Bibliographic Citation
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| Title | Phenolic dyes as nonbleachable absorbers compatible with novolac resins for linewidth control in photoresists |
| Creator/Author | Renschler, C.L. |
| Publication Date | 1986 Nov 25 |
| OSTI Identifier | OSTI ID: 6086684; DE88000844 |
| DOE Contract Number | AC04-76DP00789 |
| Resource Type | Patent |
| Resource Relation | Portions of this document are illegible in microfiche products |
| Research Org | Sandia National Labs., Albuquerque, NM (USA) |
| Subject | 420800 -- Engineering-- Electronic Circuits & Devices-- (-1989) ;360603 -- Materials-- Properties ;360601 -- Other Materials-- Preparation & Manufacture; CURCUMIN-- ABSORPTION;LINE WIDTHS-- CONTROL;MICROELECTRONICS-- LINE WIDTHS;RESINS-- SPIN-ON COATING; BLEACHING;ETCHING;LAYERS;LIGHT SCATTERING;PHOTOSENSITIVITY;REFLECTION;RESOLUTION;ULTRAVIOLET RADIATION |
| Related Subject | AROMATICS;DEPOSITION;DYES;ELECTROMAGNETIC RADIATION;ETHERS;HYDROXY COMPOUNDS;KETONES;ORGANIC COMPOUNDS;ORGANIC OXYGEN COMPOUNDS;ORGANIC POLYMERS;PETROCHEMICALS;PETROLEUM PRODUCTS;PHENOLS;POLYMERS;POLYPHENOLS;RADIATIONS;SCATTERING;SENSITIVITY;SURFACE COATING;SURFACE FINISHING |
| Description/Abstract | Photoresist techniques and compositions are provided employing curcumin as an absorptive dye for the purpose of reducing linewidth non-uniformity caused by scattered and reflective light from the substrate-resist interface.^The photoresist compositions containing curcumin as the absorptive dye are used in the production of microelectronic circuitry by both single layer and multilayer photoresist techniques. |
| Country of Publication | United States |
| Language | English |
| Format | Pages: 12 |
| Availability | NTIS, PC A02/MF A01; 1. |
| Rights | Dept. of Energy |
| System Entry Date | 2001 May 13 |
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Last Updated: 02/08/2009