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Isotope effects in reactions of trifluoromethyl radicals with hydrogen chloride and hydrogen sulphide
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BEBO calculations. Part 4. - Arrhenius parameters and kinetic isotope effects for the reactions of CH3 and CF3 radicals with H2 and D2
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The vapor phase photolysis of hexafluoroacetone in the presence of methane and ethane
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An investigation of the extinction of diffusion flames by halons
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The rate and the mechanism of the reaction of acetaldehyde with fluorine atoms
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The electronic absorption spectrum of the trifluoromethyl radical
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Reaction of C2F5 radicals with HCl. Determination of the bond dissociation energy D(C2F5-H)
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The addition of methyl radicals to hexafluoroacetone
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A reexamination of the pyrolysis of bis-trifluoromethyl peroxide
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Evaluated kinetic data for combustion modeling
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Evaluated kinetic data for high temperature reactions. Volume 4 Homogeneous gas phase reactions of halogen- and cyanide- containing species
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Experimental study of elementary reactions of FO radicals.  I. Sources and measurement of absolute concentrations. The reaction F + O3 = FO + O2
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Experimental study of elementary reactions of FO radicals.  II. Kinetics and mechanism of the disproportionation reaction
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The reaction of fluorine atoms with formyl fluoride and the CFO self-reaction at 293K
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Structural aspects of the kinetics of four-center reactions in the vapor phase
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A simple, self-consistent electrostatic model for quantitative prediction of the activation energies of four-center reactions
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Molecular models for recombination and disproportionation of radicals
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Reactions of CF3 radicals with benzotrifluoride and the C-H bond strength in C6H5CF3 and C6H6
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Berman, M.R.; Fleming, J.W.; Harvey, A.B.; Lin, M.C.;
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Temperature dependence of the reactions of CH radicals with unsaturated hydrocarbons
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Bond and interaction contributions for calculating the heat of formation, diamagnetic susceptibility, molar refraction and volume, and thermodynamic properties of some substituted methanes
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Chemical ionization mass spectrometric studies of the gas-phase reaction of CF3O2+NO, CF3O+NO, and CF3O+RH
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C-F bond dissociation energies in perfluorocarbon gases using negative ion appearance potential data
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Flame structure studies of CF3Br-inhibited methane flames. II. Kinetics and mechanisms
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Symp. (Int.) Combust. 14, 367-381 (1973)
Flame-structure studies of CF3Br-inhibited methane flames
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Biordi, J.C.; Lazzara, C.P.; Papp, J.F.;
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Mass spectrometric observation of difluorocarbene and its reactions in inhibition
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Biordi, J.C.; Lazzara, C.P.; Papp, J.F.;
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Flame structure studies of CF3Br-inhibited methane flames. 3. The effect of 1% CF3Br on composition, rate constants, and net reaction rates
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Biordi, J.C.; Lazzara, C.P.; Papp, J.F.;
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Flame structure studies of bromotrifluoromethane-inhibited methane flames. 4. Reactions of inhibitor species in flames containing initially 1.1% bromotrifluoromethane
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Birchall, J.D.;
Combust. Flame 14, 85-96 (1970)
On the mechanism of flame inhibition by alkali metal salts
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Blauer, J.; Engleman, V.S.; Solomon, W.C.;
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Blauer, J.A.;
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The kinetics of dissociation of hydrogen fluoride behind incident shock waves
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Bogan, D.J.; Setser, D.W.;
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HF infrared chemiluminescence: energy disposal and the role of the radical fragment in the abstraction of hydrogen from polyatomic molecules by F atoms
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Decomposition of 1,1,2,2-tetrafluorocyclopropane. Arrhenius parameters and their influence on the chemical activation results
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An ab initio study of H abstraction in halogen-substituted methanes by the OH radical
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Some fast fluoride ion transfer reactions of CO+ with pefluoroalkanes and sulfur hexafluoride. Limits on the heat of formation of FCO
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Symp. (Int.) Combust. 15, 869 (1975)
Non-equilibrium radical concentrations in shock-initiated methane oxidation
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Chemical activation analysis of the reaction of C2H5 with O2
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Brabbs, T.A.; Belles, F.E.; Brokaw, R.S.;
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Shock-Tube Measurements of Specific Reaction Rates in the Branched-Chain H2-CO-O2 System
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Bradley, J.N.; Capey, W.D.; Fair, R.W.; Pritchard, D.K.;
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A shock-tube study of the kinetics of reaction of hydroxyl radicals with H2, CO, CH4, CF3H, C2H4 and C2H6
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Bregeon, B.; Gordon, A.S.; Williams, F.A.;
Combust. Flame 33, 33-45 (1978)
Near-limit downward propagation of hydrogen and methane flames in oxygen-nitrogen mixtures
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Breidung, J.; Schneider, W.; Thiel, W.; Lee, T.J.;
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The vibrational frequencies of difluoroethyne
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Brown, C.E.; Orlando, J.J.; Reid, J.; Smith, D.R.;
Chem. Phys. Lett. 142, 213 (1987)
Diode laser detection of transient CF3 radicals formed by CO2 laser multiphoton induced dissociation of halocarbons
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ACS Symp. Ser. 16, 341-375 (1975)
Halogen kinetics pertinent to flame inhibition: a review
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Bryant, J.T.; Pritchard, G.O.;
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The interactions of methyl and difluoromethyl radicals and the elimination of HF from 'hot' 1,1-difluoroethane
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Bryant, J.T.; Kirtman, B.; Pritchard, G.O.;
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The elimination of HF from vibrationally excited 1,1,2-trifluoroethane
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Bryant, W.M.D.;
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Free energies of formation of fluorocarbons and their radicals. Thermodynamics of formation and depolymerization of polytetrafluoroethylene
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Burdon, M.C.; Burgoyne, J.A.; Weinberg, F.J.;
Symp. (Int.) Combust. 5, 647 (1955)
Effect of methyl bromide on combustion of some fuel-air mixtures
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Burgoyne, J.H.; Williams-Lier, G.;
Proc. Roy. Soc. A 193, 525 (1948)

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Butler, J.E.; Fleming, J.W.; Goss, L.P.; Lin, M.C.;
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Kinetics of CH radical reactions important to hydrocarbon combustion systems
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Cadman, P.; Day, M.; Trotman-Dickenson, A.F.;
J. Chem. Soc. A, 2498-2503 (1970)
Shock tube pyrolyses. Part I. The thermal decomposition of iso-propyl chloride, ethyl fluoride, and n-propyl fluoride
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Cadman, P.; Day, M.; Kirk, A.W.; Trotman-Dickenson, A.F.;
Chem. Commun., 203-204 (1970)
Activation energies for the elimination of hydrogen fluoride from alkyl fluorides obtained by the activated molecule and competitive shock-tube techniques
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Cadman, P.; Day, M.; Trotman-Dickenson, A.F.;
J. Chem. Soc. A, 248-252 (1971)
Shock tube pyrolyses. Part II. Thermal decomposition of isopropyl, n-butyl, isobutyl and t-butyl fluorides
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Cadman, P.; Inel, Y.; Trotman-Dickenson, A.F.;
J. Chem. Soc. A, 1207-1209 (1970)
Disproportionation of trifluoromethyl and isopropyl radicals
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Cadman, P.; Kirk, A.W.; Trotman-Dickenson, A.F.;
J. Chem. Soc. Chem. Commun. 72, 1027 (1976)
Reactions of chlorine atoms with ethane, propane, isobutane, fluoroethane, 1,1-difluoroethane, 1,1,1-trifluoroethane, and cyclopropane
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Cadman, P.; Kirk, A.W.; Trotman-Dickenson, A.F.;
J. Chem. Soc. Faraday Trans. 1 72, 1428 (1976)
Production of chemically activated fluoroalkanes by direct fluorination
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Campbell, G.M.;
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A kinetic study of the equilibrium between dioxygen monofluoride and dioxygen difluoride
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Caralp, F.; Lesclaux, R.; Dognon, A.M.;
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Kinetics of the reaction of CF3 with O2 over the temperature range 233-273 K
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Carlson, G.A.;
J. Phys. Chem. 75, 1625-1631 (1971)
A shock tube study of the C2F4-CF2 equilibrium
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Carlton, T.S.; Steeper, J.R.; Christensen, R.L.;
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Rates of hydrogen abstraction from methanol by CF3 radicals.
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Carmichael, H.; Johnston, H.S.;
J. Chem. Phys. 41, 1975-1982 (1964)
Correlation of activation energies and bond energies in CF3 reactions
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Casas, F.; Kerr, J.A.; Trotman-Dickenson, A.F.;
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Fluorinated cyclopropanes. Part III. The reactions of methylene with mono-, 1,1-di, and tri-fluoroethylene
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Chamberlain, G.A.; Whittle, E.;
J. Chem. Soc. Chem. Commun. 8, 396 (1971)
Photolyses of perfluoroacetic anhydride and perfluoropropionic anhydride vapours. New sources of CF3 and C2F5 radicals
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Chamberlain, G.A.; Whittle, E.;
J. Chem. Soc. Faraday Trans. 1 68, 88 (1972)
Photochemistry of anhydrides. Part 1. Photolysis of perfluoroacetic anhydrides vapour: A new source of CF3 radicals
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Chang, H.W.; Setser, D.W.;
J. Am. Chem. Soc. 91, 7648-7657 (1969)
Unimolecular reaction and collisional deactivation of chemically activated 1,2-difluorethane produced by mercury photosensitization of chlorofluoromethane at 300 and 475 K
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Chang, H.W.; Craig, N.L.; Setser, D.W.;
J. Phys. Chem. 76, 954-963 (1972)
Nonequilibrium unimolecular reactions and collisional deactivation of chemically-activated fluoroethane and 1,1,1-trifluoroethane
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Chao, J.; Rodgers, A.S.; Wilhoit, R.C.; Zwolinski, B.J.;
J. Phys. Chem. Ref. Data 3, 141-162 (1974)
Ideal gas thermodynamic properties of six chloroethanes
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Chen, J.; Zhu, T.; Niki, H.; Mains, G.J.;
Geophys. Res. Lett. 19, 2215-2218 (1992)
Long path FTIR spectroscopic study of the reactions of CF3O radicals with ethane and propane
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Chen, J.; Zhu, T.; Young, V.; Niki, H.;
J. Phys. Chem. 97, 7174-7177 (1993)
Long path FTIR spectroscopic study of the reactions of CF3O radicals with alkenes
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Chen, K.C.; Kochi, J.K.;
J. Am. Chem. Soc. 96, 794 (1974)
Hindered internal rotation of the methyl group in alpha-substituted ethyl radicals. Effect of fluorine
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Chen, S.S.; Rodgers, A.S.; Chao, J.; Wilhoit, R.C.; Zwolinski, B.J.;
J. Phys. Chem. Ref. Data 4, 441-456 (1975)
Ideal gas thermodynamic properties of six fluoroethanes
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Chen, S.S.; Wilhoit, R.C.; Zwolinski, B.J.;
J. Phys. Chem. Ref. Data 5, 571-580 (1976)
Ideal gas thermodynamic properties of six chlorofluoromethanes
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Chen, Y.; Rauk, A.; Tschuikow-Roux, E.;
J. Chem. Phys. 93, 6620-6629 (1990)
Structures, barriers for internal rotation, vibrational frequencies, and thermodynamic function of CH2FCH2, CHF2CH2, and CF3CH2 radicals: an ab initio study
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Chen, Y.; Rauk, A.; Tschuikow-Roux, E.;
J. Chem. Phys. 93, 1187-1195 (1990)
Structures, barriers for rotation and inversion, vibrational frequencies, and thermodynamic function of ethyl, 1-fluoroethyl, and 1,1-difluoroethyl radicals: an ab initio study
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Chen, Y.; Rauk, A.; Tschuikow-Roux, E.;
J. Chem. Phys. 95, 9900-9908 (1991)
On the question of negative activation energies: absolute rate constants by RRKM and G1 theory for CH3 + HX CH4 + X (X = Cl, Br) reactions
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Chen, Y.; Rauk, A.; Tschuikow-Roux, E.;
J. Chem. Phys. 95, 2774-2786 (1991)
Structures, barriers for internal rotation and inversion, vibrational frequencies, and thermodynamic functions of CH2FCF2, CHF2CF2, and CF3CF2 radicals: an ab initio study
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Chen, Y.; Rauk, A.; Tschuikow-Roux, E.;
J. Chem. Phys. 94, 7299-7310 (1991)
Structures, barriers for internal rotation, vibrational frequencies, and thermodynamic functions of CH2FCHF, CHF2CHF, and CF3CHF radicals: an ab initio study
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Chiorboli, C.; Piazza, R.; Tosato, M.L.; Carassiti, V.;
Coord. Chem. Rev. 125, 241-250 (1993)
Atmospheric chemistry - Rate constants of the gas-phase reactions between haloalkanes of environmental interest and hydroxyl radicals
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Choi, Y.S.; Moore, C.B.;
J. Chem. Phys. 97, 1010-1021 (1992)
State-Specific Unimolecular Reaction Dynamics of HFCO. 1. Dissociation Rates
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Claesson, O.; Noda, S.; Yoshida, H.;
Bull. Chem. Soc. Jpn. 56, 2559-2561 (1983)
ESR studies of bunsen-type methane-air flames. I. Effects of the entrainment and diffusion of secondary air on the chemical reactions in the flame
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Clark, T.C.; Dove, J.E.;
Can. J. Chem. 51, 2147 (1973)
Examination of possible non-arrhenius behavior in the reactions H + C2H6 H2 + C2H5, H + CH4 H2 + CH3, and CH3 + C2H6 CH4 + C2H5
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Clyne, M.A.A.; Hodgson, A.;
Chem. Phys. 79, 351-360 (1983)
Kinetics and detection of F(2P) atoms in a discharge flow system
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Clyne, M.A.A.; Hodgson, A.;
J. Chem. Soc. Faraday Trans. 2 81, 443-455 (1985)
Absolute rate constants for the reaction of fluorine atoms with H2, CH2Cl2, CH2ClF, CH2F2 and CHCl2
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Clyne, M.A.A.; Holt, P.M.;
J. Chem. Soc. Faraday Trans. 2 75, 582 (1979)
Reaction kinetics involving ground and excited hydroxyl radicals. Part 2 - Rate constants for reactions of ground state OH with halogenomethanes and halogenoethanes
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Clyne, M.A.A.; McKenney, D.J.; Walker, R.F.;
Can. J. Chem. 51, 3596 (1973)
Reaction kinetics of ground state fluorine F(2P) atoms. I. Measurement of fluorine atom concentrations and the rates of reactions of F + CHF3 and F + Cl2 using mass spectrometry
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Cobos, C.J.;
An. Asoc. Quim. Argent. 73, 269 (1985)
Theoretical analysis of the unimolecular decompositions CF3OF = CF3O + F, CF3OOCF3 = CF3O + CF3O, and CF3OOOF3 = CF3O + CF3O2
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Cohen, N.; Benson, S.W.;
J. Phys. Chem. 91, 171-175 (1987)
Empirical correlations for rate coefficients for reactions of OH with haloalkanes
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Cohen, N.; Benson, S.W.;
J. Phys. Chem. 91, 162-170 (1987)
Transition-state-theory calculations for reactions of OH with haloalkanes
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Cohen, A.; Decker, L.;
Symp. (Int.) Combust. 18, 225-231 (1981)
Chemical mechanism for secondary flash suppression
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Cohen, N.; Heicklen, J.;
J. Chem. Phys. 43, 871-873 (1965)
Mercury-sensitized photolysis of C2F4
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Cohen, N.; Heicklen, J.;
J. Phys. Chem. 70, 3082-3088 (1966)
The production of perfluorocyclopropane in the reaction of oxygen atoms with tetrafluoroethylene
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Cohen, N.; Westberg, K.;
J. Phys. Chem. 83, 46 (1979)
Evaluation and Compilation of Chemical Kinetic Data
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Cohen, N.; Westberg, K.R.;
J. Phys. Chem. Ref. Data 12, 531 (1983)
Chemical kinetic data sheets for high-temperature chemical reactions
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Cohen, N.; Westberg, K.R.;
J. Phys. Chem. Ref. Data 20, 1211-1311 (1991)
Chemical kinetic data sheets for high-temperature reactions. Part II
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Coleman, E.H.;
Fuel 30, 114 (1951)

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Cookson, J.L.; Hancock, G.; McKendrick, K.G.;
Ber. Bunsenges. Phys. Chem. 89, 335-336 (1985)
Reactions of CHF(X1A') and NCO(X2Pi) radicals
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Coomber, J.W.; Whittle, E.;
J. Chem. Soc. Faraday Trans. 62, 2183-2190 (1966)
Photochlorination of methane and fluoroform. Dissociation energy D(CF3-H) and entropy of CF3 radical
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Vapour-phase bromination of fluoroform and methane
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Thermochemistry of Organic and Organometallic Compounds (Academic Press: New York, NY 1970)

