Publications of the Analytical Microscopy Group

Selected Recent Outputs from the Analytical Microscopy Group

Semiconductor Characterization

D. S. Simons, P. H. Chi, P. M. Kahora, G. E. Lux, J. L. Moore, S. W. Novak, C. Schwartz, S. A. Schwarz, F. A. Stevie, and R. G. Wilson, "Are Relative Sensitivity Factors Transferable Among SIMS Instruments?" in Secondary Ion Mass Spectrometry SIMS VII, A. Benninghoven et al. eds, (Chichester, John Wiley and Sons, 1990) pp. 111-114.

P. H. Chi and D. S. Simons, "Factors That Affect Reproducibility in SIMS Analysis of Semiconductors," in Secondary Ion Mass Spectrometry SIMS VII, A. Benninghoven et al. eds, (Chichester, John Wiley and Sons, 1990) pp. 127- 130.

D. R. Myers, L. R. Dawson, J. F. Klem, T. M. Brennan, B. E. Hammons, D. S. Simons, J. Comas, and J. Pellegrino, "Unintentional Indium Incorporation in GaAs Grown by Molecular-Beam Epitaxy," Applied Physics Letters 57 (1990) 2321-2323.

P. H. Chi, D. S. Simons, and P. Roitman, "Quantitative Analysis of Impurities in SIMOX Samples Using Secondary Ion Mass Spectrometry," Surface and Interface Analysis 17 (1991) 57-61.

D. S. Simons, P. H. Chi, and D. B. Novotny, "Evidence From SIMS of Doubly- charged Boron Contamination During Singly-charged Ion Implantation," in Electron Microscopy-1990, Vol. 2, L. D. Peachey and D. B. Williams, eds., pp. 316-317.

J. Bennett and D. Simons, "Relative Sensitivity Factors and Useful Yields for a Microfocused Gallium Ion Beam and Time-of-Flight Secondary Ion Mass Spectrometer," Journal of Vacuum Science and Technology A9 (1991) 1379- 1384.

D. S. Simons and P. H. Chi, "Secondary Ion Mass Spectrometry as a Diagnostic Tool for Ion Implantation and Molecular Beam Epitaxy," Microbeam Analysis- 1991, D. G. Howitt, ed., pp. 341-343.

J. Bennett and D. Simons, "Factors Influencing Quantitative SIMS Using a Microfocused Ga Ion Beam and TOF-MS," Secondary Ion Mass Spectrometry SIMS-VIII, A. Benninghoven et al. eds, (Chichester, John Wiley and Sons, 1992) pp. 123-126.

K. D. Hobart, D. J. Godbey, P. E. Thompson, and D. S. Simons, "Sb Surface Segregation During Heavy Doping of Si(100) Grown at Low Temperature by Molecular Beam Epitaxy," J. Vac. Sci. Technol. B11 (1993) 1115-1119.

D. S. Simons, P. E. Thompson, and D. J. Godbey, "Assessment of Silicon Wafer Cleaning Procedures by Secondary Ion Mass Spectrometry," Microbeam Analysis 2 Sup. (1993) S91-92.

D. S. Simons, "Quantification in SIMS - Considerations of Uncertainty in Depth Profile Measurements," Secondary Ion Mass Spectrometry SIMS IX, A. Benninghoven et al. eds, (Chichester, John Wiley and Sons, 1994) 140-145.

F. A. Stevie, R. G. Wilson, D. S. Simons, M. I. Current, and P. C. Zalm, "A Review of SIMS Characterization of Contamination Associated with Ion Implantation," J. Vac. Sci. Technol. B 12 (1994) 2263-79.

F. A. Stevie, R. G. Wilson, D. S. Simons, M. I. Current, and P. C. Zalm, "Using Secondary Ion Mass Spectrometry to Detect Contamination Sources from Ion Implanters," Solid State Technology 38 (May, 1995) 51-59.

New Depth Profiling Methods

Quantiative 3D Image Depth Profiling by SIMS, Greg Gillen, in "Semiconductor Characterization- Present Status and Future Needs", ed. W. M. Bullis et al eds, American Institute of Physics, Woodbury, NY 1995. pp 383.

"Quantitative Three Dimensional SIMS Imaging Using the Ion Microscope" Greg Gillen and Robert Myklebust,in Secondary Ion Mass Spectrometry: SIMS 8, eds. A. Benninghoven, K.T.F. Janssen, J. Tumpner and H.W. Werner, John Wiley and Sons, Chichester, pg. 509 (1992).

"The Application of SIMS Bevel Depth Profiling to Al-doped Mo-Ni-Al Superlattice Films" S.M.Hues, J. Makous and G. Gillen in Secondary Ion Mass Spectrometry: SIMS 8 , eds. A. Benninghoven, K.T.F. Janssen, J. Tumpner and H.W. Werner, John Wiley and Sons, Chichester, pg. 745 (1992).

"High Dynamic Range Mesa Depth Profiling on the Ion Microscope" G. Gillen Surface and Interface Analysis. 18, 777 (1992).

