Bibliographic Citation
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DOI | http://dx.doi.org/10.1063/1.119975 |
Title | Self-texturing of nitrogenated amorphous carbon thin films for electron field emission |
Creator/Author | Silva, S.R. [Department of Electronic and Electrical Engineering, University of Surrey, Guildford, Surrey GU2 5XH (United Kingdom)] ; Amaratunga, G.A. [Department of Electrical Engineering and Electronics, University of Liverpool, Liverpool L69 3BX (United Kingdom)] ; Barnes, J.R. [Department of Engineering, University of Cambridge, Trumpington Street, Cambridge CB2 1PZ (United Kingdom)] |
Publication Date | 1997 Sep 01 |
OSTI Identifier | OSTI ID: 542127 |
Other Number(s) | APPLAB; ISSN 0003-6951 |
Resource Type | Journal Article |
Resource Relation | Applied Physics Letters ; VOL. 71 ; ISSUE: 11 ; PBD: Sep 1997 |
Subject | 36 MATERIALS SCIENCE ;66 PHYSICS ; CARBON; ELECTRON EMISSION; HYDROGEN; NITROGEN; STOICHIOMETRY; CURRENT DENSITY; FIELD EMISSION; AMORPHOUS STATE; NITROGEN ADDITIONS; TEXTURE; THIN FILMS; CATHODES; CHEMICAL VAPOR DEPOSITION |
Description/Abstract | The electron field-emission process for nitrogenated amorphous carbon (a-C:H:N) thin films deposited using a magnetically confined hydrocarbon plasma is examined. The morphology of the films obtained using an atomic force microscope is compared to the field-emission properties. Beyond a chemical composition of 14 at.{percent} nitrogen, the mirror smooth a-C:H:N films become self-texturing, and multiple{open_quotes}domelike{close_quotes} cathodes of nanometer scale are observed. The dimensions of these{open_quotes}domelike{close_quotes} cathodes varies with time, and after a 15 min deposition have dimensions of approximately 50 nm base diameter and 20 nm in height. When the electronic field emission of these textured films (N content 15 at.{percent}) are measured, there is an enhancement in the emitted current density of{approximately}2 orders of magnitude at an electric field of 20V/{mu}m, in comparison to the untextured films with a nitrogen content of 11 at.{percent}.{copyright}{ital 1997 American Institute of Physics.} |
Country of Publication | United States |
Language | English |
Format | pp. 1477-1479 ; PL: |
System Entry Date | 2001 May 05 |
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