solicitation Number: 08-P-RESPTECH
Agency: Department of the Army
Office: U. S. Army Materiel Command
Location: RDECOM Acquisition Center - Natick
  • Print
:
08-P-RESPTECH
:
Special Notice
:
Added: Jul 17, 2008 2:22 pm
REQUEST FOR INFORMATION: Respiratory & Ocular Protection Technologies

The Joint Project Manager for Individual Protection (JPM-IP) is conducting a market survey to determine the availability of advanced respiratory and ocular protection technologies for current and future individual protection ensembles. Respiratory and ocular protection technology that can immediately integrate with and markedly enhance the performance of the Joint Service General Purpose Mask (JSGPM) M50 (Ground Variant), M51 (Combat Vehicle Crew Variant), M53 (Special Operations Variant), and/or the Joint Service Aircrew Mask (JSAM) Type I and Type II is highly desired. Additionally, the JPM-IP is seeking novel respiratory and ocular protection technology that could be pursued for the next generation Joint Chemical Ensemble (JCE) program. This Request for Information should be considered an open call for any materials, designs and/or concepts of technology, regardless of maturity level, that has the possibility of improving the respiratory and ocular protection of the warfighter.

Respiratory and ocular protection technologies of interest include, but are not limited to:

" Advanced materials, designs and/or concepts for adsorption and/or neutralization of vapor chemical hazards Chemical Warfare Agents (CWAs), Non-traditional Agents (NTAs) and/or any Toxic Industrial Chemicals (TICs) are highly desired. Interest is in capability across a broad spectrum of environmental conditions (i.e. temperature, relative humidity, common battlefield contaminates, etc.).

" Advanced materials, designs and/or concepts for removal and/or neutralization of vaporous and aerosolized chemical and biological agents and TICs as well as chemical, biological and radioactive particulates.

" Advanced materials, designs and/or concepts to reduce the logistics burden of the currently fielded masks or the next generation system either using existing respiration and ocular technologies or advanced technologies. Logistics considerations include, but are not limited to: unit cost, volume, weight, increased capacity to reduce replacements, service-life indicator, ability to retain capability in the operational environment (i.e., reduce impact of ambient water vapor), increased storage life, and storage life indicator.

" Advanced materials, designs and/or concepts to improve human factors performance such as reduction in breathing resistance, cartridge profile, and total weight.

" Producibility efficiencies of current and/or future filtration technologies to reduce scrap rate and overall cost.

Additional details and information regarding this announcement will be discussed at the upcoming National Defense Industrial Association (NDIA) sponsored JPM-IP & JPM-Collective Protection Filtration Industry Day taking place from 22-23 July 2008 at the Hyatt Regency in Baltimore, Maryland.

Please provide a white paper (10-page limit) explaining the capabilities, materials, designs and/or concepts identified above. Please include any test data that demonstrates the performance of the material, design and/or concept proposed. Include additional supporting documentation as applicable. After all proposals have been received and reviewed, additional materials, prototypes and/or information may be solicited for further Government evaluation. Please submit responses by 30 September 2008 to the Program Office points of contact identified below.

This is not a Request for Proposals, Invitation for Bid, or an announcement of a solicitation. This request is for information and planning purposes only and is not to be considered as a commitment by the Government. This document will assist the Government in identifying potential sources. Response to this RFI is strictly voluntary and will not affect future ability to submit an offer if a solicitation is released. The Government does not intend to award a contract on the basis of this RFI, nor will the Government otherwise pay for information submitted in response to this RFI. The Government will not release any information marked with a Proprietary legend received in response to this RFI to any firm, agency, or individual outside the Government without written permission.

Program Office Address:
Joint Program Executive Office for Chemical and Biological Defense (JPEO-CBD), Joint Project Officer Individual Protection (JPM-IP), 50 Tech Parkway, Suite 301, Stafford, VA 22556
Points of Contact:
Dr. Karen McGrady, (703) 617-2441; email: karen.a.mcgrady@usmc.mil
Nick Hanak, (703) 617-2467; e-mail: nhanak@jrad.us
Contracting Office Address:
RDECOM Acquisition Center - Natick, ATTN: AMSRD-ACC-N, Natick Contracting Division (R and BaseOPS), Building 1, Kansas Street, Natick, MA 01760-5011
Point of Contact:
Richard Alves, (508) 233-5922; e-mail: richard.alves@us.army.mil
This synoposis will close on the 30th September 2008 at 08:00 am, EST.
:
RDECOM Acquisition Center - Natick, ATTN: AMSRD-ACC-N, Natick Contracting Division (R and BaseOPS), Building 1, Kansas Street, Natick, MA 01760-5011
:
greg.n.wilson, 508 233-4161

RDECOM Acquisition Center - Natick