	US 7,506,861 B2
	Distribution device for two-phase concurrent downflow vessels
Morten Müller, Fredensborg (Denmark)
Assigned to Morten Muller Ltd. ApS, Fredensborg (Denmark)
Filed on Jan. 20, 2006, as Appl. No. 11/336,338.
Claims priority of provisional application 60/645914, filed on Jan. 21, 2005.
Prior Publication US 2006/0163758 A1, Jul. 27, 2006
Int. Cl. B01F 3/04 (2006.01)

U.S. Cl. 261—97 [261/114.1; 261/114.5]

44 Claims

1. A method for evenly distributing a downward flow of liquid and vapor across the cross sectional area of a two-phase concurrent downflow vessel below a substantially horizontal liquid collecting tray, the method comprising the steps of:

collecting liquid in a liquid pool on said tray;

collecting vapor in a vapor space above said liquid pool;

providing a plurality of distribution units for conducting said vapor and said liquid downward through said tray, each of said distribution units comprising a downcomer, a liquid conduit and a vapor/liquid mixing zone;

said downcomer having a vapor inlet located in said vapor space for conducting vapor from said vapor space through said vapor inlet to said vapor/liquid mixing zone; and

said liquid conduit having a wall with one or more openings extending through said wall at different distances above said tray for conducting liquid from said liquid pool through said openings and to said vapor/liquid mixing zone, in which zone the vapor from said downcomer is combined with the liquid from said liquid conduit into one combined stream in said vapor/liquid mixing zone;

passing the majority of said vapor through said vapor inlets, through said downcomers and to said vapor/liquid mixing zones;

passing substantially all said liquid from said liquid pool through said one or more openings to said vapor/liquid mixing zones via said liquid conduits;

passing said vapor and said liquid from said vapor/liquid mixing zone to the space below said tray; and

reducing the difference between the pressure of the vapor immediately above a surface of said liquid at a point adjacent said wall and upstream from one of said one or more openings, and the pressure of the vapor downstream from said one of said openings at the same level as said surface.