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Thermodynamic properties of fluorine compounds
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Gaussian-2 Theory for Molecular Energies of First- and Second-Row Compounds
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Conformational analysis of 1,2-dihaloethanes - A comparison of theoretical methods
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Mechanism of inhibition of hydrogen-air flames by hydrogen bromide and its relevance to the general problem of flame inhibition
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A comprehensive study of methanol kinetics in freely-propagating and burner-stabilized flames, flow and static reactors, and shock tubes
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Laminar flame speeds of methane-air mixtures under reduced and elevated pressures
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Bonding in C1 and C2 fluorides
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Extinction of petrol fires by methyl iodide
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Thermodynamic properties of CF and CF2 from molecular effusion and mass spectrometry investigations
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Flame inhibition by methyl bromide
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Ferguson, K.C.; Whittle, E.;
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Kinetics of the reaction between HBr and C2F5Br.  Determination of the bond dissociation energy D(C2F5-Br)
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Ferguson, K.C.; Whittle, E.;
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Competitive study of the reactions Br + RBr = Br2 + R (R = CF3, C2F5)
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J. Chem. Soc. Faraday Trans. 1 68, 295-305 (1972)
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The reactions of fluorine atoms with alkanes
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Free radicals by mass spectrometry. XXXIII. Ionizatioin potentials of CF2, CF3CF2, CF3CH2, n-C3F7, and I-C3F7 radicals
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The unimolecular decomposition of vibrationally excited 1-deuterio-1,1,2-trifluoroethane
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An ab initio study of hydrogen atom abstractions from substituted methanes by substituted methyl radicals
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Dissociation dynamics of FC(O)O and ClC(O)O radicals
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Francisco, J.S.; Mina-Camilde, N.;
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A study of hydrogen abstraction reactions by halogen atoms with HFCO and HClCO - Determination of transition state structures, barrier heights, and vibrational frequencies
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Francisco, J.S.; Williams, I.H.;
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Theoretical characterization of the trifluoromethoxy radical
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Francisco, J.S.; Williams, I.H.;
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The thermochemistry of polyoxides and polyoxy radicals
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Infrared and Ultraviolet Spectroscopic Characterization of Trifluoroacetaldehyde
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Francisco, J.S.; Williams, I.H.;
Spectrochim. Acta Part A 48, 1115-1126 (1992)
A Re-examination of the Infrared and Ultraviolet Spectroscopy of Trifluoroacetyl Fluoride and Trifluoroacetyl Chloride - An Experimental and Theoretical Study
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Energetics of the reactions of FCO with O2 using unrestricted Moller-Plesset perturbation theory with spin annihilation
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The reaction of atomic fluorine with formyl fluoride: An experimental and theoretical study
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Ab initio studies of dissociation pathways on the ground state potential energy surface for HFCO and HClCO
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Decomposition pathways of carbonofluorochloridic acid on the ground-state potential energy surface and its implication for a design strategy for alternative halocarbons
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A study of the gas-phase reaction of carbonyl fluoride with water
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Francisco, J.S.;
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An examination of substituent effects on the reaction of OH radical with HXCO (where X=H,F, and Cl)
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Francisco, J.S.;
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An ab initio investigation of the significance of the HOOF intermediate in coupling reactions involving FOOx and HOx species
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Francisco, J.S.;
J. Chem. Soc. Faraday Trans. 88, 3521-3525 (1992)
Decomposition Pathways for Trifluoroacetic Acid, CF3C(O)OH
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J. Chem. Soc. Faraday Trans. 88, 1943-1941 (1992)
Reaction of OH radical with CH3C(O)H and CF3C(O)H
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Francisco, J.S.; Ghoul, W.A.; Williams, I.H.;
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Thermochemistry of possible degradation pathways for compounds CF3CHXY (X,Y=H,F,Cl) using AM1 and MNDO semiempirical methods
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Theoretical investigation of chlorofluorocarbon degradation processes: structures and energetics of XC(O)Ox intermediates (X = F, Cl)
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Francisco, J.S.; Li, Z.; Williams, I.H.;
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Dissociation dynamics of the trifluoromethoxy radical
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Francisco, J.S.; Li, Z.; Williams, I.H.;
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A theoretical study of the A2A1-X2E transition in trifluoromethoxy radical
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NBS SP 716, 250-255 (1986)
Thermochemistry, structure and reactivity of the trifluoromethoxy radical
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Combust. Flame 7, 195-201 (1963)
Inhibition of opposed-jet methane-air diffusion flames. The effects of alkali metal vapours and organic halides
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Conformational analysis. 7. 1,2-difluoroethane. An electron-diffraction investigation of the molecular structure, composition, trans-gauche energy and entropy differences and potential hindering internal rotation.
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Further theoretical examination of the F + H2 entrance channel barrier
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An interpretation of the inhibition of C-H-O flames by C-H-X compounds
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Entropies of vaporization for fluorocarbons and hydrocarbons from the Hildebrand Rule
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Numerical simulation of unsteady laminar flame propagation via the method of lines: further mathematical refinements and results obtained on halogen inhibition
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An experimental and mechanistic study of the reactions of COF2 with H and with CO
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Initial reactions in flame inhibition by halogenated hydrocarbons
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The effect of certain halogenated methanes on pre-mixed and diffusion flames
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Thermodynamic functions of halogentated methanes
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Organic radical-radical reactions. Disproportionation vs. combination.
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Atmospheric fate of hydrofluoroethanes and hydrofluorochloroethanes: 1. Rate coefficients for reactions with OH
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Direct indentification of reactive routes and measurement of rate constants in the reactions of oxygen atoms with the fluoroethylenes
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Photolysis of mixtures of acetone and hexafluoroacetone : combinations reactions of methyl and trifluoromethly radicals
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Reactions of trifluoromethyl radicals with organic halides. Part 5.-Fluoromethanes and fluoroethanes
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Kinetic modeling and sensitivity analysis of nitrogen oxide formation in well-stirred reactors
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Formyl fluoride photodissociation: Potential energy surface features of singlet HFCO
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Kinetic study of the reaction of F with H2 and CF3H by ESR methods
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Combustion calorimetry of organic fluorine containing compounds by a rotating bomb method
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Chem. Phys. Lett. 22, 107-118 (1973)
Chemical HF laser emission from the CHF + O2 reaction
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Kinetics and thermodynamics of the reaction between iodine and fluoroform and the heat of formation of trifluoromethyl iodide
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Gozzo, F.; Patrick, C.R.;
Nature 202, 1329 (1964)

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Tetrahedron 22, 3329-3336 (1966)
The thermal decomposition of chlorodifluoromethane
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J. Fire Sci. 10, 470-487 (1992)
A review of phosphorus-containing flame retardants
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Gurvich, L.V.; Veyts, I.V.; Alcock, C.B.(eds.);
Thermodynamic Properties of Individual Substances (Hemisphere Pub. Corp.: New York, NY 1991)

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J. Res. Nat. Bur. Stand. A 70, 133-141 (1966)
Effect of some halogenated hydrocarbons on the flame speed of methane
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Combust. Flame 20, 223-230 (1973)
Inhibition of autoignition at high pressures
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J. Chem. Soc. Faraday Trans. 2 82, 647-651 (1986)
Rate-constant measurement of the O(3P) + CF2 (X1A1) reaction
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CHF(X1A') radical kinetics. 2. Reaction with O and N atoms
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Ber. Bunsenges. Phys. Chem. 82, 1161-1166 (1978)
Kinetics of the reactions of OH radicals with some halocarbons (CHClF2, CH2ClF, CH2ClCF3, CH3CClF2, CH3CHF2) in the temperature range 260-370 K
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Hart, L.W.; Grunfelder, C.; Fristrom, R.M.;
Combust. Flame 23, 109-119 (1974)
The 'point source' technique using upstream sampling for rate constant determinations in flame gases
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Combust. Flame 21, 49-54 (1973)
Mass spectrometric studies of flame inhibition: analysis of antimony trihalides
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J. Res. Nat. Bur. Stand. A 77, 733-754 (1973)
Molecule basis of flame inhibition
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Reaction of oxygen atoms with tetrafluoroethylene in the presence of molecular oxygen
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Direct study of the reactions of vinyl radicals with hydrogen and oxygen atoms
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Reactions of F2O in shock waves. II. Kinetics and mechanisms of F2O-CO reaction
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Estudio cinetico de la reaccion termica entre fluor, monoxido de carbono y oxigeno
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Rate constants for the reactions of atomic oxygen (O3P) with organic compounds in the gas phase
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J. Phys. Chem. Ref. Data 17, 967 (1988)
Evaluated chemical kinetic data for the reactions of atomic oxygen O(3P) with saturated organic compounds in the gas phase
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Inhibition and extinction of explosions in heterogeneous mixtures
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Rate constants for radical recombination. III. The trifluoromethyl radical
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Combust. Flame 59, 93-95 (1985)
Inhibition of the H2-O2 reaction by CF3Cl
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Chem. Phys. Lett. 187, 40-44 (1991)
High temperature pyrolysis of CF3H in shock waves
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Combust. Flame 60, 233-238 (1985)
Additive effect of CF3Cl on OH, CH, and C2 emissions: shock tube study with C2H4-O2-CF3Cl and CH4-O2-CF3Cl mixtures
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Dissociation energy and ionization potential of the molecule CF
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Thermal reactions of CH2Cl2 in H2/O2 mixtures: implications for chlorine inhibition of CO conversion to CO2
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Combust. Flame 18, 300-302 (1972)
The effect of pressure on the inhibition of ethylene flames
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Rate measurements for the reaction of H-atoms with F2
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Rate constants for the reactions of OH with CH4 and fluorine, chlorine, and bromine substituted methanes at 296 K
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Rate constants for the reactions of OH with ethane and some halogen substituted ethanes at 269 K
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Direct rate measurements on the reactions N + OH NO + H and O + OH O2 + H from 250 to 515 K
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Hrusak, J.; Schawarz, H.;
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A GAUSSIAN 1 study of the [CHOF].+ potential energy surface - Theoretical evidence for the existence of 3 experimentally distinguishable isomers in the gas phase
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ACS Symp. Ser. 66, 128-151 (1978)
Kinetics and mechanisms of reactions of CF, CHF, and CF2 radicals
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Combust. Flame 97, 201-224 (1994)
The oxidation of methane at elevated pressures: experiments and modeling
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Spectroscopic studies of the effect of inhibitors on counterflow diffusion flames
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Non-Arrhenius behavior of the F+H2 reaction rate at 293-700 K
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Ionomata, T.; Moriwaki, T.; Okazaki, S.;
Combust. Flame 62, 183-191 (1985)
Effect of bromoethane on the ignition in methane-oxygen-argon mixtures behind reflected shock waves
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The measure of the inhibition of quenched premixed flames
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Shock-tube study of the initiation process in the hydrogen-oxygen reaction
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Kinetics of decomposition of HF in shock waves
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Shock Tube Cis-Trans Isomerization Studies. III
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Alkaline earth flame chemistry
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Kinetics of the reaction of hydroxyl radical with methane and with nine Cl- and F-substituted methanes. 2. Calculation of rate parameters as a test of transition-state theory
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Fate of difluoromethylene
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Arrhenius parameters for reactions of oxygen atoms with the fluorinated ethylenes
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Reactions of trifluoromethyl and methyl radicals with ethylene oxide
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Hydrogen abstraction from organosilicon compounds. The reactions of fluoromethyl radicals with tetramethylsilane. Polar effects in gas phase reactions
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Hydrogen fluoride and deuterium fluoride elimination reactions of chemically activated 1,1,1-trideuterio, 2,2-difluoroethane, 2,2-difluorethane, 1,1-difluorethane and 1,1,1-trideuterio, 2-fluoroethane
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Kinetics of the reaction of CF4 with hydrogen
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Thermochemistry of halogenomethanes
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Kinetics of the O + F2 reaction. A case of low reactivity of elemental fluorine
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Ideal gas thermodynamic properties of CH4-(a+b+c+d)FaClbBrcId halomethanes
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Ideal gas thermodynamic properties of selected bromoethanes and iodoethane
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Kuppu Rao, V.; Prasad, C.R.;
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Knock suprression in petrol engines
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Reaction heats of organic halogen compounds. V. The vapor phase bromination of tetrafluoroethylene and trifluorochloroethylene
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Influence of additives on the velocity of laminar flames
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Thermal and photochemical exchange of iodide with trifluoro-methyl iodide
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EPR kinetic study of the reactions of F and Br atoms with H2CO
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Kinetics of the thermal decomposition of tetrafluoroethylene oxide
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Flame inhibition by hydrogen halides: some spectroscopic measurements
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Laser-induced fluororescence spectroscopic study of the A2A1-X2E transition of trifluoromethoxy radical
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Laser-induced fluorescence spectroscopy of the trifluoroacetyl radical CF3CO
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Li, Z.J.; Francisco, J.S.;
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An examination of pathways for the reaction of oxygen atoms with CF3O radicals - implications for the role of CF3 radicals in stratospheric chemical processes
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Ion-molecule reactions involving fluorine-containing organic compounds
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Halomethylenes: effects of halogen substitution on absolute heats of formation
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Dissociative electron capture and dissociative ionization in perfluorocyclobutane
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Chemical lasers produced from O(3P) atom reactions. I. Observation of CO and HF laser emissions from several O atom reactions
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Chemical lasers produced from O(1D) atom reactions from the O(1D) + CHnF4-n (n=1,2, and 3) reactions
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Free radicals by mass spectrometry. VI. The bond dissociation energies of some methyl, allyl, and benzyl compounds by electron impact
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A high-temperature photochemistry kinetics study of the reaction of O(3P) atoms with ethylene from 290-1510 K
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Flash photolysis-time-resolved UV absorption study of the reactions CF3H + F CF3 + HF and CF3 + O2 CF3O2 Products
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Maricq, M.M.; Szente, J.J.; Kaiser, E.W.;
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A Kinetic Study of the CF3CFH Recombination and O2 Addition Reactions
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FCO: UV spectrum, self-reaction kinetics and chain reaction with F2
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Visible absorption spectroscopy of the B2A1-X2B2 transition of fluoroformyloxyl radical, FC(O)O
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Martell, J.M.; Boyd, R.J.;
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An ab initio study of the series C2HnF6-n (n=0-6): geometries, total energies, and C-C bond dissociation energies
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Martin, J.-P.; Paraskevopoulos, G.;
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Flammability limits of H2-O2-fluorocarbon mixtures
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Hydrocarbon bond dissociation energies
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Absolute rate constants for the reactions of CH with O and N atoms
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Absolute rate constants for the reaction of atomic hydrogen with ketene from 298 to 500K
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Mechanism and modeling of nitrogen chemistry in combustion
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Chemical kinetics and combustion modeling
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A kinetic analysis of the shock wave decomposition of 1,1,1,2-tetrafluoroethane
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Kinetics of the shock wave thermolysis of 1,1,2,2-tetrafluoroethane
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Milne, T.A.; Green, C.L.; Benson, D.K.;
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The use of the counterflow diffusion flame in studies of inhibition effectiveness
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Bull. Chem. Soc. Jpn. 51, 34709 (1978)
A molecular orbital calculation of chemically interacting systems. Interaction between two radicals
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Flame retardant effects of CF3Br and NaHCO3
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The reaction of O(3P) atoms with 1,1-difluoro-olefins
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Reaction rates of atomic oxygen with straight chain alkanes and fluoromethanes at high temperatures
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Decomposition and oxidation of C2F4 behind shock waves
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C2F4 dissociation in nitrogen shocks
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Mass-spectrometer and uv absorption study of CHF3 decomposition behind shock waves
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Experimental and theoretical kinetics of high temperature fluorocarbon chemistry
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Ab initio calculation of the heats of formation of CF3OH and CF2O
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Moore, F.; Tipper, C.F.H.;
Combust. Flame 19, 81-87 (1972)
The effect of additives on low-temperature hydrocarbon ignition in a flow system
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Substitution effect on formaldehyde photochemistry. Potential surface characteristics of HFCO
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Reactions of radicals containing fluorine. Part 4. Reactions of trifluoromethyl radicals with fluoroaldehyde
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Reactions of radicals containing fluorine. Part 1.-Hydrogen and deuterium atoms abstraction from trideuteromethanol by trifluoromethyl radicals
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Positive Ion Chemistry Related to Hydrocarbon Flames Doped with CF3Br
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The effect of burning velocity inhibitors on the ignition of hydrocarbons
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The heats of formation of tetrafluoroethylene, tetrafluoromethane, and 1,1-difluoroethylene
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The heats of formation of CHF3 and CH2F2
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Rate constants for the gas-phase reactions of OH radicals with CH3CHF2 and CHCl2CF3 over the temperature range 295-388 K
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Nielsen, O.J.; Ellmermann, T.; Bartkiewicz, E.; Wallington, T.J.; Hurley, M.D.;
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UV absorption spectra, kinetics and mechanisms of the self-reaction of CHF2O2 radicals in the gas phase at 298 K
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Ultraviolet absorption spectra and kinetics of the self-reaction of CH2Br and CH2BrO2 radicals in the gas phase at 298 K
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Nielsen, J.R.; Claassen, H.H.; Moran, N.B.;
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Infrared and raman spectra of fluorinated ethanes.  VIII. Pentafluoroethane
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Nielsen, J.R.; Richards, C.M.; McMurray, H.L.;
J. Chem. Phys. 16, 67-73 (1948)
The infra-red absorption spectrum of hexafluoroethane gas
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Nielsen, J.R.; Claassen, H.H.; Smith, D.C.;
J. Chem. Phys. 18, 1471 (1950)
Infra-red and raman spectra of fluorinated ethanes. II: 1,1,1-trifluoroethane
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Niioka, T.; Mitani, T.; Takahashi, M.;
Combust. Flame 50, 89-97 (1983)
Experimental study on inhibited diffusion and premixed flames in a counterflow system
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Nilsson, W.B.; Pritchard, G.O.;
Int. J. Chem. Kinet. 14, 299-323 (1982)
Disproportionation reactions between CF2H and C2H5 radicals in the gas phase
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Nip, W.S.; Singleton, D.L.; Overend, R.; Paraskevopoulos, G.;
J. Phys. Chem. 83, 2440-2443 (1979)
Rates of OH radical reactions. 5. Reactions with CH3F, CH2F2, CHF3, CH3CH2F, and CH3CHF2 at 297 K
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Noda, S.; Fujimoto, S.; Claesson, O.; Yoshida, H.;
Bull. Chem. Soc. Jpn. 56, 2562-2564 (1983)
ESR studies of bunsen-type methane-air flames. II. The effects of the additives
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Norton, F.J.;
Refrig. Eng. 65, 33 (1957)

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Norton, T.S.; Dryer, F.L.;
Combust. Sci. Technol. 63, 107-129 (1989)
Some new observations on methanol oxidation chemistry
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J. Phys. Chem. 74, 2090-2095 (1970)
Reaction rate of trifluoromethyl radicals by rapid scan infrared spectroscopy
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Okafo, E.N.; Whittle, E.;
J. Chem. Soc. Faraday Trans. 1 70, 1366-1375 (1974)
Bond dissociation energies from equilibrium studies. Part 5. The equilibria Br2 + CH2F2 = HBr + CHF2Br and Br2 + CH3F = HBr + CH2FBr. Determination of D(CHF2-Br) and Hf(CHF2Br,g)
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Okafo, E.N.; Whittle, E.;
Int. J. Chem. Kinet. 7, 287-300 (1975)
Competitive study of the reactions of Br + RfI = IBr + Rf and determination of bond dissociation energies D(Rf-I) where Rf = CF3, C2F5, n-C3F7, i-C3F7, and n-C4F9
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Orkin, V.L.; Khamaganov, V.G.;
J. Atmos. Chem. 16, 157 (1993)
Determination of Rate Constatnts for Reactions of Some Halocarbons with OH Radicals and their Atmospheric Lifetimes
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Rate Constants for Reactions of OH with Some Br-Containing Haloalkanes
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Time-resolved tunable diode laser detection of products of the infrared multiphoton dissociation of hexafluoroacetone: A line-strength and band-strength measurement for CF3
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Ortiz de Zarate, A.; Castono, F.; Fernandez, J.A.; Martinez, R.; Rayo, M.N.S.; Hancoc, G.;
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Removal rates of CHF (A1A(0,0,0)) by alkenes
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Preparation of CHF (X1A') by infrared multiphoton dissociation and reactions with alkenes
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Rates of OH radical reactions. I. Reactions with H2, CH4, C2H6, and C3H8 at 295K
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Overend, R.; Paraskevopoulos, G.; Cvetanovic, R.J.;
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Rates of OH radical reaction. I. Reactions with H2, CH4, C2H6, and C3H8 at 295K
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Pagsberg, P.; Munk, J.; Sillesen, A.; Anastasi, C.;
Chem. Phys. Lett. 146, 375-381 (1988)
UV spectrum and kinetics of hydroxymethyl radicals
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Paraskevopoulos, G.; Nip, W.S.;
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Rates of OH radical reactions. VII. Reactions of OH and OD radicals with n-C4H10, n-C4D10, H2 and D2, and of OH with neo-C5H12 at 297K
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Paraskevopoulos, G.; Singleton, D.L.; Irwin, R.S.;
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Rates of OH radical reactions. 8. Reactions with CH2FCl, CHF2Cl, CHFCL2, CH3CF3Cl, CH3Cl, and C2H5Cl at 297 K
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Park, J.-Y.; Sawyer, P.F.; Heaven, M.C.; Gutman, D.;
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Chemical branching in the oxygen-atom-reaction with vinyl fluoride. Pressure dependence of the route O + C2H3F CH2F + HCO
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Determination of the rate constants for reactions of hydrogen and oxygen atoms with difluoromethane
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Determination of the rate constant for reaction of atomic hydrogen and oxygen with methyl fluoride
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Paulino, J.A.; Squires, R.R.;
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Carbene thermochemistry from collision-induced dissociation threshold energy measurements. The heats of formation of X1A1 CF2 and X1A1 CCl2
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Absolute rate constant for the reaction of atomic hydrogen with acetylene over an extended pressure and temperature range
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Pedley, J.B.; Naylor, R.D.; Kirby, S.P.;
Thermochemical Data of Organic Compounds (Chapman and Hall: NY 1986)

