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Process Modeling and Diagnostics |
1. |
M. Meyyappan, "Modeling of a Pulsed-Power SF6 Plasma", Japanese Journal of Applied Physics, Vol. 36 (7B), pp. 4820-4823 (1997). |
2. |
D. Hash and M. Meyyappan, "A Direct Simulation Monte Carlo Study of Flow Considerations in Plasma Reactor Development for 300 mm Processing", Journal of Electrochemical Society, Vol. 144 (11), pp. 3999-4004 (1997). |
3. |
M. Meyyappan, "Characteristics of an Electron Cyclotron Resonance Plasma Source for the Production of Active Nitrogen Species in III-V Nitride Epitaxy", MRS Internet Journal on Nitride Semiconductor Research, Vol. 2, Article 46 (1997). |
4. |
M. Meyyappan, "Modeling of GaN Hydride Vapor Phase Epitaxy", Journal of Vacuum Science and Technology A, Vol. 16, 2, pp. 685-688 (1998). |
5. |
D.J. Economou, T.L. Panagopoulos, and M. Meyyappan, "Examining Scale-up and Computer Simulation in Tool Design for 300 mm Wafer Processing", Micro, pp. 101-114, July/August (1998). |
6. |
J. Yang, P.L.G. Ventzek, Y. Sakai, H. Date, K. Kitamori, H. Tagashira, and M. Meyyappan, "Simulations of Step Responses of Electronegative Radiofrequency Capacitively Coupled Discharges", Journal of Applied Physics, Vol. 84 (4), pp. 1848 (1998). |
7. |
D. Bose, T.R. Govindan, and M. Meyyappan, "A Self Consistent Simulation of an Inductively Coupled Plasma Reactor", IEEE Transactions on Plasma Science, Vol. 27 (1), pp. 54-55 (1999). |
8. |
H. Hwang, T.R. Govindan, and M. Meyyappan, "Feature Profile Evolution Simulation Using Level Set Method", Journal of Electrochemical Society, Vol. 146 (5), pp. 1889-1894 (1999). |
9. |
D. Bose, T.R. Govindan, and M. Meyyappan, "A Continuum Model for the Inductively Coupled Plasma Reactor", Journal of Electrochemical Society, Vol. 146 (7), pp. 2705-2711 (1999). |
10. |
C.H. Chang and D. Bose, "Viscous Effects on Motion and Heating of Electrons in Inductively Coupled Plasma Reactors", IEEE Transactions on Plasma Science, Vol. 27 (5), pp. 1310-1316 (1999). |
11. |
D. Bose, T.R. Govindan, and M. Meyyappan, "Ion Dynamics Model for Collisionless Radiofrequency Sheaths", Journal of Applied Physics, Vol. 87 (10), pp. 7176-7184, May 2000. |
12. |
S. Panda and D.J. Economou, "Effect of Metastable Oxygen Molecules in High Density Power-Modulated Oxygen Discharges", Journal of Applied Physics, Vol. 87 (12), pp. 8323-8333, June 2000. |
13. |
D. B. Hash, T. Mihopoulos, T.R. Govindan, and M. Meyyappan, "Characterization of Showerhead Performance at Low Pressure," Journal of Vacuum Science and Technology B, Vol. 18 (6), pp. 2808-2813 (2000). |
14. |
D. Bose, T.R. Govindan, and M. Meyyappan, "Semianalytical Ion Current Model for Radiofrequency Driven Collisionless Sheaths", Journal of Applied Physics, Vol. 89, pp. 5932-5938, June 2001. |
15. |
D. B. Hash, D. Bose, M.V.V.S. Rao, B.A. Cruden, M. Meyyappan, and S.P. Sharma,"Impact of Gas Heating in Inductively Coupled Plasmas", Journal of Applied Physics, Vol. 90 (5), pp. 2148-2157, September 2001. |
16. |
J.S. Kim, M.V.V.S. Rao, M.A. Cappelli, S.P. Sharma, and M. Meyyappan, "Mass Spectrometric and Langmuir Probe Measurements in Inductively Coupled Plasmas in Ar, CHF3/Ar and CHF3/Ar/O2 Mixtures, Plasma Sources Science and Technology, Vol. 10, pp. 191-204 (2001). |
17. |
D. Bose, D. Hash, T.R. Govindan, and M. Meyyappan, "Modeling of Inductively Coupled Plasma Processing Reactors", Journal of Physics D Applied Physics D, Vol. 34 (18), pp. 2742-2747, September 2001. |
