Table of contents for Patterning of material layers in submicron region / U.S. Tandon, W.S. Khokle.

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Partial table of contents:
SUBMICRON PATTERNING: STATE OF THE ART AND VISTAS.
The Amelioration.
Prospective Avenues.
ELECTRON BEAM LITHOGRAPHY.
Electron Beam Sources.
Resists.
Technology.
EBL Applications.
ION BEAM LITHOGRAPHY.
I-Beam Resists.
Exposure Techniques.
Parallel Processing with Ions.
Applications of Ion Beam Lithography.
Conclusions and Prenotations.
X-RAY LITHOGRAPHY.
Principle.
X-Ray Sources.
Enlarging the Exposure Field.
Beamline for Synchrotron Radiation.
X-Ray Masks.
X-Ray Resists.
Alignment Schemes.
X-Ray Lithography Systems.
NANOTECHNOLOGY: PRESENT DAY SCENARIO.
International Status.
Projections.
Index.