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NIST GEC Reference Cell Publications


Single copies of these papers can be obtained by contacting
Jim Olthoff,   Eric Benck,   Kristen Steffens,   or   Mark Sobolewski.

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2003
  1. "Effect of changing the electrode gap on the spatial and electrical properties of O2/CF4 plasmas,"” K.L. Steffens, M.A. Sobolewski, J. Vac. Sci. Technol. A 21, 241-250 (2003). (Reprint 285 kB)
  2. " Submillimeter-Wavelength Plasma Chemical Diagnostics for Semiconductor Manufacturing," E.C. Benck, G.Y. Golubiatnikov, G.T. Fraser, B. Ji, S.A. Motika, and E.J. Karwacki, accepted for pulication in J. Vac. Sci. Technol. B 21 (2003). (Preprint 318 kB)
  3. "Ion energy distribution and optical measurements in high-density, inductively coupoled C4F6 discharges,"" E.C. Benck, A. Goyette, and Y. Wang, J. Appl. Phys. 94, 1382-1389 (2003). (Reprint 142 kB)
  4. "Submillimeter-wavelength plasma diagnostics for semiconductor manufacturing," E.C. Benck, G.Y. Golubiatnikov, G.T. Fraser, D. Pluesquelic, R. Lavrich, B. Ji, S.A. Motika, and E.J. Karwacki, accepted for publication in Characterization and Metrology for ULSI Technology: 2003 International Conference, ed. by D.G. Seiler et al., (NIST, Gaithersburg, MD). (Preprint 107 kB)
  5. "Monitoring sheath voltages and ion energies in high density plasmas using noninvasive radio-frequency current and voltage measurements,"" M.A. Sobolewski, accepted for publication in Characterization and Metrology for ULSI Technology: 2003 International Conference, ed. by D.G. Seiler et al., (NIST, Gaithersburg, MD).
  6. "Transition from E to H mode discharge in pulse-modulated inductively coupled plasmas"," M. Edamura and E.C. Benck, J. Vac. Sci. Technol. A 21, 470-475 (2003). (Preprint 211 kB)

2002
  1. "Measurements and modeling of ion energy distributions in high-density, radio-frequency biased CF4 discharges," M.A. Sobolewski, Y. Wang, and A. Goyette, J. Appl. Phys. 91, 6303-6314 (2002). (Reprint 201 kB).

2001
  1. "Measuring the ion current in high-density plasmas using radio-frequency current and voltage measurements," M.A. Sobolewski, J. Appl. Phys. 90, 2660-2671 (2001). (Reprint 195 kB).
  2. "Ion fluxes and energies in inductively coupled radio-frequency discharges containing SF6," A.N. Goyette, Y. Wang, and J.K. Olthoff, J. Vac. Sci. Technol. A, 19, 1294-1297 (2001). (Preprint 127 kB).

