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There are a total of 16 record(s) matching your query.
Sorted by: Date Added To NTRS in Descending order
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Etching in Chlorine Discharges Using an Integrated Feature Evolution-Plasma Model
Author(s): Hwang, Helen H.; Bose, Deepak; Govindan, T. R.; Meyyappan, M.
Abstract: Etching of semiconductor materials is reliant on plasma properties. Quantities such as ion and neutral fluxes, both in magnitude and in direction, are often determined by reactor geometry (height, radius, position of the ...
NASA Center: Ames Research Center Publication Year: 2001
Added to NTRS: 2008-06-02
Document ID: 20020011677
A Semianalytical Ion Current Model for Radio Frequency Driven Collisionless Sheaths
Author(s): Bose, Deepak; Govindan, T. R.; Meyyappan, M.
Abstract: We propose a semianalytical ion dynamics model for a collisionless radio frequency biased sheath. The model uses bulk plasma conditions and electrode boundary condition to predict ion impact energy distribution and ...
NASA Center: Ames Research Center Publication Year: 2001
Added to NTRS: 2008-06-02
Document ID: 20010046070
A Risk-Based Approach for Aerothermal/TPS Analysis and Testing
Author(s): Wright, Michael J.; Grinstead, Jay H.; Bose, Deepak
Abstract: The current status of aerothermal and thermal protection system modeling for civilian entry missions is reviewed. For most such missions, the accuracy of our simulations is limited not by the tools and processes currently ...
NASA Center: Ames Research Center Publication Year: 2007
Added to NTRS: 2008-06-02
Document ID: 20080018722
Simulation of Etching in Chlorine Discharges Using an Integrated Feature Evolution-Plasma Model
Author(s): Hwang, Helen H.; Bose, Deepak; Govindan, T. R.; Meyyappan, M.
Abstract: To better utilize its vast collection of heterogeneous resources that are geographically distributed across the United States, NASA is constructing a computational grid called the Information Power Grid (IPG). This paper ...
NASA Center: Ames Research Center Publication Year: 2002
Added to NTRS: 2008-06-02
Document ID: 20020091861
Simulation of the dc Plasma in Carbon Nanotube Growth
Author(s): Hash, David; Bose, Deepak; Govindan, T. R.; Meyyappan, M.
Abstract: A model for the dc plasma used in carbon nanotube growth is presented, and one-dimensional simulations of an acetylene/ammonia/argon system are performed. The effect of dc bias is illustrated by examining electron ...
NASA Center: Ames Research Center Publication Year: 2003
Added to NTRS: 2008-06-02
Document ID: 20030017838
Hybrid MD-Nernst Planck Model of Alpha-hemolysin Conductance Properties
Author(s): Cozmuta, Ioana; O'Keefer, James T.; Bose, Deepak; Stolc, Viktor
Abstract: Motivated by experiments in which an applied electric field translocates polynucleotides through an alpha-hemolysin protein channel causing ionic current transient blockade, a hybrid simulation model is proposed to predict ...
NASA Center: Ames Research Center Publication Year: 2006
Added to NTRS: 2006-09-29
Document ID: 20060021485
Prediction of the Aerothermodynamic Environment of the Huygens Probe
Author(s): Hollis, Brian R.; Striepe, Scott A.; Wright, Michael J.; Bose, Deepak; Sutton, Kenneth; Takashima, Naruhisa
Abstract: An investigation of the aerothermodynamic environment of the Huygens entry probe has been conducted. A Monte Carlo simulation of the trajectory of the probe during entry into Titan's atmosphere was performed to identify a ...
NASA Center: Ames Research Center, Langley Research Center Publication Year: 2005
Added to NTRS: 2005-08-25
Document ID: 20050182949; Report Number: AIAA Paper 2005-4816
A Coupled Plasma Dynamics and Gas Flow Model for Semiconductor Processing
Author(s): Bose, Deepak; Govindan, T. R.; Meyyappan, M.
Abstract: A continuum modeling approach by self-consistently coupling plasma dynamics and gas flow will be presented for the analysis of high density plasma reactors. Experimental data shows that gas flow distribution affects the etch ...
NASA Center: Ames Research Center Publication Year: 1998
Added to NTRS: 2004-11-03
Document ID: 20020060760
A Coupled Plasma-Sheath Model for High Density Sources
Author(s): Bose, Deepak; Govindan, T. R.; Meyyappan, M.
Abstract: High density, low pressure plasmas are used for etching and deposition in microelectronics fabrication processes. The process characteristics are strongly determined by the ion energy distribution (IED) and the ion flux ...
NASA Center: Ames Research Center Publication Year: 2000
Added to NTRS: 2004-11-03
Document ID: 20010048414
A Monte Carlo Sensitivity Analysis of CF2 and CF Radical Densities in a c-C4F8 Plasma
Author(s): Bose, Deepak; Rauf, Shahid; Hash, D. B.; Govindan, T. R.; Meyyappan, M.
Abstract: A Monte Carlo sensitivity analysis is used to build a plasma chemistry model for octacyclofluorobutane (c-C4F8) which is commonly used in dielectric etch. Experimental data are used both quantitatively and quantitatively to ...
NASA Center: Ames Research Center Publication Year: 2004
Added to NTRS: 2004-11-03
Document ID: 20040068147
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