Bibliographic record and links to related information available from the Library of Congress catalog
Information from electronic data provided by the publisher. May be incomplete or contain other coding.
Partial table of contents: SUBMICRON PATTERNING: STATE OF THE ART AND VISTAS. The Amelioration. Prospective Avenues. ELECTRON BEAM LITHOGRAPHY. Electron Beam Sources. Resists. Technology. EBL Applications. ION BEAM LITHOGRAPHY. I-Beam Resists. Exposure Techniques. Parallel Processing with Ions. Applications of Ion Beam Lithography. Conclusions and Prenotations. X-RAY LITHOGRAPHY. Principle. X-Ray Sources. Enlarging the Exposure Field. Beamline for Synchrotron Radiation. X-Ray Masks. X-Ray Resists. Alignment Schemes. X-Ray Lithography Systems. NANOTECHNOLOGY: PRESENT DAY SCENARIO. International Status. Projections. Index.