Organic SIMS

"Molecular Ion Imaging and Dynamic SIMS Analysis of Organic Compounds, Greg Gillen, David S. Simons and Peter Williams. Analytical Chemistry 62, 2122 (1990).

"The Use of Kinetic Energy Distributions to Determine the Relative Contributions of Surface and Gas Phase Fragementation in Organic SIMS", Greg Gillen, Int. J. Mass Spec. Ion Proc. 105, 215 (1991). "Molecular Imaging SIMS: Limitations and Future Prospects" G. Gillen in Proceedings of the 40th ASMS Conference on Mass Spectrometry and Allied Topics , Washington D.C. pg. 1957. (1992).

"Localization of Labeled Compounds in Human Hair Using SIMS" G. Gillen and C. Zeissler in Proceedings of the 40th ASMS Conference on Mass Spectrometry and Allied Topics , Washington D.C. pg. 452. (1992).

"Methods for Increasing Parent Ion Signal Intensity from Bulk Organic Materials Analyzed with an Imaging TOF Secondary Ion Mass Spectrometer", J. Bennett and G. Gillen. Proceedings of the 40th ASMS Conference on Mass Spectrometry and Allied Topics , Washington D.C. pg. 454. (1992).

"Evaluation of Gelatin Films as Standards for Quantitative Molecular SIMS of Biological Soft Tissue" Greg Gillen and Steve Hues, J. Amer. Soc. Mass Spectrom. 4, 419-423 (1993).

"Formation and Emission of Tetraalkyl Ammonium Salt Molecular Ions Sputtered from a Gelatin Matrix, Joe Bennett and Greg Gillen, J. Amer. Soc. Mass Spectrom. 4, 930-937 (1993).

"UV Photopatterning of Alkanethiolate Monolayers Self- Assembled on Gold and Silver, M. Tarlov, D. R. F. Burgess and G. Gillen, J. Am. Chem. Soc. 115 (12), 5305, (1993).

"Molecular Ion Imaging Secondary Ion Mass Spectrometry for the Characterization of Patterned Self- assembled Monolayers on Silver and Gold" G. Gillen, J. Bennett, M. Tarlov and D.R.F. Burgess, Anal. Chem. 66, 2170 (1994).

"Patterning of Self-Assembled Alkanethiol Monolayers on Silver by Microfocus Ion and Electron Beam Bombardment", G. Gillen, S. Wight, J. Bennett and M. Tarlov, Appl. Phys. Lett. 65(5), 534 (1994).

Metallurgical SIMS

"Lateral Profiling of Solute Depletion in Al-Li Alloys by SIMS" D.E. Newbury, G. Gillen, P. Chi, K.K. Soni and D.B. Williams in Secondary Ion Mass Spectrometry: SIMS 8, eds. A. Benninghoven, K.T.F. Janssen, J. Tumpner and H.W. Werner, John Wiley and Sons, Chichester, pg. 765 (1992).

"Compositional Changes in Aluminum-Lithium Base Alloys Caused by Oxidation", K.K. Soni, D.B. Williams, D.E. Newbury, G. Gillen, P. Chi. and D.S. Bright, Metallurgical Transactions , 24, 2279 (1993).

Biological SIMS

"Methods for Localization and Imaging of Trace Element Distributions in Human Brain Neurons by SIMS" G. Gillen, J. Nuygen, C. Sywt, Q. Deng, D.R. Brady and Q. Smith in Secondary Ion Mass Spectrometry, SIMS 9, John Wiley and Sons, Chichester, (1994). pg. 585

"Aluminum Localization and Analysis in Stained and Unstained Human Brain Tissue Using X-Ray Microanalysis and Secondary Ion Mass Spectrometry", Q.R. Smith, Q.S. Deng, D.R. Brady, C. Swyt, J. Nguyen and G. Gillen in Proceedings of Fourth International Conference on Aluminum and Health, (1994).

Isotopic Analysis

"High Spatial Resolution Isotope Ratio Imaging Using Secondary Ion Mass Spectrometry" G. Gillen and D. S. Bright, Proceedings of 41st ASMS Meeting on Mass Spectrometry and Allied Topics, San Francisco, Ca. pg. 827a (1993).

"Use of SIMS to Image 44Ca Uptake by the Cell Walls of Apple Fruit", S. Roy, G. Gillen, W.S. Conway, A. Watada and W.P. Wergin, Protoplasma, 189, 163-172(1995).

Superconductor Characterization

"SIMS Analysis of Oxygen and Carbon in YBA2Cu3O7-Superconductors", G. Gillen, Peter Chi and David S. Simons, in "Secondary Ion Mass Spectrometry: SIMS VII", eds. A. Benninghoven, C.A. Evans, K.D. McKeegan, H.A. Storms and H.W. Werner, John Wiley and Sons, Chichester, pg. 697 (1990).

"Image Depth Profiling SIMS; An Evaluation for the Analysis of 180 Diffusion in Single Crystal Superconductor Materials", Greg Gillen, Debra L. Kaiser and Jay L. Wallace, Surface And Interface Analysis, 17, 7 (1991).