US 7,357,973 B2
Flat plate and light guide plate
Kazuyuki Obuchi, Kawasaki (Japan); Teruhiko Suzuki, Kawasaki (Japan); and Kenji Otoi, Kawasaki (Japan)
Assigned to Nippon Zeon Co., Ltd., Tokyo (Japan)
Filed on Oct. 25, 2004, as Appl. No. 10/971,105.
Application 10/971105 is a continuation of application No. 10/252592, filed on Sep. 24, 2002, granted, now 6,828,007.
Application 10/252592 is a continuation of application No. 09/243414, filed on Feb. 03, 1999, granted, now 6,497,939.
Claims priority of application No. 10-38061 (JP), filed on Feb. 03, 1998.
Prior Publication US 2005/0112329 A1, May 26, 2005
This patent is subject to a terminal disclaimer.
Int. Cl. C08F 4/642 (2006.01); C08F 232/06 (2006.01); G32B 3/00 (2006.01)
U.S. Cl. 428—156  [428/141; 428/220; 428/195.1; 385/129; 359/321; 526/280; 526/282; 526/284] 19 Claims
OG exemplary drawing
 
1. A flat plate made of a cycloolefin polymer comprising at least 30% by weight, based on the cycloolefin polymer, of repeating units (A) having an alicyclic structure; said repeating units (A) comprising at least 30% by weight, based on the repeating units (A), of repeating units (A-i) having no norbornane structure and more than 0% but not more than 70% by weight of repeating units (A-ii) having a norbornane structure, represented by the following formula (4):

OG Complex Work Unit Drawing
wherein R35 through R48 are independently selected from the group consisting of a hydrogen atom, hydrocarbon, hydroxyl, ester, alkoxy, cyano, imido and silyl groups, a halogen atom, and hydrocarbon groups having a functional group as substituent selected from the group consisting of hydroxyl, ester, alkoxy, cyano, imido and silyl groups; e is an integer of 1 to 3; and the chemical symbol of

OG Complex Work Unit Drawing
in formula (4) represents a carbon-carbon single or double bond; and said cycloolefin polymer having a weight average molecular weight of 5,000 to 50,000, wherein the phase difference of the flat plate, as measured in the direction of the thickness of the plate, is not larger than 100 nm.