2000
  1. "Sheath model for radio-frequency-biased, high density plasmas valid for all omega/omegai," M.A. Sobolewski, Phys. Rev. E, 62 (6), 8540-8553 (2000).
  2. "Investigation and control of spatial characteristics of chamber-cleaning plasmas," K.L. Steffens and M.A. Sobolewski, in Characterization and Metrology for ULSI Technology: 2000 International Conference, ed. by D.G. Seiler et al., (NIST, Gaithersburg, MD), CP550, pp. 233-237. (Preprint 133 kB)
  3. "Fiber optic based optical tomography sensor for monitoring plasma uniformity," E.C. Benck and K. Temadi, in Characterization and Metrology for ULSI Technology: 2000 International Conference, ed. by D.G. Seiler et al. (NIST, Gaithersburg, MD), CP550, pp. 268-272 (2000). (Preprint 140 kB)
  4. "Comparison of the identities, fluxes, and energies of ions formed in high density fluorocarbon discharges," A.N. Goyette, Y. Wang, and J.K. Olthoff, in Characterization and Metrology for ULSI Technology: 2000 International Conference, ed. by D.G. Seiler et al. (NIST, Gaithersburg, MD), CP550, pp. 238-242 (2000). (Preprint 73 kB)
  5. "Monitoring ion current and ion energy during plasma processing using radio-frequency current and voltage measurements," M.A. Sobolewski, in Characterization and Metrology for ULSI Technology: 2000 International Conference, ed by D.G. Seiler et al. (NIST, Gaithersburg, MD), CP550, pp. 263-267 (2000).
  6. "Mass-resolved studies of positive ions in high density plasmas generated in CHF3, C2F6, and CH2FCF3 and their mixtures with Ar," Y. Wang, A.N. Goyette, M. Misakian, and J.K. Olthoff, in Proc XIII Intl. Conf. on Gas Discharges and Their Applications, ed. by S.J. MacGregor (University of Strathclyde, Glasgow, U.K.), Vol. 2, pp. 655-658 (2000).
  7. "Time evolution of ion energy distributions and optical emission in pulsed inductively coupled radio frequency plasmas," M. Misakian, E. Benck, and Y. Wang, J. Appl. Phys. 88, 4510-4517 (2000). (Preprint 215 kB)
  8. "Ion fluxes and energies in inductively coupled radio-frequency discharges containing CHF3," Y. Wang, M. Misakian, A.N. Goyette, and J.K. Olthoff, J. Appl. Phys. 88 (10), 5612-5617 (2000). (Reprint 190 kB)
  9. "Inductively coupled plasmas in low global-warming-potential gases," A.N. Goyette, Y. Wang, and J.K. Olthoff, J. Phys. D: Appl. Phys. 33, 2004-2009 (2000). (Preprint 205 kB)
  10. "Ion fluxes and energies in inductively coupled radio-frequency discharges containing C2F6 and c-C4F8," A.N. Goyette, Y. Wang, M. Misakian, and J.K. Olthoff, J. Vac. Sci. Technol. A 18 (6), 2785-2790 (2000). (Reprint 252 kB)
  11. "Calculation of ion energy distributions from radio frequency plasmas using a simplified kinetic approach," M. Misakian and Y. Wang, J. Appl. Phys. 87 (8), 3646-3653 (2000). (Reprint 113 kB)
  12. "Time-resolved measurements of ion energy distributions and optical emissions in pulsed radio-frequency discharges," Y. Wang, E.C. Benck, M. Misakian, M. Edamura, and J.K. Olthoff, J. Appl. Phys. 87 (5) 2114-2121 (2000). (Reprint 128 kB)

1999
  1. "Electrical control of the spatial uniformity of reactive species in plasmas," M.A. Sobolewski and K.L. Steffens,  J. Vac. Sci. Technol. A 17 (6), 3281-3292 (1999). (Reprint 293 kB)
  2. "Optimizing utilization efficiencies in electronegative discharges: The importance of the impedance phase angle," W.R. Entley, J.G. Langan, B.S. Felker, and M.A. Sobolewski, J. Appl. Phys. 86 (9) 4825-4835 (1999). (Reprint 226  kB)
  3. "Ion energy distributions and sheath voltages in a radio-frequency-biased, inductively-coupled plasma reactor," M.A. Sobolewski, J.K. Olthoff, and Y. Wang, J. Appl. Phys. 85 (8), 3966-3975 (1999). (Reprint 186 kB)
  4. "Electrical control of plasma spatial uniformity investigated by planar laser-induced fluorescence," K.L. Steffens and M.A. Sobolewski, IEEE Trans. Plasma Sci. 27 (1), 74-75 (1999).
  5. "Planar laser induced fluorescence of CF2 in O2/CF4 and O2/C2F6 chamber-cleaning plasmas: Spatial uniformity and comparison to electrical measurements," K.L. Steffens and M.A. Sobolewski, J. Vac. Sci. Technol. A 17 (2), 517-527 (1999). (Reprint 336 kB)
  6. "Experimental test of models of high-plasma-density, radio-frequency sheaths," M.A. Sobolewski, Phys. Rev. E 59 (1), 1059-1072 (1999).
  7. "Dynamic model of the plasma sheath in high-plasma-density, radio-frequency discharges," M.A. Sobolewski, in Proceedings of the 1999 International Conference on Phenomena in Ionized Gases, Warsaw, Poland (1999), Vol. 1, pp. 141-142.
  8. "Studies of ion bombardment in high density plasmas containing CF4," J.K. Olthoff and Y.C. Wang, J. Vac. Sci. Technol. A 17 (4) 1552-1555, Part 1 (1999). (Reprint 103 kB)
  9. "Ion energy distributions in inductively coupled radio-frequency discharges in argon, nitrogen, oxygen, chlorine, and their mixtures," Y. Wang and J.K. Olthoff, J. Appl. Phys. 85 (9) 6358-6365 (1999). (Reprint 164 kB)