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Peeters, J.; Mahnen, G.;
Symp. (Int.) Combust. 14, 133 (1973)
Reaction mechanisms and rate constants of elementary steps in methane-oxygen flames
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Peeters, J.; Van Hoeymissen, J.; Vanhaelemeersch, S.; Vermeylen, D.;
J. Phys. Chem. 96, 1257-1263 (1992)
Absolute rate constant measurements of CF(X1Pi) reactions. 1. Reactions with O2, F2, Cl2, and NO
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Perona, M.J.; Bryant, J.T.; Pritchard, G.O.;
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The decomposition of vibrationally excited 1,1,1-trideuterio-2,2-difluoroethane
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Perry, R.A.; Atkinson, R.; Pitts, J.N.,Jr.;
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Rate constants for the reaction of OH radicals with CH2=CHF, CH2=CHCl, and CH2=CHBr over the temperature range 299-426 K
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Petrella, R.V.;
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The explosive combustion of hydrogen and oxygen inhibited by halogen compounds
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Phillips, D.C.; Trotman-Dickenson, A.F.;
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The kinetics of the elimination of hydrogen fluoride from chemically activated 1,1,2-trifluoroethane and 1,1,2,2-tetrafluoroethane
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Pickard, J.M.; Rodgers, A.S.;
Int. J. Chem. Kinet. 15, 569-577 (1983)
Kinetics of the gas phase reaction CH3F + I2 = CH2FI + HI: The C-H bond dissociation energy in methyl and methylene fluorides
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Pickard, J.M.; Rodgers, A.S.;
J. Am. Chem. Soc. 98, 6115-6118 (1976)
Kinetics of the gas phase addition of bromine to 1,1-difluorethylene. Pi bond dissociation energy of 1,1-difluorethylene
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Pickard, J.M.; Rodgers, A.S.;
J. Am. Chem. Soc. 99, 695-696 (1977)
Pi bond dissociation energy in 1,1-difluoroethylene
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Pickard, J.M.; Rodgers, A.S.;
J. Am. Chem. Soc. 99, 691-694 (1977)
The kinetics and thermochemistry of the reaction of 1,1-difluoroethane with iodine. The CF2-H bond dissociation energy in 1,1-difluoroethane and the heat of formation of 1,1-difluoroethyl
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Plumb, I.C.; Ryan, K.R.;
Chem. Phys. Lett. 92, 236-244 (1982)
Kinetics of the reaction of CF3O2 with NO
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Plumb, I.C.; Ryan, K.R.;
Plasma Chem. Plasma Process. 6, 205 (1986)
A model of the chemical processes occurring in CF4/O2 discharges used in plasma etching
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Politanskii, S.F.; Shevchuk, U.V.;
Kinet. Katal. 9, 411-417 (1968)
Thermal conversions of fluoromethanes. II. Pyrolysis of difluoromethane and trifluoromethane
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Politanskii, S.F.; Shevchuk, V.U.;
Kinet. Katal. 9, 496 (1968)

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Pollock, T.L.; Jones, W.E.;
Can. J. Chem. 51, 2041-2046 (1973)
Gas phase reactions of fluorine atoms
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Pottie, R.F.;
J. Chem. Phys. 42, 2607 (1965)
Ionization potential and the heat of formation of the difluoromethylene radical
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Pownall, C.; Simmons, R.F.;
Symp. (Int.) Combust. 13, 585-592 (1971)
The effect of hydrogen bromide on the structure of propane-oxygen flames diluted with argon
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Pritchard, G.O.; Bryant, J.T.;
J. Phys. Chem. 72, 1603-1611 (1968)
The photolysis of 1,3-difluoro and 1,1,3,3-tetrafluoroacetone at low pressure
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Pritchard, G.O.; Follmer, D.W.;
Int. J. Chem. Kinet. 5, 169-171 (1973)
The deuterium isotope effect in disproportionation of CF2D radicals
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Pritchard, G.O.; Miller, G.H.;
J. Chem. Phys. 35, 1135-1136 (1961)
Comparison of CH3 and CF3 hydrogen abstraction reaction
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Pritchard, G.O.; Perona, M.J.;
Int. J. Chem. Kinet. 1, 509-525 (1969)
Some hydrogen atom abstraction reactions of CF2H and CFH2 radicals, and the C-H bond dissociation energy in CF2H2
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Pritchard, G.O.; Perona, M.J.;
Int. J. Chem. Kinet. 2, 281-297 (1970)
The elimination of HF from vibrationally excited fluoroethanes. The decomposition of 1,1,1-trifluoroethane-d0 and d3
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Pritchard, G.O.; Thommarson, R.L.;
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The C-H bond dissociation energies in CF3H, C2F5H, and C3F7H
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Pritchard, G.O.; Thommarson, R.L.;
J. Phys. Chem. 71, 1674-1682 (1967)
The photolysis of fluoroacetone and the elimination of hydrogen fluoride from 'hot' fluoroethanes
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Pritchard, G.O.; Abbas, S.H.; Kennedy, J.M.; Paquette, S.J.; Hudson, D.B.; Meleason, M.A.; Shoemaker, D.D.;
Int. J. Chem. Kinet. 22, 1051-1069 (1990)
Disproportionation reactions between alkyl and fluoroalkyl radicals. V. Perfluoro-n-propyl and ethyl radicals revisited
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Pritchard, G.O.; Abbas, S.H.; Piasecki, M.L.; Meleason, M.A.;
Int. J. Chem. Kinet. 23, 431-435 (1991)
Disproportionation reactions between alkyl and fluoroalkyl radicals. VI. Difluoromethyl and n-propyl radicals
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Pritchard, G.O.; Bryant, J.T.; Thommarson, R.L.;
J. Phys. Chem. 69, 664-665 (1965)
The reaction of methyl radicals with methyl and methylene fluoride
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Pritchard, G.O.; Dacey, J.R.; Kent, W.C.; Simonds, C.R.;
Can. J. Chem. 44, 171 (1966)
Some hydrogen abstraction reactions of perfluoroethyl radicals
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Pritchard, G.O.; Follmer, D.W.; Meleason, M.A.; Shoemaker, D.D.; Perkins, J.C.; Leupp, S.L.;
Int. J. Chem. Kinet. 24, 735-742 (1992)
Disproportionation reactions between alkyl and fluoroalkyl radicals. VII. Difluoromethyl with perfluoro-n-propyl and methyl radicals
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Pritchard, G.O.; Johnson, K.A.; Nilsson, W.B.;
Int. J. Chem. Kinet. 17, 327-335 (1985)
Disproportionation reactions between alkyl and fluoroalkyl radicals. III. A reassessment of values for CFyH(3-y) radicals (y=1,2,3) with C2H5 radicals
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Pritchard, G.O.; Kennedy, V.H.; Heldoorn, G.M.; Piasecki, M.L.; Johnson, K.A.; Golan, D.R.;
Int. J. Chem. Kinet. 19, 963-973 (1987)
Disproportionation reactions between alkyl and fluoroalkyl radicals. IV. Pentafluoroethyl and ethyl radicals
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Pritchard, G.O.; Nilsson, W.B.; Kirtman, B.;
Int. J. Chem. Kinet. 16, 1637-1643 (1984)
Orbital energy and entropy correlations for disproportionation versus combination in the reactions of CFxH(3-x) radicals (x=0,1,2,3) with ethyl radicals. The heat of formation of fluoromethylene
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Pritchard, G.O.; Nilsson, W.B.; Marchant, P.E.; Case, L.C.; Parmer, J.F.; Youngs, R.F.;
Int. J. Chem. Kinet. 16, 69-89 (1984)
Disproportionation reactions between alkyl and fluoroalkyl radicals. II. Fluoro- and trifluoromethyl with ethyl radicals
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Pritchard, G.O.; Pritchard, H.O.; Schiff, H.I.; Trotman-Dickenson, A.F.;
J. Chem. Soc. Faraday Trans. 52, 849 (1956)
The reactions of trifluoromethyl radicals
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Pritchard, G.O.; Venugopalan, M.; Graham, T.F.;
J. Phys. Chem. 68, 1786 (1964)
Photochemistry of the fluoro ketones. The production of vinyl fluoride in the photolysis of 1,3-difluoroacetone
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Puri, I.K.; Seshadri, K.;
Combust. Sci. Technol. 53, 55-65 (1987)
The extinction of counterflow premixed flames burning diluted methane-air, and diluted propane-air
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Quick, L.M.; Whittle, E.;
J. Chem. Soc. Faraday Trans. 67, 1727-1738 (1971)
Reactions of trifluoromethyl radicals with organic halides. Part 6.-bromo- and fluoro-bromoethanes
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Raal, F.A.; Steacie, E.W.R.;
J. Chem. Phys. 20, 578-581 (1952)
The reaction of methyl radicals with some halogenated methanes
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Rae, D.; Thompson, W.;
Combust. Flame 35, 131-138 (1979)
Experiments on prevention and suppression of coal-dust explosions by bromochlorodifluoromethane and on prevention by carbon tetrachloride
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Raff, L.M.;
J. Phys. Chem. 92, 141-147 (1988)
Computational studies of the bimolecular reaction dynamics of the C2H4 + F2 system
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Ranzi, E.; Sogaro, A.; Gaffuri, P.; Pennati, G.; Faravelli, T.;
Combust. Sci. Technol. 96, 279-325 (1994)
A wide range modeling study of methane oxidation
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Rendell, A.P.; Bauschlicher, C.W.; Langhoff, S.R.;
Chem. Phys. Lett. 163, 354 (1989)
A theoretical determination of the radiative lifetimes of the A2S+ and B2D states of CF
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Richter, H.; Vandooren, J.; Van Tiggelen, P.;
Bull. Soc. Chim. Belg. 99, 491 (1990)

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Ridley, B.A.; Davenport, J.A.; Stief, L.J.; Welge, K.H.;
J. Chem. Phys. 57, 520 (1972)
Absolute rate constant for the reaction H + H2CO
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Robinson, P.J.; Holbrook, K.A.;
Unimolecular Reactions (Wiley Interscience: New York, NY 1972)

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Rodgers, A.S.; Chao, J.; Wilhoit, R.C.; Zwolinski, B.J.;
J. Phys. Chem. Ref. Data 3, 117-140 (1974)
Ideal gas thermodynamic properties of eight chloro- and fluoromethanes
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Rodgers, A.S.; Ford, W.G.F.;
Int. J. Chem. Kinet. 5, 965-975 (1973)
Analysis of the kinetics of the thermal and chemically activated elimination of HF from 1,1,1-trifluoroethane. The C-C bond dissociation energy and the heat of formation of 1,1,1-trifluoroethane
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Rodgers, A.S.;
ACS Symp. Ser. 66, 296 (1978)
Thermochemistry of fluorocarbon radicals
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Rodgers, A.S.;
J. Phys. Chem. 71, 1996-2000 (1967)
Estimation of the heats of formation of chlorofluorocarbons
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Rodgers, A.S.;
TRC Thermodynamics Tables (Texas A&M University, College Station TX 1989)

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Rosser, W.A.,Jr.; Inami, S.H.; Wise, H.;
Combust. Flame 10, 287-294 (1966)
The quenching of premixed flames by volatile inhibitors
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Rosser, W.A.; Wise, H.; Miller, J.;
Symp. (Int.) Combust. 7, 175-182 (1958)
Mechanism of combustion inhibition by compounds containing halogens
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Rowland, F.S.; Rust, F.; Frank, J.P.;
ACS Symp. Ser. 66, 26-58 (1978)
Reaction of radioactive (18)F with alkenes, alkynes, and other substrates
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Russo, N.; Sicilia, E.; Toscano, M.;
J. Chem. Phys. 97, 5031-5036 (1992)
Geometries, singlet-triplet separations, dipole moments, ionization potentials, and vibrational frequencies in methylene (CH2) and halocarbenes (CHF, CF2, CCl2, CBr2, and CI2)
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Ryan, K.R.; Plumb, I.C.;
J. Phys. Chem. 86, 4678-4683 (1982)
Kinetics of the reactions of CF3 with O(3P) and O2 at 295 K
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Ryan, K.R.; Plumb, I.C.;
Plasma Chem. Plasma Process. 4, 271 (1984)
Gas-phase reactions of CF2 with O(3P) to produce COF: their significance in plasma processing
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Ryan, K.R.; Plumb, I.C.;
Plasma Chem. Plasma Process. 4, 141 (1984)
Gas-phase reactions of CF3 and CF2 with hydrogen atoms: Their significance in plasma processing
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Saathoff, H.; Zellner, R.;
Chem. Phys. Lett. 206, 349-354 (1993)
LIF detection of the CF3O radical and kinetics of its reaction with CH4 and C2H6
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Safieh, H.Y.; Vandooren, J.; Van Tiggelen, P.;
Symp. (Int.) Combust. 19, 117 (1982)
Experimental Study of Inhibition Induced by CF3Br in a CO-H2-O2-Ar flame
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Saito, K.; Kuroda, H.; Kakumoto, T.; Munechika, H.; Murakami, I.;
Chem. Phys. Lett. 113, 399-402 (1985)
Thermal unimolecular decomposition of formyl fluoride in Ar
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Sana, M.; Leroy, G.; Peeters, D.; Wilante, C.;
J. Mol. Struct. 41, 249-274 (1988)
The theoretical study of the heats of formation of organic compounds containing the substituents, CH3, CF2, NH2, NF2, NO2, OH and F
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Saunders, D.; Heicklen, J.;
J. Am. Chem. Soc. 87, 2088 (1965)
The reaction of oxygen atoms with tetrafluoroethylene
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Saunders, D.; Heicklen, J.;
J. Phys. Chem. 70, 1950-1958 (1966)
Some reactions of oxygen atoms. I. C2F4, C3F6, C2H2, C2H4, C3H6, 1-C4H8, C2H6, c-C3H6, C3H8
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Schnieder, W.F.; Wallington, T.J.;
J. Phys. Chem. 98, 7448 (1994)

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Schug, K.P.; Wagner, H.Gg.;
Ber. Bunsenges. Phys. Chem. 82, 719-725 (1978)
Der thermische zerfall von C2F4 in der gasphase. Zur bildungsenthalpie von difluorocarben
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Schug, K.P.; Wagner, H.Gg.;
Z. Phys. Chem. 86, 59-66 (1973)
Zum thermischen Zerfal von CH3F
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Schug, K.P.; Wagner, H.Gg.; Zabel, F.;
Ber. Bunsenges. Phys. Chem. 83, 167 (1979)
Gas phase elimination of hydrogen halides from halomethanes. I. Thermal decomposition of chlorodifluoromethane, trifluoromethane, and trichloromethane behind shock waves
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Scott, D.W.; Good, W.D.; Waddington, G.;
J. Am. Chem. Soc. 77, 245-246 (1955)
Heat of formation of tetrafluoromethane from combustion calorimetry of polytetrafluoroethylene
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Scoot, D.W.; Good, W.D.; Waddington, G.;
J. Phys. Chem. 60, 1080 (1956)

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Seeger, C.; Rotzoll, G.; Lubbert, A.; Schugerl, K.;
Int. J. Chem. Kinet. 13, 39-58 (1981)
A study of the reactions of fluorine with hydrogen and methane in the initiation phase using a miniature tubular reactor
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Seeger, C.; Rotzoll, G.; Lubbert, A.; Schugerl, K.;
Int. J. Chem. Kinet. 14, 457-469 (1982)
Direct detection of CF2 and computer modeling of its appearance in the fluorination of CH2F2, Int. J. Chem. Kinet. 14, 457-469 (1982).
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Sehested, J.; Nielsen, O.J.;
Chem. Phys. Lett. 206, 369-375 (1993)
Absolute rate constants for the reaction of CF3O2 and CF3O radicals with NO at 295K
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Sehested, J.; Ellerman, T.; Nielsen, O.J.; Wallington, T.J.; Hurley, M.D.;
Int. J. Chem. Kinet. 25, 701-717 (1993)
UV absorption spectrum, and kinetics and mechanism of the self reaction of CF3CF2O2 radicals in the gas phase at 295K
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Sekhar, M.V.C.; Tschuikow-Roux, E.;
J. Phys. Chem. 78, 472-477 (1974)
Kinetics of the shock-induced competitive dehydrofluorinations of 1,1,2-trifluoroethane
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Selamoglu, N.; Rossi, M.J.; Golden, D.M.;
Chem. Phys. Lett. 124, 68 (1986)
Absolute rate of recombination of CF3 radicals
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Seshadri, K.;
Combust. Flame 33, 197-215 (1978)
Structure and extinction of laminar diffusion flames above condensed fuels with water and nitrogen
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Sharp, T.E.; Johnston, H.S.;
J. Chem. Phys. 37, 1541 (1962)
Hydrogen-deuterium kinetic isotope effect, an experimental and theoretical study over a wide range of temperature
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Shortridge, R.G.; Lin, M.C.;
IEEE J. Quantum Electron. 10, 873-879 (1974)
Mechanism of HF laser emissions from flash-initiated CHFCl2 and CH2FCl-NO mixtures
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Simmons, R.F.; Wright, N.;
Combust. Flame 18, 203-206 (1972)
The burning velocities of near limit mixtures of propane, air, and hydrogen bromide
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Simmie, J.M.; Tschuikow-Roux, E.;
Chem. Commun., 773 (1970)
Thermal decomposition of vinylidene fluoride behind reflected shock waves
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Simmie, J.M.; Tschuikow-Roux, E.;
J. Phys. Chem. 74, 4075-4079 (1970)
Kinetics of the shock-initiated decomposition of 1,1-difluorethylene
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Simmie, J.M.; Quiring, W.J.; Tschuikow-Roux, E.;
J. Phys. Chem. 73, 3830-3833 (1969)
The thermal decomposition of perfluorocyclobutane in a single-pulse shock tube
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Simmie, J.M.; Quiring, W.J.; Tschuikow-Roux, E.;
J. Phys. Chem. 74, 992-994 (1970)
Kinetics of the dehydrofluorination of vinyl fluoride in a single-pulse shock tube
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Simmons, R.F.; Wolfhard, H.G.;
J. Chem. Soc. Faraday Trans. 51, 1211-1217 (1955)
The influence of methyl bromide on flames
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Simmons, R.F.; Wolfhard, H.G.;
J. Chem. Soc. Faraday Trans. 52, 53-59 (1956)
The influence of methyl bromide on flames. Part 2. - Diffusion flames
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Sinke, G.C.;
J. Phys. Chem. 70, 1326 (1966)