18. |
W. Fu, R. Venkat and M. Meyyappan, Theoretical Study of GaN MBE Growth using ECR Nitrogen Plasma, Journal of Vacuum Science and Technology B, Vol. 19 (5), pp. 1803-1807, September/October, 2001. |
19. |
M.V.V.S. Rao, S.P. Sharma, B.A. Cruden, and M. Meyyappan, "Langmuir Probe and Mass Spectrometric Measurements in Inductively Coupled CF4 Plasmas, Plasma Sources Science and Technology," Vol. 11, pp. 69-76, 2002. |
20. |
B. A. Cruden, M.V.V.S. Rao, S.P. Sharma, and M. Meyyappan, "Fourier Transform Infrared Spectroscopy of CF4 Plasmas in the GEC Reference Cell," Plasma Sources Science and Technology, Vol. 11, pp. 77-90, 2002. |
21. |
B.A. Cruden, M.V.V.S. Rao, S.P. Sharma, and M. Meyyappan, "Detection of Chamber Conditioning by CF4 Plasmas in an Inductively Coupled Plasma Reactor," Journal of Vacuum Science and Technology B, Vol. 20 (1), pp. 353-363, Jan./Feb. 2002. |
22. |
B.A. Cruden, M.V.V.S. Rao, S.P. Sharma, M. Meyyappan, "Optical Pathlength Control in Plasma Absorption Measurements, Review of Scientific Instruments", Vol. 73, p. 2578-2582 (2002). |
23. |
B.A. Cruden, M.V.V.S. Rao, S.P. Sharma, M. Meyyappan, "Neutral Gas Temperature Estimates in an Inductively Coupled CF4 Plasma by Fitting Diatomic Emission Spectra," Journal of Applied Physics, Vol. 91, pp. 8955-8964 (2002). |
24. |
B.A. Cruden, "On the Proposed Second Law Paradox in a Non-Zero Floating Potential," Physics of Plasmas, Vol. 8, p. 5323 (2001). |
25. |
M. V. V. S. Rao, M. Meyyappan, and S. P. Sharma, "Langmuir Probe Measurements in inductively coupled plasmas in CF4/Ar mixtures", J. Electrochemical Society, 149, pp. 487-491 (2002). |
26. |
B.A. Cruden, M.V.V.S. Rao, S.P. Sharma, M. Meyyappan, "Neutral Gas Temperature Estimate in CF4/O2/Ar Inductively Coupled Plasmas", Applied Physics Letters, 81, pp. 990-992 (2002). |
27. |
M. V. V. S. Rao, S. P. Sharma, and M. Meyyappan, Ion Fluxes and Ion Energy Distributions in Inductively Coupled Plasmas in CF4/Ar Mixtures", Plasma Sources Science and Technology (in press). |
28. |
B.A. Cruden, M.V.V.S. Rao, S.P. Sharma, M. Meyyappan, "Fourier Transform Infrared and Optical Emission Spectroscopy of Inductively Coupled CF4/O2/Ar Mixtures", Journal of Applied Physics, Vol. 93, p. 5053 (2003). |
29. |
D. Bose, T.R. Govindan, M. Meyyappan, "A Coupled Plasma and Sheath Model for High Density Reactors", IEEE Transactions on Plasma Science , Vol. 30, 2, pp 653-659, (2002). |
30. |
M.V.V.S. Rao, S.P. Sharma, and M. Meyyappan, "Mass Spectrometric Measurements in Inductively Coupled CF4/Ar Plasmas," Plasma Sources, Science and Technology, Vol. 11, p. 397 (2002). |
31. |
D. Bose, M.V.V.S. Rao, T.R. Govindan, M. Meyyappan, "Uncertainty and Sensitivity Analysis of Gas Phase Chemistry in a CHF3 Plasma Reactor," Plasma Sources Science and Technology, Vol. 12, p. 225 (2003). |
32. |
R. Mogul, A.A. Bol'shakov, S.L. Chan, R.M. Stevens, B.N. Khare, M. Meyyappan, J.D. Trent, "Impact of Low-Temperature Plasmas on Deinococcus radiodurans and Biomolecules" Biotechnol. Prog., Vol.19, .3, pp. 776-783 (2003). |
33. |
G.L. Gutsev, M.D. Mochena, P. Jena, C.W. Bauschlicher, and H. Partridge III, "Periodic Table of 3D-Metal Dimers and Their Ions," Journal of Chemical Physics, Vol. 121, 14, pp. 6785-6797 (2004). |
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