1998
  1. "Comparison of electron density measurements in planar inductively coupled plasmas by means of the plasma oscillation method and Langmuir probes," A. Schwabedissen, E.C. Benck, and J.;R. Roberts, Plasma Sources Sci. Technol. 7, 119 (1998).
  2. "Investigations in the sheath region of a radio frequency biased inductively coupled discharge," E.C. Benck, A. Schwabedissen, A. Gates, and J.R. Roberts, J. Vac. Sci. Technol. A 16(1), 306-315 (1998). (Reprint 777 kB)
  3. "Optical computer aided tomography measurements of plasma uniformity in an inductively coupled discharge," E.C. Benck and J.R. Roberts, in Characterization and Metrology for ULSI Technology: 1998 International Conference, AIP Conference Proceedings (NIST, Gaithersburg, MD, 1998), 449, 431-435.
  4. "Novel ion current sensor for real-time, in-situ monitoring and control of plasma processing," M.A. Sobolewski, in Characterization and Metrology for ULSI Technology:  1998 International Conference, AIP Conference Proceedings (NIST, Gaithersburg, MD, 1998), 449, 449-453.
  5. "Spatial uniformity in chamber-cleaning plasmas measured using planar laser-induced fluorescence," K.L. Steffens and M.A. Sobolewski, in Characterization and Metrology for ULSI Technology: 1998 International Conference, AIP Conference Proceedings (NIST, Gaithersburg, MD, 1998), 449, 454-458.
  6. "Optical computer aided tomography for plasma uniformity measurements," E.C. Benck and J.R. Roberts, in Proceedings of the Plasma Etch Users Group, The Fourth International Workshop on Advanced Plasma Tools and Process Engineering (Millbrae, CA, 1998), 8-13.
  7. "Mass spectrometric measurement of molecular dissociation in inductively coupled plasmas," Y.C. Wang, R.J. Van Brunt, and J.K. Olthoff, J. Appl. Phys. 83 (2), 703-708 (1998). (Reprint 106 kB)
  8. "Measuring the ion current in electrical discharges using radio-frequency current and voltage measurements," M.A. Sobolewski, Appl. Phys. Lett. 72 (10), 1146-1148 (1998). (Reprint 67 kB)
  9. "Electrical optimization of PECVD chamber cleaning plasmas," M.A. Sobolewski, J.G. Langan and B.S. Felker, J. Vac. Sci. Technol. B 16 (1), 173-182 (1998). (Reprint 234 kB)

1997
  1. "Influence of different coil geometries on the spatial distribution of the plasma density in planar inductively coupled plasmas," A. Schwabedissen, E.C. Benck, and J.R. Roberts, Physical Review E 56, 5866 (1997).
  2. "Langmuir probe measurements in an inductively coupled plasma source," A. Schwabedissen, E.C. Benck and J.R. Roberts, Phys. Rev.  E 55, 3450 (1997).
  3. "Plasma diagnostics on the Gaseous Electronics Conference radio frequency reference cell," J.K. Olthoff, in Proceedings of Frontiers in Low Temperature Plasma Diagnostics II (Physikzentrum, Bad Honnef, Germany, February 17-21, 1997), p. 47.
  4. "Dynamic model of the radio-frequency plasma sheath in a highly asymmetric discharge cell," M.A. Sobolewski, Phys. Rev. E 56, 1001-1011 (1997).
  5. "Experimental test of models of radio-frequency plasma sheaths," M.A. Sobolewski, Appl. Phys. Lett. 70 (8), 1049-1051 (1997). ( Reprint 92 kB)
  6. "Two-dimensional imaging of CF2 density by laser-induced fluorescence in CF4 etching plasmas in the Gaseous Electronics Conference reference cell," B.K. McMillin and M.R. Zachariah, J. Vac. Sci. Technol. A 15 (2) 230 (1997).
  7. "Spatial and time characteristics of low temperature of plasmas for materials processing," S. Djurovic', J.R. Roberts, and J.K. Olthoff, J. Magnetohydrodynamics and Plasma Res. 7 (1) 1-18 (1997).

