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Ultra Low Loss Radio Frequency Window Materials--TPL, Inc., 3921 Academy Parkway North, NE, Albuquerque, NM 87109-4416; 505-342-4414
Dr. Stuart T. Schwab, Principal Investigator
Dr. William F. Hartman, Business Official
DOE Grant No. DE-FG03-99ER82910
Amount: $99,999
Silicon nitride is an excellent candidate for RF windows in accelerator applications. Unfortunately, additives used to process dense silicon nitride raise its loss factor to levels unacceptable for long term use in klystrons. Methods that do not use additives are prohibitively costly. This project will develop novel materials and chemical processing routes for producing dense silicon nitride without the use of additives. This approach will yield high purity, dense silicon nitride windows at low cost. In Phase I, new preceramic additives will be used in two different low-cost processing methods for manufacturing silicon nitride bodies. The effect of the additives will be determined through measuring mechanical and electromagnetic properties of the silicon nitride components.
Commercial Applications and Other Benefits as described by the awardee: Silicon nitride has been identified as a leading candidate for hot-zone applications in automotive engines. Current manufacturing methods are prohibitively expensive for these automobile applications