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Singleton, D.L.; Paraskevopoulos, G.; Irwin, R.S.;
J. Phys. Chem. 84, 2339 (1980)
Reaction of OH with CH3CH2F. The extent of H abstraction from the alpha and beta positions
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Skinner, G.B.; Ringrose, G.H.;
J. Chem. Phys. 42, 2190 (1965)
Ignition delays of a hydrogen-oxygen-argon mixture at relatively low temperatures
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Skinner, G.B.; Ringrose, G.H.;
J. Chem. Phys. 43, 4129 (1965)
Shock-tube experiments on inhibition of the hydrogen-oxygen reaction
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Skinner, G.B.;
ACS Symp. Ser. 16, 295-317 (1975)
Inhibition of the hydrogen-oxygen reaction by CF3Br and CF2BrCF2Br
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Skinner, G.B.; Lifshitz, A.; Scheller, K.; Burcat, A.;
J. Chem. Phys. 56, 3853 (1972)
Kinetics of methane oxidation
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Skinner, H.A.;
Adv. Organometallic Chem. 2, 49 (1965)

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Slagle, I.R.; Gutman, D.; Gilbert, J.R.;
Symp. (Int.) Combust. 15, 785-793 (1974)
Direct indentification of products and measurement of branching ratios for the reactions of oxygen atoms with vinylfluoride, vinylchloride, and vinylbromide
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Slanina, Z.;
Theor. Chim. Acta 181, 119-125 (1991)
Conformers of 1,2-difluoroethane: their thermodynamic interplay and the extremum temperature course of some terms
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Smail, T.; Rowland, F.S.;
J. Phys. Chem. 74, 1866-1871 (1970)
The insertion reactions of mono- and difluorocarbene with hydrogen halides
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Smail, T.; Miller, G.E.; Rowland, F.S.;
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Features of the potential energy surface for reactions of OH with CH2O
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Ab initio studies of the structure and thermochemistry of FO radicals
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An examination of the heats of formation for HFCO and HClCO molecules
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Photo-chemical vapor deposition of hydrogenated amorphous silicon films
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Zarnani, H.; Yu, Z.Q.; Collins, G.J.; Bhattacharya, E.; Pankove, J.I.;
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Lin, I.; Ting, L.W.;
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Heteroepitaxial growth of Ge films on (100) GaAs by pyrolysis of digermane
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Using decomposed disilane as a gas source for silicon epitaxial growth on germanium (111): photoemission studies
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The energy balance and branching rations associated with the chemiluminescent reaction
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Campargue, A.; Chenevier, M.; Stoeckel, F.;
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High-resolution overtone spectroscopy of silane and silane-d3 (.DELTA..nu.SiH = 6) and methane (.DELTA..nu.CH = 5)
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Chasovnikov, S.A.; Chernyshev, A.V.; Krasnoperov, L.N.;
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Pressure quenching of chain branching reactions of silane and silane-d4 chlorination
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Fantoni, R.; Bijnen, F.; Piccirillo, S.; Enzo, S.;
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Investigation of laser induced silane/hydrocarbon reactions in the formation of silicon and silicon carbide powders
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Laser spectroscopy and gas-phase chemistry in CVD
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The time-resolved LMR method as used to measure elementary reaction rated of Cl atoms and SiH3 radicals in pulse photolysis of S2Cl2 in the presence o
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Some comments on kinetics and mechanism in the pyrolysis of monosilane
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On the primary process in plasma-chemical and photochemical vapor deposition from silane an ab initio study of unimolecular decomposition of SiH in th
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Time-resolved lif detection of silylene in the ir mpd of ethylsilane
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Laser-excited fluorescence detection of SiH2 produced in IR MPD of organosilanes
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The photodissociation of phenylsilane at 193 nm
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Relative rate studies for silylene
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MPI/MS detection of fluorosilylidyne (SiF) and difluorosilylene (SiF2) radicals produced from the reaction of molecular fluorine and nitrogen trifluor
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A theoretical study of 1,2-ethynediylsilylidyne ion(1+) (SiC2+)
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Induction effects on IR-predissociation spectra of sulfur hexafluoride tetrafluorosilane and silane (SF6)2, (SiF4)2 and (SiH4)2 dimer molecules
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A comparative ab initio study of the silyleneaminylium and methyleneaminylium (H2SiN+ and H2CN+)
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The reaction of gas-phase dimethylsilylene with dimethyl ether
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Reactive sticking coefficient of silane on the silicon(111)-(7 .times. 7) surface
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Absolute rate constants for the reaction of silylidyne (SiH) with hydrogen, deuterium and silane
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Quantum yield studies of disilane photodissociation at 193 nm by infrared diode laser spectroscopy
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Kinetic measurements and product branching ratio for the reaction NH2+NO at 294-1027K
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Rate constant measurements for reactions of SiH3 with O2, NO, and NO2 using time-resolved infrared diode laser spectroscopy
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Lifetime measurements of GeH and CH in the A2 =0 state by laser-induced fluorescence
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The triplet state of ammonia
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On the reaction of the NH2 radical with NO2 at 295-620 K
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On the reaction of the NH2 radical with NO at 295-620 K
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Slanina, Z.;
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On the relative stabilities of Si6H6 isomers
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Electronic structure calculations on workstation computers: the program system turbomole
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A study of competitive secondary dissociation in the thermal decomposition of ethynylsilane
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Is the hypervalent radical silicon hydride (SiH5) a stable species? An ab initio study
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Theoretical studies of neutral silane-ammonia adducts
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Absolute rate constants for the reaction of silyl with nitric oxide, ethylene, propyne, and propylene, and the silyl recombination reaction
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Experimental determination of the sign of molecular dipole moment derivatives: an infrared-visible sum frequency generation absolute phase measuremen
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Reactions of n-propylbenzene during gas phase oxidation
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High temperature photochemistry (HTP): kinetics and mechanism studies of elementary combustion reactions over 300-1700K
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Temperature dependence of the kinetics of elementary combustion reactions of refractory species
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Stoichiometery and possible mechanisms of SiH4-O2 explosions
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Oxidation kinetics of carbon blacks over 1300-1700K
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Gas phase synthesis of organophosphorus compounds and the atmosphere of the giant planets
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Thermal decomposition kinetics of polysilanes: disilane, trisilane, and tetrasilane
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Kinetics of polyatomic free radicals produced by laser photolysis. 5. Study of the equilibrium CH3+O2=CH3O2 between 421 and 538° C
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Quantum mechanical stability of reaction coordinate in the unimolecular reaction of silanone
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measuring internal (vib,rot) energy distrib. of CCl and N2 using laser-induced fluorescence and optical emission.
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energy ion scattering and mass spec detection. Observed segregation of Group V (As,P) to
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Surface roughness evolution on glow discharge amorphous hydrogenated silicon
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Collins, R.W.; Cavese, J.M.;
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Jasinski, J.M.; Meyerson, B.S.; Nguyen, T.N.;
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Excimer laser-induced deposition of silicon nitride thin films
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Surface reaction probability of film-producing radicals in silane glow discharges
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Vibrational distributions and rate constants from reactions of oxygen atoms with hydrogen iodide, germane, silane, hydrogen selenide, and hydrogen sul
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Thoman, J.W.,Jr.; Steinfeld, J.I.; McKay, R.I.; Knight, A.E.W.;
J. Chem. Phys. 86, 5909 (1987)
Wide fluctuations in fluorescence lifetimes of individual rovibronic levels in silylene (SiH2)( A1B1)
need
need

Engel, Y.M.; Levine, R.D.; Thoman, J.W.,Jr.; Steinfeld, J.I.; McKay, R.I.;
J. Chem. Phys. 86, 6561 (1987)
Quantal fluctuations in fluorescence lifetimes of individual rovibronic levels
need
need

Hunter, S.R.; Carter, J.G.; Christophorou, L.G.;
J. Chem. Phys. 86, 693 (1987)
Electron attachment and ionization processes in tetrafluoromethane, perfluoroethane, perfluoropropane, and perfluorobutane
need
need

Bader, R.F.W.; Larouche, A.; Gatti, C.; Carroll, M.T.; MacDougall, P.J.; Wiberg, K.B.;
J. Chem. Phys. 87, 1142 (1987)
Properties of atoms in molecules: dipole moments and transferability of properties
need
need

Faidas, H.; Siomos, K.;
J. Chem. Phys. 87, 5097 (1987)
Multiphoton ionization studies of benzene in tetramethylsilane and n-pentane solutions
need
need

Mandich, M.L.; Reents, W.D.,Jr.;
J. Chem. Phys. 88, 1703 (1988)
Sequential clustering reactions of silicon(1+) with silane-d4: identification of a bottleneck preventing rapid growth of hydrogenated silicon particle
need
need

Joyce, S.; Langan, J.G.; Steinfeld, J.I.;
J. Chem. Phys. 88, 2027 (1988)
Chemisorption of fluorocarbon free radicals on silicon and silica
need
need

Francisco, J.S.; Barnes, R.; Thoman, J.W.Jr.;
J. Chem. Phys. 88, 2334 (1988)
Dissociation dynamics of low-lying electronic states of silylene (SiH2)
need
need

Francisco, J.S.; Schlegel, H.B.;
J. Chem. Phys. 88, 3736 (1988)
Photodissociation dynamics of ethylsilane: ab initio and RRKM study
need
need

Larrieu, C.; Liotard, D.; Chaillet, M.; Dargelos, A.;
J. Chem. Phys. 88, 3848 (1988)
Theoretical study of the electronic spectrum of silane (SiH4)
need
need

Millot, G.; Hetzler, J.; Foy, B.; Steinfeld, J.I.;
J. Chem. Phys. 88, 6742 (1988)
Infrared double resonance of silane with a tunable diode laser: two-photon absorptions and rotational relaxation times
need
need

Nakamura, K.; Okamoto, M.; Takayanagi, T.; Kawachi, T.; Shimokoshi, K.; Sato, S.;
J. Chem. Phys. 90, 2992 (1989)
Electron spin resonance spectra of silyl (SiH3) radicals trapped in the low temperature matrix of nonmagnetic isotopes of xenon
need
need

Mandich, M.L.; Reents, W.D.,Jr.;
J. Chem. Phys. 90, 3121 (1989)
Sequential reactions of bare silicon clusters with silane-d4 (SiD4): constrained heterogeneous nucleation of deuterated silicon particles
need
need

Tanaka, H.; Boesten, L.; Kimura, M.; Dillon, M.A.; Spence, D.;
J. Chem. Phys. 92, 2115 (1990)
Observation of the lowest triplet state in silane by electron energy loss spectroscopy
need
need

Gates, S.M.; Greenlief, C.M.; Beach, D.B.; Holbert, P.A.;
J. Chem. Phys. 92, 3144 (1990)
Decomposition of silane on silicon(111)-(7.times.7) and silicon(100)-(2.times.1) surfaces below 500.degree.C
need
need

Mandich, M.L.; Reents, W.D.,Jr.; Kolenbrander, K.D.;
J. Chem. Phys. 92, 437 (1990)
Sequential clustering reactions of silylium-d3 (SiD3+) with silane-d4 and silylium with silane: another case of arrested growth of hydrogenated silic
need
need

Hetzler, J.R.; Steinfeld, J.I.;
J. Chem. Phys. 92, 7135 (1990)
State-to-state rotational energy transfer measurements in silane by infrared double resonance with a tunable diode laser
need
need

Lehmann, K.K.; Pate, B.H.; Scoles, G.;
J. Chem. Phys. 93, 2152 (1990)
Statistical intramolecular vibrational relaxation and its hindrance: the fundamentals of 3,3-dimethylbutyne and ethynyltrimethylsilane ((CH3)3C-C.tplb
need
need

Reents, W.D.,Jr.; Mandich, M.L.;
J. Chem. Phys. 93, 3270 (1990)
Hydrogen/deuterium isotope exchange reaction of silylium with silane-d4 and silylium-d3 with silane: evidence for hydride stripping reaction
need
need

Gu, X.J.; Levandier, D.J.; Zhang, B.; Scoles, G.; Zhuang, D.;
J. Chem. Phys. 93, 4898 (1990)
On the infrared spectroscopy of tetrafluorosilane and sulfur hexafluoride in argon clusters: location of the solute
need
need

Arthur, N.L.; Potzinger, P.; Reimann, B.; Steenberger, H.P.;
J. Chem. Soc. 85, 1447 (1989)
Reaction of H atoms with some silanes and disilanes
need
need

Doncaster, A.M.; Walsh, R.;
J. Chem. Soc. Chem. Commun. (1979)
Kinetic determination of the bond dissociation energy D(SiH3-H) and its implications for bond strengths in silanes
need
need

Stinespring, C.D.; Wormhoudt, J.C.;
J. Crystal Growth 87, 481 (1988)
Gas phase kinetics analysis and implications for silicon carbide chemical vapor deposition
need
need

Sakaguchi, H.; Suzuki, R.; Meguro, T.;
J. Crystal Growth 93, 602 (1988)
Systematic study on silicon and selenium doping of MOVPE gallium arsenide
need
need

Sedgwick, T.O.; Smith, J.E.,Jr.; Ghez, R.; Cowher, M.E.;
J. Crystal Growth 31, 264 (1975)
Inelastic light scattering studies of silicon chemical vapor deposition (CVD) systems
need
need

van den Brekel, C.H.J.; Bollen, L.J.M;
J. Crystal Growth 54, 310 (1981)

need
need

Coltrin, M.E.; Kee, R.J.; Miller, J.A.;
J. Electrochem. Soc. 131, 425 (1984)
A mathematical model of the coupled fluid mechanics and chemical kinetics in a chemical vapor deposition reactor
need
need

Coltrin, M.E.; Kee, R.J.; Miller, J.A.;
J. Electrochem. Soc. 133, 1206 (1986)
A mathematical modeling of silicon chemical vapor deposition
need
need

Levy, R.A.; Gallagher, P.K.; Schrey, F.;
J. Electrochem. Soc. 134, 1744 (1987)
Low pressure chemical vapor deposition of borophosphosilicate glass films produced by injection of miscible DADBS-TMB-TMP liquid sources
need
need

Moffat, H.K.; Jensen, K.F.;
J. Electrochem. Soc. 135, 459 (1988)
Three-dimensional flow effects in silicon CVD in horizontal reactors
need
need

Hochberg, A.K.; O'Meara, D.L.;
J. Electrochem. Soc. 136, 1843 (1989)
The LPCVD of silicon oxide films below 400.degree.C from liquid sources
need
need

Coltrin, M.E.; Kee, R.J.; Evans, G.H.;
J. Electrochem. Soc. 136, 819 (1989)
A mathematical model of the fluid mechanics and gas-phase chemistry in a rotating disk chemical vapor deposition reactor
need
need

Pearton, S.J.; Chakrabarti, U.K.; Hobson, W.S.; Perley, A.P.;
J. Electrochem. Soc. 137, 3188 (1990)
Chlorine and silicon tetrachloride reactive ion etching of indium-based III-V semiconductors
need
need

Suzuki, M.; Kobayashi, N.; Mukai, K.; Kondo, S.;
J. Electrochem. Soc. 137, 3213 (1990)
Characterization of silane-reduced tungsten films grown by CVD as a function of silicon content
need
need

Moazzen-Ahmadi, N.; Ozier, I.;
J. Mol. Spectrosc. 123, 26 (1987)
Diode-laser study of the torsional overtone in methylsilane
need
need

Schaeffer, R.D.; Lovejoy, R.W.; Olson, W.B.; Tarrago, G.;
J. Mol. Spectrosc. 128, 135 (1988)
High-resolution infrared spectrum of deuterated silane (28SiH3D) from 1450 to 1710 cm-1
need
need

Vervloet, M.; Bredohl, H.; Dubois, I.; Melen, F.;
J. Mol. Spectrosc. 131, 53 (1988)
The D'(3d.sigma.)2.SIGMA.+-C'(4p.pi.)2.PI. and C'(4p.pi.)2.PI.-B(4s.sigma.)2.SIGMA.+ Rydberg-Rydberg transitions of fluorosilylidyne (SiF)
need
need

Prinz, H.; Hoehe, W.; Kreiner, W.A.; Loete, M.; Hilico, J.; Pierre, G.; Magerl, G.; Schupita, W.;
J. Mol. Spectrosc. 135, 144 (1989)
The vibration-induced dipole moment in the .nu.2/.nu.4 diad of deuteromethane and silane (13CD4 and 28SiH4)
need
need

Skrzypczak, J.; Pierre, G.; Herlemont, F.; Lemaire, J.;
J. Mol. Spectrosc. 138, 311 (1989)
Saturated absorption of silane with carbon dioxide waveguide laser
need
need

Prinz, H.; Kreiner, W.A.; Loete, M.; Jouvard, J.M.;
J. Mol. Spectrosc. 139, 30 (1990)
Silane (29SiH4 and 30SiH4): dipole moment parameters of the .nu.2/.nu.4 dyad from Stark effect observations with laser sidebands
need
need

Betrencourt, M.; Deroche, J.C.; Buerger, H.; Sommer, S.;
J. Mol. Spectrosc. 142, 220 (1990)
The vibrational ground state of silane-d2
need
need

Lavorel, B.; Millot, G.; Kou, Q.L.; Guelachvili, G.; Bouzouba, K.; Lepage, P.; Tyuterev, V.G.; Pierre, G.;
J. Mol. Spectrosc. 143, 35 (1990)
Study of .nu.1/.nu.3 interacting bands of silane: analysis of infrared and Raman spectra
need
need

Luijkx, J.M.; Platten, J.K.;
J. Non-Equilib. Thermodyn. 6, 141 (1981)
On the onset of free convection in a rectangular channel
need
need

Blazejowski, J.; Lampe, F.W.;
J. Photochem. 20, 9 (1982)
Monosilylphosphine formation by rapid silylene insertion in the IR photochemistry of SiH4-PH3 mixtures
need
need

Choo, K.Y.; Gaspar, P.P.; Wolf, A.P.;
J. Phys. Chem. 79, 1752 (1975)
Rates of reaction of hydrogen atoms with silane and germane
need
need

Mihelcic, D.; Schubert, V.; Schindler, R.N.;
J. Phys. Chem. 81, 1543 (1977)
Rate constants for the reaction of hydrogen and deuterium atoms with silane
need
need

Neudorf, P.; JPlatten, J.K.;
J. Phys. Chem. 84, 338 (1980)
Mechanism for the thermal decomposition of monosilane
need
need

Bock, C.W.; Trachtman, M.; Mains, G.J.;
J. Phys. Chem. 89, 2283 (1985)
A theoretical study of the silylboranes
need
need