1996
  1. "Electron density measurements in a rf helium discharges by laser-collisional induced fluorescence method," K. Dzierzega, K. Musiol, E. Benck, and J.R. Roberts, J. Appl. Phys. 80 (6), 3196-3201 (1996). (Reprint 119 kB)
  2. "Optical and mass spectrometric investigations of ions and neutrals in SF6 radio-frequency discharges," R. Foest, J.K. Olthoff, R.J. Van Brunt, E.C. Benck, and J.R. Roberts, Phys. Rev. E 54, 1876 (1996).
  3. "Evidence for inelastic processes for N3+ and N4+ from ion energy distributions in He/N2 rf glow discharges," H.H. Hwang, J.K. Olthoff, R.J. Van Brunt, S.B. Radovanov, and M.J. Kushner, J. Appl. Phys. 79 (1), 93-98 (1996). (Reprint 134 kB)
  4. "2-D concentration maps by planar laser-induced fluorescent imaging," M.R. Zachariah and B.K. McMillin, Solid State Technol. 39 (6) 147 (1996).
  5. "Two-dimensional laser-induced fluorescence imagning of metastable density in low-pressure radio frequency argon plasmas with added O2, Cl2, and CF4," B.K. McMillin and M.R. Zachariah, J. Appl. Phys. 79 (1) 77-85 (1996).
  6. "2-D images of CF2 density in CF4/Ar plasmas by laser-induced fluorescence in a GEC rf Reference Cell," B.K. McMillin and M.R. Zachariah, IEEE Trans. Plasma Sci. (Special Issue on Images in Plasma Science) 24 (1), 113 (1996).

1995
  1. "Two-dimensional argon metastable density measurements in a radio frequency plasma reactor by planar laser-induced fluorescence imaging," B.K. McMillin and M.R. Zachariah, J. Appl. Phys. 77 (11), 5538 (1995).
  2. "2-D imaging of CF2 density by laser-induced fluorescence of CF4 etching plasmas in the GEC rf Reference Cell," B.K. McMillin and M.R. Zachariah, in Proc. 12th International Symposium on Plasma Chemistry, (Minneapolis, MN, 1995), Vol. 1, p. 539.
  3. "Electrical characteristics of argon radio-frequency glow discharges in an asymmetric cell," M.A. Sobolewski, IEEE. Trans. Plasma Science 23, 1006-1022 (1995).
  4. "Time-resolved Balmer-alpha emission from fast hydrogen atoms in low pressure,  radio-frequency discharges in hydrogen," S.B. Radovanov, K. Dzierzega, J.R. Roberts, and J.K. Olthoff, Appl. Phys. Lett. 66 (20), 2637-2639 (1995). (Reprint 138 kB)
  5. "The Gaseous Electronics Conference RF Reference Cell - An Introduction," J.K. Olthoff and K.E. Greenberg, J. Res. Natl. Inst. Stand. Technol. 100, 327 (1995).
  6. "Current and voltage measurements in the Gaseous Electronics Conference rf Reference Cell," M.A. Sobolewski, J. Res. Natl. Inst. Stand. Technol. 100, 341-351 (1995).
  7. "Optical emission on the Gaseous Electronics Conference RF Reference Cell," J.R. Roberts, J. Res. Natl. Inst. Stand. Technol. 100, 353 (1995).
  8. "Studies of ion kinetic-energy distributions in the Gaseous Electronics Conference RF Reference Cell," J.K. Olthoff, R.J. Van Brunt, and S.B. Radovanov, J. Res. Natl. Inst. Stand. Technol. 100, 383 (1995).
  9. "Ion kinetic-energy distributions and Balmer-Alpha excitation in Ar-H2 radio frequency discharges," S.B. Radovanov, J.K. Olthoff, R.J. Van Brunt, and S. Djurovic, J. Appl. Phys. 78 (2), 746-757 (1995). (Reprint 1617 kB)
  10. "Effect of electrode material on measured ion energy distributions in radio-frequency discharges," J.K. Olthoff, R.J. Van Brunt, and S.B. Radovanov, Appl. Phys. Lett. 67 (4), 473-475 (1995). (Reprint 59 kB)
  11. "Kinetic-energy distributions of ions from radio-frequency discharges in helium, nitrogen, and oxygen," R.J. Van Brunt, J.K. Olthoff, and S.B. Radovanov, in Proc. Eleventh Intl. Conf. on Gas Discharges and Their Applications, (Chou University, Tokyo, Japan, 1995), p.  I-486.
  12. "Influence of electrode material on measured ion kinetic-energy distributions in radio-frequency discharges," R.J. Van Brunt, J.K. Olthoff, and S.B. Radovanov, in XXII International Conference on the Physics of Ionized Gases, Contributed Papers 2 (Stevens Institute of Technology, Hoboken, NJ, 1995), p. 29.

