NASA Technical Reports Server
+ Visit NASA.gov
+ Contact NASA
ABOUT NTRS SEARCH NTRS NTRS NEWS HELP FEEDBACK ORDER NASA INFO.
  + Home
SEARCH NTRS
Term Search Options
*
  Go Search   Reset Search
Search Tips:
  • Use only the fields with * to search NIX collection.
  • Enclose terms in double quotation marks (") to search for exact phrases, ie: "space shuttle". NOTE: Commas and dashes are removed from search term by search engine.
  • Select Reset Search button to start a new search. See Help for more tips.
  • Navigattion Search Options + NASA Center
    + Publication Year
    + Availability Options

    Search NTRS Visit the STI Program Web Site
    SEARCH NTRS
    Selected Navigations: [Remove]
  • Item/Media Type > Patent [x]
  • Subject > P-R > Plasma Physics [x]

  • Sort results by: NASA Center | Date Added to NTRS | Publication Year
    There are a total of 13 record(s) matching your query.
    Sorted by: Date Added To NTRS in Descending order

    1 2 Next 
    Large area plasma source

    Abstract: An all permanent magnet Electron Cyclotron Resonance, large diameter (e.g., 40 cm) plasma source suitable for ion/plasma processing or electric propulsion, is capable of producing uniform ion current densities at its exit ...
    NASA Center: NASA (non Center Specific)
    Publication Year: 2008
    Added to NTRS: 2009-01-22
    Document ID: 20090002654

    Method for generation of tunable far infrared radiation from two-dimensional plasmons

    Abstract: Tunable far infrared radiation is produced from two-dimensional plasmons in a heterostructure, which provides large inversion-layer electron densities at the heterointerface, without the need for a metallic grating to couple ...
    NASA Center: NASA (non Center Specific)
    Publication Year: 1989
    Added to NTRS: 2008-07-24
    Document ID: 20080012283

    Slotted antenna waveguide plasma source

    Abstract: A high density plasma generated by microwave injection using a windowless electrodeless rectangular slotted antenna waveguide plasma source has been demonstrated. Plasma probe measurements indicate that the source could be ...
    NASA Center: NASA (non Center Specific)
    Publication Year: 2007
    Added to NTRS: 2008-04-01
    Document ID: 20080009435

    Compact plasma accelerator

    Abstract: A compact plasma accelerator having components including a cathode electron source, an anodic ionizing gas source, and a magnetic field that is cusped. The components are held by an electrically insulating body having a ...
    NASA Center: NASA (non Center Specific)
    Publication Year: 2004
    Added to NTRS: 2008-02-08
    Document ID: 20080007439

    Method for defect free keyhole plasma arc welding

    Abstract: A plasma arc welding process for welding metal of increased thickness with one pass includes operating the plasma arc welding apparatus at a selected plasma gas flow rate, travel speed and arc current, to form a weld having ...
    NASA Center: Marshall Space Flight Center
    Publication Year: 1993
    Added to NTRS: 2008-01-30
    Document ID: 20080004268

    Plasma-assisted microwave processing of materials

    Abstract: A microwave plasma assisted method and system for heating and joining materials. The invention uses a microwave induced plasma to controllably preheat workpiece materials that are poorly microwave absorbing. The plasma ...
    NASA Center: NASA (non Center Specific)
    Publication Year: 1998
    Added to NTRS: 2008-01-30
    Document ID: 20080004546

    Plasma cleaning device

    Author(s): Shannon, R. L.
    Abstract: High vacuum cleaning of contaminated surfaces such as hydrocarbon containment films can be accomplished by a plasma cleaning device which includes a plasma discharge housing to permit generation of a plasma in an environment ...
    NASA Center: Marshall Space Flight Center
    Publication Year: 1978
    Added to NTRS: 2008-01-25
    Accession Number: 78N27913; Document ID: 19780019970

    Method for anisotropic etching in the manufacture of semiconductor devices

    Abstract: Hydrocarbon polymer coatings used in microelectronic manufacturing processes are anisotropically etched by hyperthermal atomic oxygen beams (translational energies of 0.2 to 20 eV, preferably 1 to 10 eV). Etching with ...
    NASA Center: Johnson Space Center
    Publication Year: 1993
    Added to NTRS: 2008-01-25
    Accession Number: 94N20491; Document ID: 19940016018

    Plasma gun with coaxial powder feed and adjustable cathode

    Abstract: An improved plasma gun coaxially injects particles of ceramic materials having high melting temperatures into the central portion of a plasma jet. This results in a more uniform and higher temperature and velocity ...
    NASA Center: Glenn Research Center
    Publication Year: 1991
    Added to NTRS: 2008-01-25
    Accession Number: 91N25875; Document ID: 19910016561

    METHOD OF PRODUCING AND ACCELERATING AN ION BEAM

    Abstract: A method of producing and accelerating an ion beam comprising the steps of providing a magnetic field with a cusp that opens in an outward direction along a centerline that passes through a vertex of the cusp: providing an ...
    NASA Center: Glenn Research Center
    Publication Year: 2005
    Added to NTRS: 2006-08-02
    Document ID: 20060009300

    1 2 Next 

    + Back to Top
    USAGov logoExternal Site
    + Sponsored by the NASA Scientific and Technical
       Information Program

    + 2004 Vision for Space Exploration
    + Freedom of Information Act
    + NASA Web Privacy Policy and Important Notices
    + NASA Disclaimers, Copyright Notice,
       and Terms and Conditions of Use


    NASA

    NASA Official: Calvin Mackey
    Page Curator: NASA Center for AeroSpace Information (help@sti.nasa.gov)
    Last Updated: July 5, 2007