Ho, P.; Coltrin, M.E.; Binkley, J.S.; Melius, C.F.;
J. Phys. Chem. 89, 4647 (1985)
A theoretical study of the heats of formation of SiHn, SiHnClm compounds
need
need

Shin, S.K.; Beauchamp, J.L.;
J. Phys. Chem. 90, 1507 (1986)
Proton affinity and heat of formation of silylene
need
need

Ho, P.; Coltrin, M.E.; Binkley, J.S.; Melius, C.F.;
J. Phys. Chem. 90, 3399 (1986)
A theoretical study of the heats of formation of Si2Hn (n=0-6) compounds and trisilane
need
need

Rickborn, S.F.; Rogers, D.S.; Ring, M.A.; O'Neal, H.E.;
J. Phys. Chem. 90, 408 (1986)
Kinetic and product studies of the thermal decomposition of dimethylsilane in a single-pulse shock tube and in a stirred flow reactor
need
need

Boo, B.H.; Armentrout, P.B.;
J. Phys. Chem. 91, 5777 (1987)
Energetics and reaction mechanisms of silyliumylidene + deuterium and silyliumylidene-d + hydrogen and collision-induced dissociation of silylium-d3
need
need

Pasternack, L.; Balla, R.J.; Nelson, H.H.;
J. Phys. Chem. 92, 1200 (1988)
Study of reactions of BH3 with CO, NO O2 C2H4, and H2O using diode laser absorption
need
need

Reents, W.D.,Jr.; Mandich, M.L.;
J. Phys. Chem. 92, 2908 (1988)
Reactions of silicon clusters with silane-d4: formation of structural isomers
need
need

Bell, T.N.; Marciniak, B.; Sherwood, A.G.;
J. Phys. Chem. 92, 3818 (1988)
Reactions of trifluoromethyl and triplet methylene radicals with some alkylsilanes
need
need

Baggott, J.E.; Frey, H.M.; King, K.D.; Lightfoot, P.D.; Walsh, R.; Watts, I.M.;
J. Phys. Chem. 92, 4025 (1988)
Temperature dependence of a reaction of silylene with deuterium
need
need

Stanton, C.T.; McKenzie, S.M.; Sardella, D.J.; Levy, R.G.; Davidovits, P.;
J. Phys. Chem. 92, 4658 (1988)
Boron atom reactions with silicon and germanium tetrahalides
need
need

Engel, Y.M.; Levine, R.D.; Thoman, J.W.,Jr.; Steinfeld, J.I.; McKay, R.;
J. Phys. Chem. 92, 5497 (1988)
Information theoretic analysis of quantal fluctuations in fluorescence lifetimes
need
need

Luo, Y.R.; Benson, S.W.;
J. Phys. Chem. 93, 1674 (1989)
New electronegativity scale for the correlation of heats of formation. 5. Simple silicon-containing compounds
need
need

Helfferich, F.G.;
J. Phys. Chem. 93, 6676 (1989)
Systematic approach to elucidation of multistep reaction networks
need
need

Blazejowski, J.; Lampe, F.W.;
J. Phys. Chem. 93, 8038 (1989)
Tetrafluorosilane-sensitized decomposition of germane by a pulsed carbon dioxide TEA laser
need
need

Beach, D.B.; Jasinski, J.M.;
J. Phys. Chem. 94, 3019 (1990)
Excimer laser photochemistry of silane-ammonia mixtures at 193 nm
need
need

Moore, C.B.; Lampe, F.W.;
J. Phys. Chem. 94, 4094 (1990)
Infrared laser photochemistry of silane-chloromethane mixtures
need
need

Tachibana, A.; Kurosaki, Y.; Sera, T.; Tanaka, E.; Fueno, H.; Yamabe, T.;
J. Phys. Chem. 94, 5234 (1990)
Reaction ergodography for silicon nitride bond formation in the laser-driven gas-phase reaction
need
need

Perrin, J.; Delafosse, E.;
J. Phys. D 13, 759 (1980)

need
need

Donnelly, V.M.; JcCaulley, J.A.;
J. Vac. Sci. Technol. 8, 84 (1990)
Infrared-laser interferometric thermometry: a nonintrusive technique for measuring semiconductor wafer temperatures
need
need

Gottscho, R.A.; Davis, G.P.; Burton, R.H.;
J. Vac. Sci. Technol. A 1, 622 (1983)
CCl4 plasma using laser-induced fluor. and optical emission.
need
need

Gottscho, R.A.; Mandich, M.L.;
J. Vac. Sci. Technol. A 3, 617 (1985)
Cl2+ in N2+Cl2 and BCl3 plasmas using LIF and optical emiss.
need
need

Ashby, C.I.;
J. Vac. Sci. Technol. A 4, 666 (1986)
due to photo-excitation of semiconductor using light with photon energies greater than band gap. Clearly not a thermal effect, nor gas phase excitati
need
need

McNevin, S.C.;
J. Vac. Sci. Technol. A 4, 695 (1986)

need
need

Gillis, H.P.; Gignac, W.J.;
J. Vac. Sci. Technol. A 4, 696 (1986)
detect desorbed prods. Also time-resolved surface reflect.
need
need

Suda, Y.; Lubben, D.; Motooka, T.; Greene, J.E.;
J. Vac. Sci. Technol. A 8, 61 (1990)
Adsorption and thermal dissociation of disilane (Si2H6) on Si(100)2x1
need
need

McNevin, S.C.; Becker, G.E.;
J. Vac. Sci. Technol. B 2, 27 (1984)

need
need

McNevin, S.C.; Becker, G.E.;
J. Vac. Sci. Technol. B 3, 485 (1985)

need
need

Balooch, M.; Olander, D.R.; Siekhaus, W.J.;
J. Vac. Sci. Technol. B 4, 794 (1986)
and Ar+ beams.
need
need

Kirillov, D.; Cooper, C.B.,III; Powell, R.A.;
J. Vac. Sci. Technol. 4, 1316 (1986)
Raman scattering study of plasma etching damage in gallium arsenide
need
need

Mitchell, M.J.; Suto, M.; Lee, L.C.; Chuang, T.J.;
J. Vac. Sci. Technol. 5, 1444 (1987)
Chemiluminescence from fluorine atom and xenon difluoride etching reactions with silicon
need
need

Bennett, P.A.; Tong, X.; Butler, J.R.;
J. Vac. Sci. Technol. 6, 1336 (1988)
Thin-film crystallography using reflection high-energy electron diffraction rod intensity profiles: nickel/silicon (111)
need
need

Lin, P.S.D.; Gozdz, A.S.;
J. Vac. Sci. Technol. 6, 2290 (1988)
High-throughput nanolithography using an oxygen-plasma resistant two-layer resist system
need
need

Suda, Y.; Lubben, D.; Motooka, T.; Greene, J.E.;
J. Vac. Sci. Technol. 7, 1171 (1989)
Thermal and photostimulated reactions on disilane-adsorbed silicon(100) 2 .times. 1 surfaces: mechanisms of silicon film growth by atomic-layer epita
need
need

Mandich, M.L.; Reents, W.D.,Jr.; Kolenbrander, K.D.;
J. Vac. Sci. Technol. 7, 1295 (1989)
Electronic and chemical properties of small silicon clusters in reactions with silane
need
need

Pearton, S.J.; Chakrabarti, U.K.; Hobson, W.S.; Kinsella, A.P.;
J. Vac. Sci. Technol. 8, 607 (1990)
Reactive ion etching of gallium arsenide, aluminum gallium arsenide, and gallium antimonide in chlorine and tetrachlorosilane
need
need

Hikosaka, K.; Mimura, T.; Joshin, K.;
Jpn. J. Appl. Phys. 20, 847 (1981)

need
need

Powell, R.A.;
Jpn. J. Appl. Phys. 21, 170 (1982)

need
need

Asakawa, K.; Sugata, S.;
Jpn. J. Appl. Phys. 22, 653 (1983)

need
need

Sugata, S.; Asakawa, K.;
Jpn. J. Appl. Phys. 22, 813 (1983)
beam etch of GaAs
need
need

Votintsev, V.N.; Zaslonko, I.S.; Mikheev, V.S.; Smirnov, V.N.;
Kinet. Katal. 26, 1297 (1985)
Mechanism of the decomposition of germane
need
need

Serdyuk, N.K.; Strunin, V.P.; Chesnokov, E.N.; Panfilov, V.N.;
Kinet. Katal. 26, 790 (1985)
Isotope exchange during the thermal decomposition of a SiH4-SiD4 mixture
need
need

Arutyunyan, S.A.; Sarkisyan, E.N.;
Kinet. Katal. 27, 739 (1986)
Detection of peroxidic radicals in the monosilane-oxygen flame
need
need

Votintsev, V.N.; Zaslonko, I.S.; Mikheev, V.S.; Smirnov, V.N.;
Kinet. Katal. 27, 972 (1986)
Mechamism and kinetics of silane decomposition in shock waves
need
need

Karlicek, R.F.; Donnelly, V.M.,Jr.; Johnston, W.D.;
Mater. Res. Soc. Symp. Proc. 17, 151 (1983)
Laser spectroscopic investigation of gas-phase processes relevant to semiconductor device fabrication
need
need

Eden, J.G.; Greene, J.E.; Osmundsen, J.F.; Lubben, D.; Abele, C.C.; Gorbatkin, S.; Desai, H.D.;
Mater. Res. Soc. Symp. Proc. 17, 185 (1983)
Semiconductor thin films grown by laser photolysis
need
need

Ashby, C.I.H.;
Mater. Res. Soc. Symp. Proc. 29, 173 (1984)

need
need

Houle, F.A.;
Mater. Res. Soc. Symp. Proc. 29, 203 (1984)

need
need

Osmundsen, J.F.; Abele, C.C.; Eden, J.G.;
Mater. Res. Soc. Symp. Proc. 29, 259 (1984)
Gas phase spectroscopy of a Ge film LCVD reactor
need
need

Walkup, R.; Avouris, Ph.; Dreyfus, R.W.; Jasinski, J.M.; Selwyn, G.S.;
Mater. Res. Soc. Symp. Proc. 29, 269 (1984)

need
need

Chang, K.T.; Lam, C.; Rose, K.;
Mater. Res. Soc. Symp. Proc. 106, 107 (1988)
Conduction and injection in off-stoichiometry oxides
need
need

Collins, R.W.; Cavese, J.M.;
Mater. Res. Soc. Symp. Proc. 118, 19 (1988)
Process monitoring for amorphous hydrogenated silicon materials and interfaces
need
need

Chatham, H.; Bhat, P.K.;
Mater. Res. Soc. Symp. Proc. 118, 31 (1988)
Comparative discharge diagnostic study of silane, disilane, and germane rf discharges using optical emission spectroscopy and mass spectrometry
need
need

Boch, E.; Fuchs, C.; Fogarassy, E.; Siffert, P.;
Mater. Res. Soc. Symp. Proc. 129, 195 (1989)
A comparison of the gas phase processes resulting from silane and disilane photodissociation with a pulsed argon monofluoride excimer laser
need
need

Gates, S.M.; Greenlief, C.M.; Beach, D.B.;
Mater. Res. Soc. Symp. Proc. 131, 179 (1989)
Silane adsorption and decomposition on silicon(111)-(7 .times. 7)
need
need

Lam, C.H.; Rose, K.;
Mater. Res. Soc. Symp. Proc. 131, 281 (1989)
Chemical kinetics of silicon-rich oxide growth in an LPCVD reactor
need
need

Jasinski, J.M.; Chu, J.O.; Begemann, M.H.;
Mater. Res. Soc. Symp. Proc. 131, 487 (1989)
Excimer laser photodissociation studies of disilane at 193 nm
need
need

Jasinski, J.M.; Beach, D.B.; Estes, R.D.;
Mater. Res. Soc. Symp. Proc. 131, 501 (1989)
Excimer laser induced photochemistry of silane-ammonia mixtures
need
need

Ting, W.; Lin, S.N.; Kwong, D.L.;
Mater. Res. Soc. Symp. Proc. 146, 351 (1989)
Formation of ultrathin stacked dielectrics prepared by in-situ multi-step RTP-CVD
need
need

Gallagher, A.; Doyle, J.; Doughty, D.;
Mater. Res. Soc. Symp. Proc. 149, 23 (1989)
Plasma chemistry in silane and silane-germane discharge deposition
need
need

Veprek, S.; Heintze, M.; Bayer, R.; Jurcik-Rajman, M.;
Mater. Res. Soc. Symp. Proc. 149, 3 (1989)
From the understanding of the reactor mechanism towards optimizing the deposition rate and optoelectronic properties of amorphous hydrogenated silicon
need
need

Chatham, H.; Bhat, P.K.;
Mater. Res. Soc. Symp. Proc. 149, 447 (1989)
High deposition rate p-i-n solar cells prepared from disilane using VHF discharges
need
need

Hanabusa, M.; Tsuboi, T.; Sato, T.; Furuno, S.; Iguchi, S.; Inoue, T.;
Mater. Res. Soc. Symp. Proc. 75, 209 (1987)
Deposition of amorphorus silicon films using silane molecular beams excited by heated wire and argon fluoride laser
need
need

Taylor, R.C.; Scott, B.A.; Lin, S.T.; LeGoues, F.; Tsang, J.C.;
Mater. Res. Soc. Symp. Proc. 77, 709 (1987)
Chemical vapor deposition of silicon films using hexachlorodisilane
need
need

Fuchs, C.; Boch, E.; Fogarassy, E.; Aka, B.; Siffert, P.;
Mater. Res. Soc. Symp. Proc. (1988)
Two-photon absorption cross-section for silane under pulsed ArF (193 nm) excimer laser irradiation
need
need

Hawari, J.A.; Lesage, M.; Griller, D.; Weber, W.P.;
Organometallics 6, 880 (1987)
Relative rate constants for the reactions of methylphenylsilylene
need
need

O'Neal, H.E.; Ring, M.A.;
Organometallics 7, 1017 (1988)
Mechanism of the thermal decomposition of dimethylsilane at atmospheric pressures in the gas phase
need
need

Levin, G.; Das, P.K.; Lee, C.L.;
Organometallics 7, 1231 (1988)
Dimethylsilylene: spectroscopy, reactivity, and complexation in fluid solutions
need
need

Walsh, R.;
Organometallics 7, 75 (1988)
Kinetics of alkyldisilane pyrolyses and heats of formation of methylsilylenes
need
need

Reuter, K.A.; Jacobson, D.B.;
Organometallics 8, 1126 (1989)
Novel hydrogen/methyl exchange between SiHx(CH3)3-x+ (x = 1 - 3) and propene in the gas phase
need
need

Nares, K.E.; Harris, M.E.; Ring, M.A.; O'Neal, H.E.;
Organometallics 8, 1964 (1989)
Decomposition kinetics of 1,1,2,2-tetramethyldisilane and of 1,1-dimethyldisilane
need
need

O'Neal, H.E.; Ring, M.A.; Richardson, W.H.; Licciardi, G.F.;
Organometallics 8, 1968 (1989)
Kinetic determinations of the heats of formation of methylated disilanes and of silylene, methylsilylene and dimethylsilylene
need
need

Walsh, R.;
Organometallics 8, 1973 (1989)
Certainties and uncertainties in the heats of formation of the methylsilylenes
need
need

Conlin, R.T.; Netto-Ferreira, J.C.; Zhang, S.; Scaiano, J.C.;
Organometallics 9, 1332 (1990)
Kinetic study of dimesitylsilylene by laser flash photolysis
need
need

Ring, M.A.; O'Neal, H.E.;
Phys. Chem. (1988)
Recent advances in 1) mechanism and kinetics of alkylsilylene reactions & in 2) silicon hydride kinetics and thydride molecules
need
need

Walsh, R.;
Phys. Chem. (1988)
Thermochemistry and reactivity of silylenes
need
need

Lampe, F.W.;
Phys. Chem. (1988)
Mass spectrometery and ion-molecule reactions in silanes
need
need

Gianturco, F.A.; Pantano, L.C.; Scialla, S.;
Phys. Rev. A 36, 557 (1987)
Low-energy structure in electron-silane scattering
need
need