1994
  1. "Kinetic-energy distributions of ions sampled from argon plasmas in a parallel-plate rf reference cell," J.K. Olthoff, R.J. Van Brunt, S.B. Radovanov, J.A. Rees, and R. Surowiec, J. Appl. Phys. 75 (1), 115-125 (1994). (Reprint 1624 kB)
  2. "The GEC RF Reference Cell: A parallel-plate radio frequency system to study plasma-processing discharges," P.J. Hargis, Jr., K.E. Greenberg, P.A. Miller, J.B. Gerardo, J.R. Torczynski, M.E. Riley, G.A. Hebner, J.R. Roberts, J.K. Olthoff, J.R. Whetstone, R.J. Van Brunt, M.A. Sobolewski, H.M. Anderson, M.P. Splichal, J. L. Mock, P. Bletzinger, A. Garscadden, R.A. Gottscho, G. Selwyn, M. Dalvie, J.E. Heidenreich, J.W. Butterbaugh, M.L. Brake, M.L. Passow, J. Pender, A. Lujan, M.E. Elta, D.B. Graves, H.H. Sawin, M.J. Kushner, J.T. Verdeyen, R. Horwath, and T.R. Turner, Rev. Sci. Instrum. 65 (1), 140-154 (1994). (Reprint 1990 kB)
  3. "Use of an ion energy analyzer-mass spectrometer to measure ion kinetic-energy distributions from rf discharges in argon-helium gas mixtures," J. K. Olthoff, R.J. Van Brunt, S.B. Radovanov, and J.A. Rees, IEEE Proc. Sci. Meas. Technol. 141, 105 (1994).
  4. "Electrical sensors for monitoring rf plasma sheaths," M.A. Sobolewski and J.K. Olthoff, SPIE Proc. Vol. 2091: Microelectronic Processes, Sensors, and Controls, 290-300 (1994).

1993
  1. "Electrical Measurements for Monitoring and Control of RF Plasma Processing," M.A. Sobolewski and J.R. Whetstone, SPIE Proceedings Vol. 1803: Advanced Techniques for Integrated Circuit Processing II, 309-320 (1993).
  2. "Absolute spatially- and temporally-resolved optical emission measurements of rf glow discharges in argon," S. Djurovic, J.R. Roberts, M.A. Sobolewski, and J.K. Olthoff, J. Res. Natl. Inst. Stand. and Technol. 98, 159-180 (1993).
  3. "Hydrogen Balmer alpha line shapes for hydrogen-argon mixtures in a low pressure rf discharge," S. Djurovic and J.R. Roberts, J. Appl. Phys. 74 (11), 6558-6565 (1993).

1992
  1. "Electrical characterization of radio-frequency discharges in the Gaseous Electronics Conference Reference Cell," M.A. Sobolewski, J. Vac. Sci. Technol. A 10, 3550-3562 (1992).
  2. "Diagnostic measurements in rf plasmas for materials processing," J.R. Roberts, J.K. Olthoff, M.A. Sobolewski, R.J. Van Brunt, J.R. Whetstone, and S. Djurovic, in Atomic Processes in Plasmas, AIP Conference Proceedings 257, (American Institute of Physics, New York, 1992), p. 157-168.
  3. "Ion kinetic-energy distributions and electrical measurements in argon-oxygen rf glow discharges," J.K. Olthoff, R.J. Van Brunt, and M.A. Sobolewski, in Proc. Tenth Intl. Conf. on Gas Discharges and Their Applications, (University College of Swansea, Swansea, Wales, U.K., 1992), p. 440-443.
  4. "Ion kinetic-energy distributions in rf glow discharges," J.K. Olthoff, R.J. Van Brunt, and S.B. Radovanov, J. Appl. Phys. 72 (10), 4566-4574 (1992). (Reprint 1154 kB)

1991
  1. "Mass spectrometric and optical emission diagnostics for rf plasma reactors," J.K. Olthoff, J.R. Roberts, R.J. Van Brunt, J.R. Whetstone, M.A. Sobolewski, and S. Djurovic, in Process Module Metrology, Control, and Clustering, (Society of Photo-Optical Instrumentation Engineers, SPIE, 1991), Vol. 1594, p. 168-178.

1990
  1. "Measurements on the NIST GEC Reference Cell," J.R. Roberts, J.K. Olthoff, R.J. Van Brunt, and J.R. Whetstone, in Advanced Techniques for Integrated Circuit Processing, (Society of Photo-Optical Instrumentation Engineers, SPIE, 1990), Vol. 1392, p. 428.
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Online: April 1999   -   Last Update: September 2003