Gupta, P.; Colvin, V.L.; George, S.M.;
Phys. Rev. B 37, 8234 (1988)
Hydrogen desorption kinetics from monohydride and dihydride species on silicon surfaces
need
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Photoemission study of low pressure silane adsorption on silicon(111)7 .times. 7
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On the role of carrier gas in the deposition kinetics of silica films produced by low temperature chemical vapor deposition
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Thin Solid Films 60, 19 (1979)
The kinetics of the deposition of silicon by silane pyrolysis at low temperatures and atmospheric pressure
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Protonated hydrochlorous acid (HOClH+): Molecular structure, vibrational frequencies, and proton affinity
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J. Phys. Chem. 99, 1919 (1995)
Ab Initio Study of the Structure, Binding Energy, and Vibrations of the HOCl-H2O Complex
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Francisco, J.S.; Richardson, S.L.;
J. Chem. Phys. 102, 1100 (1995)
Determination of the CC bond dissociation energy in cyanogen
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Maricq, M.M.; Szente, J.J.; Dibble, T.S.; Francisco, J.S.;
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Atmospheric Chemical Kinetics of FC(O)O
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Dibble, T.S.; Francisco, J.S.;
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Determination of the Heats of Formation of FC(O)O and FC(O)OH
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Mol. Phys. 82, 831 (1994)
An ab initio calculation of the energetics for the FO + HCl -> HOF + Cl reaction
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Francisco, J.S.; Sander, S.P.;
Chem. Phys. Lett. 223, 439 (1994)
A computational evaluation of the structure and heat of formation for FOCI and Cl2O
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Theoretical Characterization of FOOCl: Implications for the Atmospheric Chemistry between FOOx and ClOx and ClOx Species
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Francisco, J.S.; Sander, S.P.; Lee, T.J.; Rendell, A.P.;
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Structures, Relative Stabilities, and Spectra of Isomers of HClO2
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Matti Maricq, M.; Szente, J.J.; Su, Y.; Francisco, J.S.;
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Ultraviolet spectroscopy of the .... states of FCO
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Dibble, T.S.; Francisco, J.S.;
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The Last Chapter on Chlorofluorocarbon Photooxidation Processes: Formation and Dissociation of FC(O)ONO
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An improved estimate of the heat of formation of HOOF
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Francisco, J.S.; Sander, S.P.;
J. Chem. Phys. 99, 6219 (1993)
Structure and thermochemistry of hydrochlorous acid, HOCI
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Francisco, J.S.; Sander, S.P.;
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Structure and thermochemistry of ClO2 radicals
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Zhao, Y.; Francisco, J.S.;
Mol. Phys. 79, 1 (1993)
Infrared photochemistry of FBrCO. An experimental and theoretical study.
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Zhao, Y.; Francisco, J.S.;
Mol. Phys. 77, 1187 (1992)
The vibrational spectrum of FBrCO. An experimental and theoretical study.
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Zhao, Y.; Francisco, J.S.;
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A Theoretical Study of the Spectroscopy and Dissociation Dynamics of HBrCO.
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Francisco, J.S.;
Chem. Phys. Lett. 218, 401-405 (1994)
Ab initio investigation of the decomposition of trifluoromethanol into carbonyl fluoride and hydrogen fluoride.
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Francisco, J.S.; Su, Y.;
Chem. Phys. Lett. 215, 58-62 (1993)
An ab initio study of the reaction between FO radicals and H2O
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Francisco, J.S.; Li, Z.; Bradley, A.; Knight, A.E.W.;
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Degradation of alternative halocarbons. Decomposition pathways of trifluoroethoxy radicals
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A Study of the Gas-Phase Reaction of Carbonyl Fluoride with Water.
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Gas-Phase Hydrolysis of Trifluoromethyl Carbonyl Halides to Trifluoroacetic Acid.
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Francisco, J.S.;
J. Chem. Phys. 96, 3348-3349 (1992)
The reaction of FO with HO2: An examination of the coupling of FOOx species with the HOx cycle
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Francisco, J.S.; Zhao, Y.; Lester, W.A.; Williams, I.H.;
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Theoretical studies of the structure and thermochemistry of FOsub 2 radical: Comparison of Moller-Plesset perturbation, complete-active-space self-consistent-field, and quadratic configuration interaction methods.
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Francisco, J.S.;
J. Chem. Phys. 96, 1167-1175 (1992)
A comprehensive theoretical examination of primary dissociation pathways of formic acid.
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Francisco, J.S.; Abersold, N.J.;
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An ab initio study of the structure, vibrational frequencies and intensities of the chloroformyl van der Waals radical.
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Rauk, A.; Tschuikow-Roux, E.; Chen, Y.; McGrath, M.P.; Radom, L.;
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The possible role of ClO3 isomers in relation to stratospheric ozone
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Chen, Y.; Tschuikow-Roux, E.;
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Mechanism of Hydrogen Abstraction Reactions by Free Radicals: Simple Metathesis or Involving Intermediate Complex?
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Chen, Y.; Rauk, A.; Tschuikow-Roux, E.;
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Structures, Barriers for Internal Rotation, Vibrational Frequencies, and Thermodynamic Functions of the sec-Butyl Radical: An ab Initio Study.
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Thermally-Induced and Electron-Induced Chemistry of CF3I on Ni(100)
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Bond Strength Trends in Halogenated Methanols: Evidence for Negative Hyperconjugation?
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Glukhovtsev, M.N.; Pross, A.; Radom, L.;
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Gas-Phase Identity SN2 Reactions of Halide Anions with Methyl Halides: A High-Level Computational Study
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Maayan, E.; Kreinin, O.; Veinger, D.; Thon, A.;
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The role of the substrate in photoenhanced metalorganic chemical vapor deposition
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Comparison of triethylaluminum, triethylgallium, triethylindium, and triethylantimony on GaAs(100)
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Measurement of adsorbed F atoms on a HF treated Si surface using infrared reflection absorption spectroscopy
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Hibi, Y.; Enomoto, Y.; Kikuchi, K.; Shikata, N.;
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Excimer laser assisted chemical machining of SiC ceramic
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Harris, S.J.; Shin, H.S.; Goodwin, D.G.;
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Diamond films from combustion of methyl acetylene and propadiene
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Pedraza, A.J.; Kumar, R.A.; Lowndes, D.H.;
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Greatly improved adhesion of gold films sputter-deposited on laser-treated and thermally annealed alumina
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Sanganeria, M.K.; Oezturk, M.C.; Violette, K.E.; Harris, G.;
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Low thermal budget in situ removal of oxygen and carbon on silicon for silicon epitaxy in an ultrahigh vacuum rapid thermal chemical vapor deposition reactor
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Von Keudell, A.; Jacob, W.; Fukarek, W.;
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Role of hydrogen ions in plasma-enhanced chemical vapor deposition of hydrocarbon films, investigated by in situ ellipsometry
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Zhu, W.; Sivazlian, F.R.; Stoner, B.R.; Glass, J.T.;
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Nucleation and selected area deposition of diamond by biased hot filament chemical vapor deposition
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Shin, H.; Collins, R.J.; De Guire, M.R.; Heuer, A.H.;
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Synthesis and characterization of TiO2 thin films on organic self-assembled monolayers: Part II. Film formation via an organometallic route
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Cabrera, A.L.; Morales, E.; Armor, J.N.;
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Kinetics of hydrogen desorption from palladium and ruthenium- palladium foils
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Gordon, M.S.; Pederson, L.A.; Bakhtiar, R.; Jacobson, D.B.;
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Ab Initio Orbital Investigation of the Unimolecular Decomposition of CH3SiH20+
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Knyazev, V.D.; Bencsura, A.; Dubinsky, I.A.; Gutman, D.;
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Kinetics and Thermochemistry of the Reaction of 1-Chloroethyl Radical with Molecular Oxygen
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Extended Gorin Model for Radical-Radical Recombination Reactions
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Fahr, A.; Laufer, A.H.;
J. Phys. Chem. 99, 262 (1995)
Deuterium Isotope Effect in Vinyl Radical Combination/Disproportionation Reactions
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Fu, Y.; Lewis- Bevan, W.; Tyrrell, J.;
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An ab Initio Investigation of the Reaction of Trifluoromethane with the Hydroxyl Radical
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Kaiser, E.W.;
J. Phys. Chem. 99, 707 (1995)
Temperature and Pressure Dependence of the C2H4 Yield from the Reaction C2H5 + O2
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Richardson, J.N.; Peck, S.R.; Curtin, L.S.; Tender, L.M.;
J. Phys. Chem. 99, 766 (1995)
Electron-Transfer Kinetics of Self-Assembled Ferrocene Octanethiol Monolayers on Gold and Silver Electrodes from 115 to 170 K
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Pogliani, L.;
J. Phys. Chem. 99, 925 (1995)
Molecular Modeling by Linear Combinations of Connectivity Indexes
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Wallington, T.J.; Schneider, W.F.; Szente, J.J.; Maricq, M.M.;
J. Phys. Chem. 99, 984 (1995)
Atmospheric Chemistry of FNO and FNO2: Reactions of FNO with O3, O(03P), HO2, and HCl and the Reaction of FNO2 with O3
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Santesson, L.; Wong, T.M.H.; Taborelli, M.; Descouts, P.;
J. Phys. Chem. 99, 1038 (1995)
Scanning Force Microscopy Characterization of Langmuir- Blodgett Films of Sulfur-Bearing Lipids on Mica and Gold
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Fu, Y.; Tyrrell, J.;
J. Phys. Chem. 99, 1909 (1995)
Ab Initio Investigation of the Structure, Vibrational Frequencies, and Intensities of HNnH, HNnF, and FNnF (n = 3, 4)
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Ley, L.; Masanet, J.; Caralp, F.; Lesclaux, R.;
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Kinetics of the Association Reactions of NO with the Series of Chlorofluoromethyl Radicals CFxCl3-x
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Moegelberg, T.E.; Nielsen, O.J.; Sehested, J.; Wallington, T.J.;
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Atmospheric Chemistry of HFC-272ca: Spectrokinetic Investigation of the CH3CF2CH2O2 Radical, Its Reactions with NO and NO2, and the Fate of the CH3CF2CH2O Radical
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Ho, P.; Melius, C.F.;
J. Phys. Chem. 99, 2166 (1995)
Theoretical Study of the Thermochemistry of Molecules in the Si-O-H-C System
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Knyazev, V.D.; Slagle, I.R.;
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Kinetics of the Reaction of Vinyl Radical with Molecular Oxygen
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Daele, V.; Laverdet, G.; Le Bras, G.; Poulet, G.;
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Kinetics of the Reactions CH3O + NO, CH3O + NO3, and CH3O2 + NO3
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Myli, K.B.; Grassian, V.H.;
J. Phys. Chem. 99, 1498 (1995)
Reaction of Trifluoromethyl Iodide on Ni(100)
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Balbuena, P.B.; Johnston, K.P.; Rossky, P.J.;
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Computer Simulation Study of an SN2 Reaction in Supercritical Water
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Peterlinz, K.A.; Sibener, S.J.;
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Absorption, Adsorption, and Desorption Studies of the Oxygen/Rh(111) System Using O2, NO, and NO2
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Cui, S.T.; Harris, J.G.;
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Solubility of Sodium Chloride in Supercritical Water: A Molecular Dynamics Study
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Zhang, X.Q.; Yang, W.Y.; You, X.Z.; Wei, Y.;
Appl. Surf. Sci. 84, 267 (1995)
Preparation and characterization of self-assembly organic multilayer films on silica surface
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Lee, S.-P.; Lin, M.C.;
Appl. Surf. Sci. 84, 31 (1995)
Laser-induced decomposition of dimethyl cadmium on a quartz substrate
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Kuzmichov, A.V.;
Appl. Surf. Sci. 86, 559 (1995)
Excimer laser-assisted etching of silicon in chlorine: adsorption and desorption
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Jiang, W.; Baumgaertner, H.; Eisele, I.;
Appl. Surf. Sci. 86, 564 (1995)
Excimer-laser-induced etching of silicon in chlorine atmosphere at a wavelength of 248 nm
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Skorobogatov, G.A.; Dymov, B.P.; Khripun, V.K.;
Kinet. Katal. 32, 252-259 (1991)
Determination of rate constants and equilibrium constants of RI = R + I and I + RI = I2 for R = CF3, C2F4, or C4F9
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Electrostatic model for the heats of formation and dipole moments of chlorine- and fluorine-substituted methanes
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Effects of substituents in chemical thermodynamics. Enthalpies of formation of substituted hydrocarbons.
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Calculation of enthalpies of formation by comparing partial quantities referred to bonds
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Appl. Phys. Lett. 51, 1634 (1987)
Characteristics of silicon-doped gallium arsenide epilayers grown by metalorganic chemical vapor deposition using a silane source
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Identification of infrared absorption peaks of amorphous silicon-carbon alloy by thermal annealing
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Silicon dioxide deposition at 100.degree.C using vacuum ultraviolet light
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Enhancement in activation efficiency for a silicon fluoride (SiF3)-implanted gallium arsenide layer by a new annealing method
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Formation of silicon carbide particles behind shock waves
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Production of disilane and silyl sticking coefficients during plasma-enhanced chemical vapor deposition of hydrogenated amorphous silicon
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Sticking coefficient of the silicon dihydride free radical on a hydrogenated silicon-carbon surface
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Laser photochemical deposition of germanium-silicon alloy thin films
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Possible contribution of silylene and silyl in the plasma-induced deposition of amorphous silicon from silane
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Real-time detection of higher hydrides on the growing surface of hydrogenated amorphous silicon by infrared reflection absorption spectroscopy
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High quality hydrogenated amorphous silicon films by windowless hydrogen discharge
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Jet spectroscopy of perylene complexes: comparisons of TMS, carbon dioxide, ethylene and butadiene
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Chem. Phys. 113, 417 (1987)
On the reaction silicon(1+) (2P) + molecular hydrogen (X1.SIGMA.g+) .fwdarw. silicon monohydride(1+) + atomic hydrogen. I. An ab initio potential ener
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Chem. Phys. 116, 351 (1987)
Ab initio configuration interaction study of the structure and magnetic properties of radicals and radical ions derived from group 13-15 trihydrides
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Chem. Phys. 117, 385 (1987)
Electron correlations in molecules. III. Strength of electron correlations in localized and aromatic bonds or main-group atoms
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Kalcher, J.;
Chem. Phys. 118, 273 (1987)
Ab initio and pseudopotential investigations on the silicon hydride (SiHn) (n = 1-3) radicals and their anions
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Perrin, J.; Allain, B.;
Chem. Phys. 123, 295 (1988)
Quenching of excited mercury atoms (63P1 and 63P0) in collisions with silane, silane-d4, disilane, and germane
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Chem. Phys. 124, 29 (1988)
Structural and vibrational properties of neopentane and tetramethylsilane using ab initio MO calculations
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Chem. Phys. 140, 133 (1990)
Absolute oscillator strengths for photoabsorption, photoionization and ionic photofragmentation of silane. I. The valence shell
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Cooper, G.; Ibuki, T.; Brion, C.E.;
Chem. Phys. 140, 147 (1990)
Absolute oscillator strengths for photoabsorption, photoionization and ionic photofragmentation of silane. II. The Si 2p and 2s inner shells
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Cooper, G.; Ibuki, T.; Brion, C.E.;
Chem. Phys. 144, 436 (1990)
Absolute oscillator strengths for photoabsorption, photoionization and ionic photofragmentation of silane. II. The Si 2p and 2s inner shells (Erratu
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Jahn-Teller distortions in silane, germane, and stannane (XH4+) radical cations (X = Si, Ge, Sn). An ab initio CI study
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Chem. Phys. Lett. 132, 294 (1986)
Potential triplet silylenes
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Kinetics of the reactions of chlorosilylene with silane and dichlorosilane
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Kalcher, J.; Sax, A.F.;
Chem. Phys. Lett. 133, 135 (1987)
The electronic structure of the disilavinylidene anion
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Moc, J.; Latajka, Z.; Ratajczak, H.;
Chem. Phys. Lett. 136, 122 (1987)
A theoretical study of the trichlorosilyl (SiCl3) and trichlorogermyl (GeCl3) radicals
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Johnson, R.D.,III; Hudgens, J.W.;
Chem. Phys. Lett. 141, 163 (1987)
A new electronic spectrum of the silyl (SiH3) radical observed using multiphoton ionization spectroscopy
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Gordon, M.S.; Truong, T.N.;
Chem. Phys. Lett. 142, 110 (1987)
Potential primary pyrolysis processes of methylsilane
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Yates, B.F.; Clabo, D.A.Jr.; Schaefer, H.F.,III;
Chem. Phys. Lett. 143, 421 (1988)
Cyclic isomers of singlet silicon hydride (Si4H4) related to tetrasilacyclobutadiene
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Chem. Phys. Lett. 144, 362 (1988)
The structure of mercaptosilyliumylidene (HSSi+) as determined by fourth-order many-body perturbation theory
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Theoretical enthalpies of formation of silicon hydride molecules and ions (SiHn and SiHn+ (n = 1-4))
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Gordon, M.S.;
Chem. Phys. Lett. 146, 148 (1988)
The electronic and molecular structure of silyl nitrene
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Slagle, I.R.; Bernhardt, J.R.; Gutman, D.;
Chem. Phys. Lett. 149, 180 (1988)
Kinetics of the reactions of silyl with oxygen and nitrous oxide
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Kalcher, J.; Sax, A.F.;
Chem. Phys. Lett. 150, 99 (1988)
Electron affinities of the carbon and silicon hydride XYH3 systems (X, Y = carbon, silicon)
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Akiyama, Y.; Tanaka, K.; Tanaka, T.;
Chem. Phys. Lett. 155, 15 (1989)
Infrared diode laser spectroscopy of the fluorosilyliumylidene (SiF+) ion
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Yates, B.F.; Schaefer, H.F.,III;
Chem. Phys. Lett. 155, 563 (1989)
Tetrasilacyclobutadiylidene: the lowest energy cyclic isomer of singlet tetrasilicon tetrahydride (Si4H4)?
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Chem. Phys. Lett. 158, 351 (1989)
Spectroscopy of jet-cooled phenylsilanes: the influence of hyperconjugation
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Chem. Phys. Lett. 162, 467 (1989)
Electronic quenching and chemical reactions of silylidyne (SiH) radicals in the gas phase
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Gordon, M.S.; Davis, L.P.; Burggraf, L.W.;
Chem. Phys. Lett. 163, 371 (1989)
The structure and stability of neutral pentacoordinated silicon compounds
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van de Weijer, P.; Zwerver, B.H.;
Chem. Phys. Lett. 163, 48 (1989)
Laser-induced fluorescence of OH and SiO molecules during thermal chemical vapour deposition of SiO2 from silane-oxygen mixtures
need
need

Watts, J.D.; Trucks, G.W.; Bartlett, R.J.;
Chem. Phys. Lett. 164, 502 (1989)
Coupled-cluster, unitary coupled-cluster, and MBPT(4) open-shell analytical gradient methods
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need

Tsuji, M.; Kobarai, K.; Yamaguchi, S.; Obase, H.; Nishimura, Y.;
Chem. Phys. Lett. 166, 485 (1990)
Dissociative excitation of silane by collisions with krypton active species
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need

Hiratsuka, H.; Masatomi, T.; Tonokura, K.; Shizuka, H.;
Chem. Phys. Lett. 169, 317 (1990)
Fluorescence of the phenyldimethylsilyl radical in 3-methylpentane at 77 K
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need

Philis, J.G.;
Chem. Phys. Lett. 169, 460 (1990)
Spectroscopy of jet-cooled phenylsilane
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need

Sekiya, H.; Nishimura, Y.;
Chem. Phys. Lett. 171, 291 (1990)
Laser-induced fluorescence study of the reactions of argon(3P2,0) with methane, halomethanes (CH3X; X = Cl, Br, I), ethane, silane, and disilane
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need

Tada, T.;
Chem. Phys. Lett. 173, 15 (1990)
Ab initio MO studies on disilane radical anion
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need

Koshi, M.; Tamura, F.; Matsui, H.;
Chem. Phys. Lett. 173, 235 (1990)
Rate constants for the reactions of hydrogen atoms with fluorosilanes (SiHnF4-n (n = 4, 3, 2))
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need

Schmidt, M.W.; Truong, P.N.; Gordon, M.S.;
J. Am. Chem. Soc. 109, 5217 (1987)
.pi.-Bond strengths in the second and third periods
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need

Harada, T.; Hayashiya, T.; Wada, I.; Iwaake, N.; Oku, A.;
J. Am. Chem. Soc. 109, 527 (1987)
Enantioselective functionalization of prochiral diols via chiral spiroketals: preparation of optically pure 2-substituted 1,3-propanediol derivatives
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need

Gordon, M.S.; Bartol, D.;
J. Am. Chem. Soc. 109, 5948 (1987)
Molecular and electronic structure of Si3H6
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need

Mochida, K.; Wakasa, M.; Sakaguchi, Y.; Hayashi, H.;
J. Am. Chem. Soc. 109, 7942 (1987)
Laser photolysis and CIDEP studies of the formation of phenyl-substituted Group IVA element (silicon, germanium, and tin)-centered radicals in direct
need
need

Lammertsma, K.; Guner, O.F.;
J. Am. Chem. Soc. 110, 5239 (1988)
Structures and energies of disilicon dicarbide, C2Si2
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need

Grev, R.S.; Scuseria, G.E.; Scheiner, A.C.; Schaefer, H.F.,III; Gordon, M.S.;
J. Am. Chem. Soc. 110, 7337 (1988)
Relative energies of silaethylene and methylsilylene
need
need

Luo, Y.R.; Benson, S.W.;
J. Am. Chem. Soc. 111, 2480 (1989)
A new electronegativity scale for the correlation of heats of formation. 2. The differences in heats of formation between hydrogen and methyl deriva
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Negishi, E.; Akiyoshi, K.; O'Connor, B.; Takagi, K.; Wu, G.;
J. Am. Chem. Soc. 111, 3089 (1989)
Migratory insertion reactions of organometallics. 3. Carbon-carbon bond forming reactions of organotransition metals with .alpha.- or .gamma.-haloor
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need

Gordon, M.S.; Volk, D.E.; Gano, D.R.;
J. Am. Chem. Soc. 111, 9273 (1989)
Substituent effects on the gas-phase acidity of silane
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need

Aita, C.R.; Tran, N.C.;
J. Appl. Phys. 56, 958 (1984)

need
need

Chu, T.L.; Chu, S.S.; Ang, S.T.; Duong, A.; Han, Y.X.; Liu, Y.H.;
J. Appl. Phys. 60, 4268 (1986)
Hydrogenated amorphous silicon films deposited in a helium atmosphere
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need

Wu, J.J.; Flagan, R.C.;
J. Appl. Phys. 61, 1365 (1987)
Onset of runaway nucleation in aerosol reactors
need
need

Hata, N.; Matsuda, A.; Tanaka, K.;
J. Appl. Phys. 61, 3055 (1987)
Spectroscopic diagnostics of plasma-chemical-vapor deposition from silane and germane
need
need

Meyerson, B.S.; Jasinski, J.M.;
J. Appl. Phys. 61, 785 (1987)
Silane pyrolysis rates for the modeling of chemical vapor deposition
need
need

Kushner, M.J.;
J. Appl. Phys. 62, 2803 (1987)
On the balance between silylene and silyl radicals in rf glow discharges in silane: the effect on deposition rates of amorphous hydrogenated silicon
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need

Gallagher, A.;
J. Appl. Phys. 63, 2406 (1988)
Neutral radical deposition from silane discharges
need
need

Kushner, M.J.;
J. Appl. Phys. 63, 2532 (1988)
A model for the discharge kinetics and plasma chemistry during plasma enhanced chemical vapor deposition of amorphous silicon
need
need

Buss, R.J.; Ho, P.; Breiland, W.G.; Coltrin, M.E.;
J. Appl. Phys. 63, 2808 (1988)
Reactive sticking coefficients for silane and disilane on polycrystalline silicon
need
need

McCurdy, R.J.; Gordon, R.G.;
J. Appl. Phys. 63, 4669 (1988)
Compensating impurities as the limiting factor in atmospheric pressure chemical vapor deposition of amorphous hydrogenated silicon from magnesium sili
need
need

Ho, P.; Breiland, W.G.;
J. Appl. Phys. 63, 5184 (1988)
Observation of gas-phase silicon atoms in the chemical vapor deposition of silicon from dichlorosilane
need
need

Inoue, K.; Nakatani, Y.; Okuyama, M.; Hamakawa, Y.;
J. Appl. Phys. 64, 6496 (1988)
Growth of silica thin film by double-excitation photoinduced chemical vapor deposition incorporated with microwave excitation of oxygen
need
need

McCaughey, M.J.; Kushner, M.J.;
J. Appl. Phys. 65, 186 (1989)
Simulation of the bulk and surface properties of amorphous hydrogenated silicon deposited from silane plasmas
need
need

Sato, K.; Kojima, K.; Kawasaki, M.; Matsuzaki, Y.; Hirano, T.; Nakano, M.; Koinuma, H.;
J. Appl. Phys. 65, 2145 (1989)
A quantum chemical study on hydrogen radical reactions with methane and silane
need
need

Meikle, S.; Suzuki, Y.; Hatanaka, Y.;
J. Appl. Phys. 67, 1048 (1990)
The role of hydrogen dilution in deposition of amorphous hydrogenated silicon carbide from silane/ethylene mixtures
need
need

Giunta, C.J.; McCurdy, R.J.; Chapple-Sokol, J.D.; Gordon, R.G.;
J. Appl. Phys. 67, 1062 (1990)
Gas-phase kinetics in the atmospheric pressure chemical vapor deposition of silicon from silane and disilane
need
need

Anderson, H.M.; Jairath, R.; Mock, J.L.;
J. Appl. Phys. 67, 3999 (1990)
Particulate generation in silane/ammonia rf discharges
need
need

Suzuki, T.; Hirota, E.;
J. Chem. Phys. 85, 5541 (1986)
Magnetic interactions in fluoromethylene (HCF) and fluorosilylene (HSiF) studied by sub-Doppler spectroscopy
need
need

Ohwada, K.;
J. Chem. Phys. 85, 5882 (1986)
Energetic consideration of the vibrational potential function in the effective nuclear charge model. VI
need
need

Suto, M.; Wang, X.; Lee, L.C.; Chuang, T.J.;
J. Chem. Phys. 86, 1152 (1987)
Quantitative study on the photoexcitation process of tetrafluorosilane at 49-120 nm
need
need

Miller, J.D.; Ishida, H.;
J. Chem. Phys. 86, 1593 (1987)
Quantitative analysis of covalent bonding between substituted silanes and inorganic surfaces
need
need

Bauschlicher, C.W.,Jr.; Taylor, P.R.;
J. Chem. Phys. 86, 2844 (1987)
Full CI benchmark calculations for several states of the same symmetry
need
need

Jasinski, J.M.;
J. Chem. Phys. 86, 3057 (1987)
Comment on silane pyrolysis and the insertion of silylene into molecular hydrogen
need
need

Raff, L.M.; Thompson, D.L.;
J. Chem. Phys. 86, 3058 (1987)
Reply to the Comment on silane pyrolysis and the insertion of silylene into molecular hydrogen
need
need

Robertson, R.M.; Gallagher, A.;
J. Chem. Phys. 86, 3059 (1987)
Reply to the Comment on silane pyrolysis and the insertion of silylene into molecular hydrogen
need
need

Davis, S.R.; Andrews, L.;
J. Chem. Phys. 86, 3765 (1987)
Infrared spectra of hydrogen fluoride complexes with methane, silane, and germane
need
need

Yamaguchi, S.; Tsuji, M.; Obase, H.; Sekiya, H.; Nishimura, Y.;
J. Chem. Phys. 86, 4952 (1987)
The silyliumylidene(SiH+) (A 1.PI.-X 1.SIGMA.+) emission produced from the thermal energy reaction of helium ion(1+) with silane under single collisio
need
need

Halonen, L.;
J. Chem. Phys. 86, 588 (1987)
Rotational energy level structure of stretching vibrational states in some small symmetrical molecules
need
need

Schneider, W.; Thiel, W.;
J. Chem. Phys. 86, 923 (1987)
Ab initio calculation of harmonic force fields and vibrational spectra for the methyl, silyl, germyl, and stannyl halides
need
need

Marsden, C.J.;
J. Chem. Phys. 87, 6626 (1987)
The harmonic force field for pentafluorophosphorane (PF5) from ab initio calculations and experimental data. Comparisons with tetrafluorosilane, phosp
need
need

Jasinski, J.M.; Chu, J.O.;
J. Chem. Phys. 88, 1678 (1988)
Absolute rate constants for the reaction of silylene with hydrogen, silane, and disilane
need
need

Raghavachari, K.;
J. Chem. Phys. 88, 1688 (1988)
Sequential clustering reactions of silicon(1+) with silane: a theoretical study of the reaction mechanisms
need
need

Shepherd, R.A.; Graham, W.R.M.;
J. Chem. Phys. 88, 3399 (1988)
Some implications from matrix studies for the structure and vibrational assignments of 1,2-ethynediylsilylidyne (SiC2)
need
need

Dillon, M.A.; Spence, D.; Boesten, L.; Tanaka, H.;
J. Chem. Phys. 88, 4320 (1988)
Electron energy loss spectroscopy of disilane
need
need

Davies, P.B.; Martineau, P.M.;
J. Chem. Phys. 88, 485 (1988)
Detection of the fundamental band of silyliumylidene (SiH+) (X1.SIGMA.+) in a silane plasma by diode laser spectroscopy
need
need

Agrawal, P.M.; Thompson, D.L.; Raff, L.M.;
J. Chem. Phys. 88, 5948 (1988)
Computational studies of silylene + silylene (SiH2 + SiH2) recombination reaction dynamics on a global potential surface fitted to ab initio and exper
need
need

Hayes, T.R.; Wetzel, R.C.; Baiocchi, F.A.; Freund, R.S.;
J. Chem. Phys. 88, 823 (1988)
Absolute cross sections for electron-impact ionization and dissociative ionization of the fluorosilylidyne (SiF) free radical
need
need

Hayes, T.R.; Shul, R.J.; Baiocchi, F.A.; Wetzel, R.C.; Freund, R.S.;
J. Chem. Phys. 89, 4035 (1988)
Electron-impact ionization cross sections of the trifluorosilyl (SiF3) free radical
need
need

Shul, R.J.; Hayes, T.R.; Wetzel, R.C.; Baiocchi, F.A.; Freund, R.S.;
J. Chem. Phys. 89, 4042 (1988)
Electron-impact ionization cross sections of difluorosilylene (SiF2)
need
need

Frey, R.F.; Davidson, E.R.;
J. Chem. Phys. 89, 4227 (1988)
The Jahn-Teller distortion in silane radical ion(1+) (SiH4+)
need
need

Laaksonen, L.; Muller-Plathe, F.; Diercksen, G.H.F.;
J. Chem. Phys. 89, 4903 (1988)
Fully numerical restricted Hartree-Fock calculations on open-shell hydrides: on the basis-set truncation error
need
need

Peterson, K.A.; Woods, R.C.;
J. Chem. Phys. 89, 4929 (1988)
Predictions of the rotational and vibrational spectra of fluorosilyliumylidene, oxophosphorus(1+), and nitrogen sulfide ion(1+) (SiF+, PO+, and NS+) b
need
need

Agrawal, P.M.; Thompson, D.L.; Raff, L.M.;
J. Chem. Phys. 89, 741 (1988)
Trajectory studies of unimolecular reactions of disilene and silylene on a global potential surface fitted to ab initio and experimental data
need
need

Hamilton, T.P.; Schaefer, H.F.,III;
J. Chem. Phys. 90, 1031 (1989)
Silaketene: a product of the reaction between silylene and carbon monoxide?
need
need

Suto, M.; Han, J.C.; Lee, L.C.; Chuang, T.J.;
J. Chem. Phys. 90, 2834 (1989)
Emission spectra of trifluorosilyl (SiF3)
need
need

Jezercak, M.; Agrawal, P.M.; Thompson, D.L.; Raff, L.M.;
J. Chem. Phys. 90, 3363 (1989)
A perturbation-trajectory method for the study of gas-surface collision dynamics
need
need

Hetzler, J.; Millot, G.; Steinfeld, J.I.;
J. Chem. Phys. 90, 5434 (1989)
Rotationally mediated vibration-vibration and vibration-translation energy transfer in silane
need
need

Tanimoto, M.; Takeo, H.; Matsumura, C.; Fujitake, M.; Hirota, E.;
J. Chem. Phys. 91, 2102 (1989)
Microwave spectroscopic detection of dichlorosilylene SiCl2 in the ground state
need
need

Ho, P.; Breiland, W.G.; Buss, R.J.;
J. Chem. Phys. 91, 2627 (1989)
Laser studies of the reactivity of silylidyne (SiH) with the surface of a depositing film
need
need

Johnson, R.D.,III; Tsai, B.P.; Hudgens, J.W.;
J. Chem. Phys. 91, 3340 (1989)
Multiphoton ionization of silyl and silyl-d3 radicals: electronic spectra, vibrational analyses of the ground and Rydberg states, and ionization poten
need
need

Knight, L.B.Jr.; Winiski, M.; Kudelko, P.; Arrington, C.A.;
J. Chem. Phys. 91, 3368 (1989)
The generation and trapping of silyliumyl (28SiH2+ and 29SiH2+) in neon matrixes at 4 K: electron spin resonance and theoretical investigations
need
need

Yamada, C.; Kanamori, H.; Hirota, E.; Nishiwaki, N.; Itabashi, N.; Kato, K.; Goto, T.;
J. Chem. Phys. 91, 4582 (1989)
Detection of the silylene .nu.2 band by infrared diode laser kinetic spectroscopy
need
need

Agrawal, P.M.; Thompson, D.L.; Raff, L.M.;
J. Chem. Phys. 91, 5021 (1989)
Computational studies of heterogeneous reactions of silylene (SiH2) on reconstructed silicon (111) (7.times.7) and (111) (1.times.1)) surfaces
need
need

Wan, H.X.; Moore, J.H.; Tossell, J.A.;
J. Chem. Phys. 91, 7340 (1989)
Electron scattering cross sections and negative ion states of silane and halide derivatives of silane
need
need

Agrawal, P.M.; Thompson, D.L.; Raff, L.M.;
J. Chem. Phys. 92, 1069 (1990)
Unimolecular dissociation dynamics of disilane
need
need

Raghavachari, K.;
J. Chem. Phys. 92, 452 (1990)
Theoretical studies of clustering reactions. Sequential reactions of silylium (SiH3+) with silane
need
need

Ignacio, E.W.; Schlegel, H.B.;
J. Chem. Phys. 92, 5404 (1990)
Heats of formation of silicon hydrides and fluorides (SiHmFn) calculated by ab initio molecular orbital methods
need
need

Beck, K.M.; Gordon, R.J.;
J. Chem. Phys. 92, 6011 (1990)
Vibrational relaxation of highly excited tetrafluorosilane and pentafluorobenzene by argon
need
need

Langlois, J.M.; Muller, R.P.; Coley, T.R.; Goddard, W.A.,III; Ringnalda, M.N.;
J. Chem. Phys. 92, 7488 (1990)
Pseudospectral generalized valence-bond calculations: application to methylene, ethylene, and silylene
need
need

Nolte, H.J.; Jug, K.;
J. Chem. Phys. 93, 2584 (1990)
Comparison of size effects in aluminum and silicon clusters
need
need

Fisher, E.R.; Armentrout, P.B.;
J. Chem. Phys. 93, 4858 (1990)
Kinetic energy dependence of dissociative charge-transfer reactions of helium(1+), neon(1+), argon(1+), krypton(1+), and xenon(1+) with silane
need
need

Green, W.H.; Jayatilaka, D.; Willetts, A.; Amos, R.D.; Handy, N.C.;
J. Chem. Phys. 93, 4965 (1990)
The prediction of spectroscopic properties from quartic correlated force fields: fluoroethyne, formyl fluoride, silylium (HCCF, HFCO, SiH3+)
need
need

Ray, U.; Jarrold, M.F.;
J. Chem. Phys. 93, 5709 (1990)
Interaction of silicon cluster ions with ammonia: the kinetics
need
need

Kay, R.D.; Raff, L.M.; Thompson, D.L.;
J. Chem. Phys. 93, 6607 (1990)
Trajectory study of silicon tetramer formation and decay and of exchange and abstraction reactions in silicon atom + silicon trimer collisions
need
need

Moffat, H.K.; Kuech, T.F.; Jensen, K.F.; Wang, P.J.;
J. Crystal Growth 93, 594 (1988)
Gas phase and surface reactions in silicon doping of gallium arsenide by silanes
need
need

Sawada, K.; Ishida, M.; Hayama, K.; Nakamura, T.; Suzaki, T.;
J. Crystal Growth 97, 587 (1989)
Low-temperature heteroepitaxial growth of silicon on sapphire by disilane gas-source molecular beam epitaxy
need
need

Roenigk, K.F.; Jensen, K.F.;
J. Electrochem. Soc. 134, 1777 (1987)
Low pressure CVD of silicon nitride
need
need

Yeckel, A.; Middleman, S.; Hochberg, A.K.;
J. Electrochem. Soc. 136, 2038 (1989)
The origin of nonuniform growth of LPCVD films from silane gas mixtures
need
need

Chapple-Sokol, J.D.; Giunta, C.J.; Gordon, R.G.;
J. Electrochem. Soc. 136, 2993 (1989)
A kinetics study of the atmospheric pressure CVD reaction of silane and nitrous oxide
need
need

Rastani, S.; Reisman, A.;
J. Electrochem. Soc. 137, 1288 (1990)
Low pressure chemical vapor deposition of thin film germanium dioxide-silica glasses
need
need

Nishizawa, J.; Aoki, K.; Suzuki, S.; Kikuchi, K.;
J. Electrochem. Soc. 137, 1898 (1990)
Silicon molecular layer epitaxy
need
need

Breiland, W.G.; Coltrin, M.E.;
J. Electrochem. Soc. 137, 2313 (1990)
Silicon deposition rates in a two-dimensional CVD reactor and comparisons with model calculations
need
need

Giunta, C.J.; Chapple-Sokol, J.D.; Gordon, R.G.;
J. Electrochem. Soc. 137, 3237 (1990)
Kinetic modeling of the chemical vapor deposition of silicon dioxide from silane or disilane and nitrous oxide
need
need

Smith, D.L.; Alimonda, A.S.; Chen, C.C.; Ready, S.E.; Wacker, B.;
J. Electrochem. Soc. 137, 614 (1990)
Mechanism of silicon nitride hydride (SiNxHy) deposition from ammonia-silane plasma
need
need

Carpenter, J.H.; Smith, J.G.;
J. Mol. Spectrosc. 121, 270 (1987)
Analysis of the quadrupole coupling in the millimeter-wave spectrum of trichlorosilane
need
need

Nakagawa, J.; Shiki, Y.; Hayashi, M.;
J. Mol. Spectrosc. 122, 1 (1987)
Microwave spectrum, structure, dipole moment, and internal rotation of methylsilylsulfide
need
need

Koseki, S.; Gordon, M.S.;
J. Mol. Spectrosc. 123, 392 (1987)
Potential energy surfaces and dynamical properties of three low-lying states of silylene
need
need

Buerger, H.; Schulz, P.;
J. Mol. Spectrosc. 125, 140 (1987)
The high-resolution Fourier transform infrared spectrum of fluorosilane near 2200 cm-1: rovibrational analysis of the fundamentals .nu.1 and .nu.4 an
need
need

Cox, A.P.; Ewart, I.C.; Gayton, T.R.;
J. Mol. Spectrosc. 125, 76 (1987)
Microwave spectrum, structure, quadrupole coupling constants, and dipole moment of bromotrifluorosilane
need
need

Balfour, W.J.; Chandrasekhar, K.S.; Morrison, A.E.;
J. Mol. Spectrosc. 126, 341 (1987)
The vapor-phase ultraviolet absorption spectrum of phenylsilane and phenylsilane-.alpha.d3
need
need

Smith, J.G.;
J. Mol. Spectrosc. 128, 288 (1988)
The millimeter-wave spectrum of trifluoromethylsilane
need
need

Frye, J.M.; Schupita, W.; Magerl, G.;
J. Mol. Spectrosc. 128, 427 (1988)
Sub-Doppler infrared laser spectroscopy of iodosilane: determination of eqQ in the v5 = 1 state
need
need

Hayashi, M.; Nakata, N.; Miyazaki, S.;
J. Mol. Spectrosc. 135, 270 (1989)
Reinvestigation of molecular structures of dimethyl silane and dimethyl sulfide
need
need

Hayashi, M.; Fujitake, M.; Kishioka, K.;
J. Mol. Spectrosc. 135, 305 (1989)
Microwave spectrum, structure, and nuclear quadrupole coupling constant tensor of methyl iodosilane
need
need

Smith, J.G.;
J. Mol. Spectrosc. 136, 109 (1989)
The millimeter-wave spectrum of methyltrichlorosilane
need
need

Harada, K.; Nagano, I.; Kimura, S.; Tanaka, K.; Tanaka, T.;
J. Mol. Spectrosc. 138, 230 (1989)
Carbon dioxide laser Stark spectroscopy of the .nu.4 band of trifluorosilane-d: the C0 rotational constant and vibrationally induced dipole moment
need
need

Koga, Y.; Serino, R.M.; Chen, R.; Keehn, P.M.;
J. Phys. Chem. 91, 298 (1987)
Single pulse laser induced reactions of hexafluorobenzene/silane mixtures at 1027 and 944 cm-1
need
need

Ahmed, M.K.; Henry, B.R.;
J. Phys. Chem. 91, 3741 (1987)
Uncoupled methyl carbon-hydrogen oscillators: a local-mode analysis of the overtone spectra of 2-chloro-2-methylpropane and chlorotrimethylsilane
need
need

Wu, C.H.;
J. Phys. Chem. 91, 5054 (1987)
A mass spectrometric study of mercury-photosensitized reactions of monosilane and ammonia mixtures: observation of silylated amines
need
need

Chu, J.O.; Beach, D.B.; Jasinski, J.M.;
J. Phys. Chem. 91, 5340 (1987)
Absolute rate constants for silylene reactions with hydrocarbons at 298 K
need
need

Roenigk, K.F.; Jensen, K.F.; Carr, R.W.;
J. Phys. Chem. 91, 5732 (1987)
Rice-Ramsperger-Kassel-Marcus theoretical prediction of high-pressure Arrhenius parameters by nonlinear regression: application to silane and disilan
need
need

Becerra, R.; Walsh, R.;
J. Phys. Chem. 91, 5765 (1987)
Mechanism of formation of tri- and tetrasilane in the reaction of atomic hydrogen with monosilane and the thermochemistry of the disilene isomers
need
need

Nelson, J.T.; Pietro, W.J.;
J. Phys. Chem. 92, 1365 (1988)
Mechanism of extensive electron delocalization in linear polysilanes
need
need

Julian, M.M.; Gibbs, G.V.;
J. Phys. Chem. 92, 1444 (1988)
Modeling the configuration about the nitrogen atom in methyl- and silyl-substituted amines
need
need

Park, C.R.; White, G.D.; Wiesenfeld, J.R.;
J. Phys. Chem. 92, 152 (1988)
Dynamics of hydroxyl production in the reaction of atomic oxygen(3PJ) with silane
need
need

Bock, C.W.; Trachtman, M.; Mains, G.J.;
J. Phys. Chem. 92, 294 (1988)
Ab initio study of fluorinated silylboranes. 2
need
need

Koseki, S.; Gordon, M.S.;
J. Phys. Chem. 92, 364 (1988)
Theoretical study of the lowest triplet potential energy surface of silasilene
need
need

Johnson, R.D.,III; Fang, E.; Hudgens, J.W.;
J. Phys. Chem. 92, 3880 (1988)
Resonance-enhanced multiphoton ionization spectra of the chlorosilylidyne radical between 430 and 520 nm
need
need

Roenigk, K.F.; Jensen, K.F.; Carr, R.W.;
J. Phys. Chem. 92, 4254 (1988)
Rice-Ramsperger-Kassel-Marcus theoretical prediction of high-pressure Arrhenius parameters by nonlinear regression: application to silane and disilan
need
need

Spears, K.G.; Kampf, R.P.; Robinson, T.J.;
J. Phys. Chem. 92, 5297 (1988)
Particle densities in radio-frequency discharges of silane
need
need

O'Brien, J.J.; Atkinson, G.H.;
J. Phys. Chem. 92, 5782 (1988)
Role of silylene in the pyrolysis of silane and organosilanes
need
need

Withnall, R.; Andrews, L.;
J. Phys. Chem. 92, 594 (1988)
Matrix reactions of methylsilanes and oxygen atoms
need
need

Dixon, D.A.;
J. Phys. Chem. 92, 86 (1988)
Calculated geometries, vibrational spectra, energetics and electronic properties of fluorinated methanes and silanes
need
need

Koseki, S.; Gordon, M.S.;
J. Phys. Chem. 93, 118 (1989)
Intrinsic reaction coordinate calculations for very flat potential energy surfaces: application to singlet disilenylidene isomerization
need
need

Davis, S.R.; Andrews, L.;
J. Phys. Chem. 93, 1273 (1989)
Infrared spectra and ab initio calculations of disilane and methylsilane complexes with hydrogen fluoride in solid argon
need
need

Park, C.R.; Wiesenfeld, J.R.;
J. Phys. Chem. 93, 1365 (1989)
Steric constraints on energy deposition in the hydroxyl product of the reaction of atomic oxygen(3PJ) with trimethylsilane
need
need

Gordon, M.S.; Boatz, J.A.; Walsh, R.;
J. Phys. Chem. 93, 1584 (1989)
Heats of formation of alkylsilanes
need
need

Mains, G.J.; Bock, C.W.; Trachtman, M.;
J. Phys. Chem. 93, 1745 (1989)
Theoretical structures for boron-silicon hydrides
need
need

Sakai, S.; Deisz, J.; Gordon, M.S.;
J. Phys. Chem. 93, 1888 (1989)
Theoretical studies of the insertion reactions of atomic carbon and silicon into methane and silane
need
need

Boatz, J.A.; Gordon, M.S.;
J. Phys. Chem. 93, 3025 (1989)
Theoretical studies of three-membered ring compounds Y2H4X (Y = C, Si; X = CH2, NH, O, SiH2, PH, S)
need
need

Luo, Y.R.; Benson, S.W.;
J. Phys. Chem. 93, 3791 (1989)
A new electronegativity scale for the correlation of heats of formation. 7. Alkylsilane derivatives: group additivity and bond dissociation energy
need
need

Luo, Y.R.; Benson, S.W.;
J. Phys. Chem. 93, 4643 (1989)
New electronegativity scale for the correlation of heats of formation and bond dissociation energies. 6. Alkyl silane derivatives
need
need

Johnson, R.D.,III; Hudgens, J.W.;
J. Phys. Chem. 93, 6268 (1989)
New electronic state of silylidyne and silylidyne-d radicals observed by resonance-enhance multiphoton ionization spectroscopy
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need

Sudhakar, P.V.; Guner, O.F.; Lammertsma, K.;
J. Phys. Chem. 93, 7289 (1989)
Bond stretch isomerism in rhombic silicon carbide (C2Si2)
need
need

Gordon, M.S.; Nguyen, K.A.; Truhlar, D.G.;
J. Phys. Chem. 93, 7356 (1989)
Parameters for scaling the correlation energy of the bonds silicon-hydrogen, phosphorus-hydrogen- sulfur-hydrogen, and chlorine-hydrogen and applicati
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need

Blitz, M.A.; Frey, H.M.; Tabbutt, F.D.; Walsh, R.;
J. Phys. Chem. 94, 3294 (1990)
Time-resolved studies of the temperature dependence of gas-phase insertion reactions of phenylsilylene with silicon-hydrogen bonds
need
need

Koseki, S.; Gordon, M.S.;
J. Phys. Chem. 94, 3427 (1990)
Calculated oscillator strengths between vibrational levels of the rotational and trans-bending modes in the ground and lowest excited states of disile
need
need

Boatz, J.A.; Gordon, M.S.;
J. Phys. Chem. 94, 3874 (1990)
Predicted enthalpies of formation for methyl-substituted disilanes
need
need

Ho, P.; Melius, C.F.;
J. Phys. Chem. 94, 5120 (1990)
Theoretical study of the thermochemistry of fluorosilanes (SiFn and SiHnFm) compounds and hexafluorodisilane
need
need

Mains, G.J.; Bock, C.W.; Trachtman, M.;
J. Phys. Chem. 94, 5449 (1990)
Theoretical structures for boron-silicon fluorohydrides
need
need

Cropek, D.M.; Bohn, P.W.;
J. Phys. Chem. 94, 6452 (1990)
Surface molecular orientations determined by electronic linear dichroism in optical waveguide structures
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need

Shin, S.K.; Goddard, W.A.,III; Beauchamp, J.L.;
J. Phys. Chem. 94, 6963 (1990)
Singlet-triplet energy gaps in chlorine-substituted methylenes and silylenes
need
need

Boatz, J.A.; Gordon, M.S.;
J. Phys. Chem. 94, 7331 (1990)
Predicted enthalpies of formation for silaethylene, disilene, and their silylene isomers
need
need

Ignacio, E.W.; Schlegel, H.B.;
J. Phys. Chem. 94, 7439 (1990)
An ab initio study of the structures and heats of formation of fluorosilanes cations (SiHmFn+, m + n = 1-4)
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need

Gross, M.E.; Kranz, K.S.; Brasen, D.; Luftman, H.;
J. Vac. Sci. Technol. 6, 1548 (1988)
Organometallic chemical vapor deposition of cobalt and formation of cobalt disilicide
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need

Wu, T.H.T.; Rosler, R.S.; Lamartine, B.C.; Gregory, R.B.; Tompkins, H.G.;
J. Vac. Sci. Technol. 6, 1707 (1988)
Properties of tungsten silicide (WSix) using dichlorosilane in a single-wafer system
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need

Granger, D.D.; Miller, L.J.; Lewis, M.M.;
J. Vac. Sci. Technol. 6, 370 (1988)
New silicon-containing negative resists
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need

Wu, C.H.;
Mater. Res. Soc. Symp. Proc. 101, 373 (1988)
A chemical study of photochemical vapor deposition of silicon nitride in mercury-sensitized reactions between silane and ammonia
need
need

Marks, J.; Bowman, R.C.,Jr.; Robertson, R.E.;
Mater. Res. Soc. Symp. Proc. 105, 115 (1988)
Photoassisted deposition of silicon dioxide from silane and nitrogen dioxide
need
need

Chapple-Sokol, J.D.; Giunta, C.J.; Gordon, R.G.;
Mater. Res. Soc. Symp. Proc. 105, 127 (1988)
Kinetics of silicon oxide thin film deposition from silane and disilane with nitrous oxide
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need

Breiland, W.G.; Ho, P.; Coltrin, M.E.; Kee, R.J.; Evans, G.H.;
Mater. Res. Soc. Symp. Proc. 117, 23 (1988)
Laser probes and numerical modeling as process diagnostics in chemical vapor deposition
need
need

Baker, S.D.; Milne, W.I.; Robertson, P.A.;
Mater. Res. Soc. Symp. Proc. 118, 261 (1988)
Amorphous hydrogenated silicon thin film transistors manufactured by a photo-CVD technique
need
need

McCurdy, R.J.; Gordon, R.G.;
Mater. Res. Soc. Symp. Proc. 118, 97 (1988)
Effects of substrate temperature and gas phase chemistry on the APCVD of amorphous hydrogenated silicon films from disilane
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need

Maruyama, A.; Shen, D.S.; Chu, V.; Liu, J.Z.; Jaroker, J.; Campbell, I.; Fauchet, P.M.; Wagner, S.;
Mater. Res. Soc. Symp. Proc. 131, 203 (1989)
Surface condition in the plasma-CVD of amorphous hydrogenated fluorinated silicon from tetrafluorosilane and hydrogen
need
need

Ho, P.; Buss, R.J.; Breiland, W.G.;
Mater. Res. Soc. Symp. Proc. 131, 233 (1989)
Laser studies of the silylidyne radical/surface interaction during deposition of a thin film
need
need

Robertson, R.M.; Rossi, M.J.;
Mater. Res. Soc. Symp. Proc. 131, 251 (1989)
Atom- and radical-surface sticking coefficients measured using resonance enhanced multiphoton ionization (REMPI)
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need

Lee, W.; Interrante, L.V.; Czekaj, C.; Hudson, J.; Lenz, K.; Sun, B.-X.;
Mater. Res. Soc. Symp. Proc. 131, 431 (1989)
Chemical vapor deposition of silicon carbide using a novel organometallic precursor
need
need

Robertson, P.A.; Milne, W.I.;
Mater. Res. Soc. Symp. Proc. 75, 257 (1987)
Photoenhanced deposition of silicon oxide thin films using an internal nitrogen discharge lamp
need
need

Bain, S.; Ijadi-Maghsoodi, S.; Barton, T.J.;
Organometallics 6, 1136 (1987)
Mechanism of silanone extrusion from alkoxyvinylsilanes
need
need

Guimon, C.; Pfister-Guillouzo, G.;
Organometallics 6, 1387 (1987)
Theoretical and experimental studies of the flash pyrolysis of trimethylsilyl azide and trimethylgermyl azide: generation and He I photoelectron spect
need
need

Kudo, T.; Nagase, S.;
Organometallics 6, 1586 (1987)
Theoretical search for the silanone-to-silylene isomerization
need
need

Gillette, G.R.; Noren, G.H.; West, R.;
Organometallics 6, 2617 (1987)
Spectroscopic observation of silylene-ether complexes
need
need

Davidson, I.M.T.; Hughes, K.J.; Ijadi-Maghsoodi, S.;
Organometallics 6, 646 (1987)
Kinetics of pyrolysis of some alkenylsilanes
need
need

Sawrey, B.A.; O'Neal, H.E.; Ring, M.A.;
Organometallics 6, 720 (1987)
Decomposition mechanism and kinetics of n-butylsilane
need
need

Davidson, I.M.T.; Dean, C.E.;
Organometallics 6, 966 (1987)
Kinetics and mechanism of pyrolysis of some methylchlorosilanes
need
need

Lennon, P.J.; Mack, D.P.; Thompson, Q.E.;
Organometallics 8, 1121 (1989)
Nucleophilic catalysis of organosilicon substitution reactions
need
need

Gordon, M.S.; Boatz, J.A.;
Organometallics 8, 1978 (1989)
Predicted heats of formation for methylsilylene and dimethylsilylene
need
need

Clarke, M.P.; Damrauer, R.; Davidson, I.M.T.; Simon, R.;
Organometallics 8, 2031 (1989)
Kinetics and mechanism of the thermal rearrangement of some (chloromethyl)silanes
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need

Anderson, A.B.; Shiller, P.; Zarate, E.A.; Tessier-Youngs, C.A.; Youngs, W.J.;
Organometallics 8, 2320 (1989)
Bonding in transition-metal-silyl dimers. Molecular orbital theory
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need

Ando, W.; Itoh, H.; Tsumuraya, T.;
Organometallics 8, 2759 (1989)
Electronic absorption spectra of diorganogermylenes in matrixes: formation of diorganogermylene complexes with heteroatom-containing substrates
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need

Rich, J.D.; Krafft, T.E.;
Organometallics 9, 2040 (1990)
Silylative decarbonylation. 3. Transfer selectivity and substituent rate effects
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need

Panek, J.S.; Prock, A.; Eriks, K.; Giering, W.P.;
Organometallics 9, 2175 (1990)
Addition of carbenium ions to allylsilanes: interpretation of kinetic data via the quantitative analysis of ligand effects
need
need

Gillette, G.R.; Noren, G.; West, R.;
Organometallics 9, 2925 (1990)
Low-temperature photochemistry of oxy-substituted trisilanes
need
need

Damrauer, R.; Krempp, M.;
Organometallics 9, 999 (1990)
Gas-phase ion-molecule chemistry of methoxy-substituted silanes: collision-induced decomposition of siloxide ions leading to anions of silaacetaldehyd
need
need

Springborg, M.;
Phys. Rev. B 40, 7839 (1989)
Electronic properties of polymeric silicon hydrides
need
need

Mousseau, N.; Lewis, L.J.;
Phys. Rev. B 41, 3702 (1990)
Computer models for amorphous silicon hydrides
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need

Mousseau, N.; Lewis, L.J.;
Phys. Rev. B 42, 5361 (1990)
Computer models for amorphous silicon hydrides (Erratum to document cited in CA112(18):165203n)
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need

An, I.; Nguyen, H.V.; Nguyen, N.V.; Collins, R.W.;
Phys. Rev. Lett. 65, 2274 (1990)
Microstructural evolution of ultrathin amorphous silicon films by real-time spectroscopic ellipsometry
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need

Oka, K.; Nakao, R.;
Res. Chem. Intermed. 13, 143 (1990)
Photolysis of tris(trimethylsilyl)phenylsilane in alcohols: a consecutive generation of silylene species
need
need

Alberti, A.; Pedulli, G.F.;
Rev. Chem. Intermed. 8, 207 (1987)
Addition reactions of silyl radicals to unsaturated compounds
need
need

Ciraci, S.; Batra, I.P.;
Surf. Sci. 178, 80 (1986)
Theory of transition from the dihydride to the monohydride phase on the silicon(001) surface
need
need

Agrawal, P.M.; Thompson, D.L.; Raff, L.M.;
Surf. Sci. 195, 283 (1988)
Computational studies of heterogeneous reactions of silicon dihydride on silicon(111) surfaces
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need

Gates, S.M.; Kunz, R.R.; Greenlief, C.M.;
Surf. Sci. 207, 364 (1989)
Silicon hydride etch products from the reaction of atomic hydrogen with silicon(100)
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need

McCash, E.M.; Chesters, M.A.; Gardner, P.; Parker, S.F.;
Surf. Sci. 225, 273 (1990)
The adsorption and decomposition of silane on copper(111)
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need

Matsuda, A.; Nomoto, K.; Takeuchi, Y.; Suzuki, A.; Yuuki, A.; Perr, J.;
Surf. Sci. 227, 50 (1990)
Temperature dependence of the sticking and loss probabilities of silyl radicals on hydrogenated amorphous silicon
need
need

Chapple-Sokol, J.D.; Gordon, R.G.;
Thin Solid Films 171, 291 (1989)
Substrate-dependent growth of atmospheric pressure chemically vapor deposited silicon dioxide from dichlorosilane and oxygen
need
need

Veprek, S.;
Thin Solid Films 175 (1989)
Controversies in the suggested mechanisms of plasma-induced deposition of silicon from silane
need
need

Pavelescu, C.; Kleps, I.;
Thin Solid Films 190, 1 (1990)
Activation energies in chemical vapor deposition kinetics of silica films using TEOS chemistry
need
need

Maricq, M.M.; Szente, J.J.; Khitrov, G.A.; Francisco, J.S.;
J. Chem. Phys. 98, 9522 (1993)
Temperature dependent kinetics of the formation and self-reactions of FC(O)O2 and FC(O)O radicals
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need

Holmes, J.L.; Mayer, P.M.;
J. Phys. Chem. 99, 1366 (1995)
A Combined Mass Spectrometric and Thermochemical Examination of the C2,H2,N Family of Cations and Radicals
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need

Lee, J.Y.; Hahn, O.; Lee, S.J.; Choi, H.S.;
J. Phys. Chem. 99, 1913 (1995)
Ab Initio Study of s-trans-1,3-Butadiene Using Various Levels of Basis Set and Electron Correlation: Force Constants and Exponentially Scaled Vibrational Frequencies
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need